公开(公告)号：US20120211353A1

公开(公告)日：2012-08-23

申请号：US13097096

申请日：2011-04-29

申请人： CHUNG-PEI WANG ,  MING-YANG LIAO

发明人： CHUNG-PEI WANG ,  MING-YANG LIAO

IPC分类号： C23C14/35 ,  C23C14/06

CPC分类号： C23C14/0015 ,  C23C14/0036 ,  C23C14/352

摘要： A method of coating a pure white film includes a first step of providing a metal shell, a second step of forming a bonding layer on a surface of the metal shell by a first magnetron sputtering process, and a third step of forming a pure white layer on a surface of the bonding layer by a second magnetron sputtering process. The bonding layer includes chromium nitride. In the second process, aluminum and chromium corporately serves as targets. Oxygen serves as a reactive gas. A ratio of a bombarding power of the aluminum to that of the chromium is about 12:1. A bias voltage ranges from 180 volts to 220 volts. The second magnetron sputtering process lasts for about 58 to 62 minutes and goes on under a temperature ranged from 180° C. to 220° C. And the pure white layer includes aluminum oxide and chromium oxide.

摘要翻译： 涂布纯白色膜的方法包括提供金属壳的第一步骤，通过第一磁控溅射工艺在金属壳的表面上形成结合层的第二步骤，以及形成纯白色层的第三步骤 通过第二磁控溅射工艺在接合层的表面上。 接合层包括氮化铬。 在第二个过程中，铝和铬共同成为目标。 氧气作为反应气体。 铝的轰击强度与铬的轰击强度的比例为约12：1。 偏置电压范围为180伏至220伏。 第二磁控溅射工艺持续约58至62分钟，并且在180℃至220℃的温度下进行。纯白色层包括氧化铝和氧化铬。

公开(公告)号：US20120160675A1

公开(公告)日：2012-06-28

申请号：US13091136

申请日：2011-04-21

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： C23C14/34

CPC分类号： B65G29/00 ,  C23C14/505 ,  C23C14/56

摘要： A sputtering device includes a main body and a loading device received in the main body. The main body includes a top portion, a bottom portion, and a sidewall connected between the top portion and the bottom portion, an upper bearing mounted on the top portion, and a lower bearing mounted on the bottom portion. The loading device includes an outer frame, an inner frame received in the outer frame, and a gear device arranged between the outer frame and the in inner frame. The outer frame is rotatably connected to the upper bearing and includes a plurality of first rods arranged in a first circle. The inner frame is rotatably connected to the lower bearing and includes a plurality of second rods arranged in a second circle. The gear device is configured for bringing the outer frame and the inner frame to rotate in opposite directions.

摘要翻译： 溅射装置包括容纳在主体中的主体和装载装置。 主体包括顶部，底部和连接在顶部和底部之间的侧壁，安装在顶部上的上轴承和安装在底部上的下轴承。 装载装置包括外框架，容纳在外框架中的内框架和布置在外框架和内框架之间的齿轮装置。 外框架可旋转地连接到上轴承并且包括布置在第一圆中的多个第一杆。 内框架可旋转地连接到下轴承并且包括布置在第二圆圈中的多个第二杆。 齿轮装置构造成使外框架和内框架沿相反方向旋转。

公开(公告)号：US20120052205A1

公开(公告)日：2012-03-01

申请号：US12978355

申请日：2010-12-23

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： B05D1/32 ,  B05D1/36

CPC分类号： C23C14/042 ,  H05K5/0243

摘要： A coating method for forming a pattern on a workpiece is provided. First, a workpiece surface is provided. Second, a mask having a shape conforming to a predetermined pattern is provided. Next, the workpiece surface includes a first portion exposed outside and a second portion shielded by the mask. A shielding layer is formed on the exposed first portion of the workpiece surface. The mask is removed from the workpiece to expose the second portion. A coating layer over the shielding layer and the exposed second portion is formed. The coating layer consists of a first part overlaying the shielding layer and a second part overlaying the second portion. The mask is attached onto the coating layer and aligned with the second portion of the workpiece surface. The first part of the coating layer, the shielding layer, and the mask are then removed.

摘要翻译： 提供了一种用于在工件上形成图案的涂布方法。 首先，提供工件表面。 第二，提供具有符合预定图案的形状的面罩。 接下来，工件表面包括暴露在外部的第一部分和由掩模屏蔽的第二部分。 在工件表面的暴露的第一部分上形成屏蔽层。 将掩模从工件移除以露出第二部分。 形成屏蔽层上的涂层和暴露的第二部分。 涂层由覆盖屏蔽层的第一部分和覆盖第二部分的第二部分组成。 掩模附着在涂层上并与工件表面的第二部分对准。 然后去除涂层的第一部分，屏蔽层和掩模。

公开(公告)号：US20110174611A1

公开(公告)日：2011-07-21

申请号：US12853503

申请日：2010-08-10

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： C23C14/50 ,  C23C14/34

CPC分类号： C23C14/3407 ,  C23C14/50 ,  H01J37/34 ,  H01J37/3435

摘要： An exemplary coating device includes a target material and a support device configured for supporting a workpiece. The support device includes a support frame and a holding member. The support frame includes a support member and a support arm disposed on the support member. One end of the holding member is configured for attaching the workpiece thereon, and an opposite end of the holding member is adjustably engaged with the support arm so that the workpiece is a desired distance from the target material.

摘要翻译： 示例性涂覆装置包括目标材料和被配置为支撑工件的支撑装置。 支撑装置包括支撑框架和保持构件。 支撑框架包括支撑构件和设置在支撑构件上的支撑臂。 保持构件的一端构造成用于将工件附接在其上，并且保持构件的相对端与支撑臂可调节地接合，使得工件距离目标材料所需的距离。

公开(公告)号：US20110048937A1

公开(公告)日：2011-03-03

申请号：US12817191

申请日：2010-06-17

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： C23C14/50

CPC分类号： C23C14/505

摘要： A carrier for use during sputtering includes a main body and support members. The main body defines a receiving space and includes a lateral surface defining at least one groove extending along a longitudinal direction. The receiving space and the at least one groove communicate with each other. The at least one groove is defined by a first surface and a second surface. The first surface defines recessed portions along the longitudinal direction and communicates with the receiving space. The support members are used for hanging workpieces. Each of the support members includes at least one support arm protruding from the lateral surface and is selectively and movably retained by one of the recessed portions.

摘要翻译： 溅射中使用的载体包括主体和支撑构件。 主体限定了容纳空间并且包括限定沿纵向方向延伸的至少一个凹槽的侧表面。 接收空间和至少一个凹槽彼此连通。 所述至少一个凹槽由第一表面和第二表面限定。 第一表面沿着纵向方向限定凹陷部分并且与接纳空间连通。 支撑构件用于悬挂工件。 每个支撑构件包括从侧表面突出的至少一个支撑臂，并且其中一个凹部被选择性地和可移动地保持。

公开(公告)号：US20130319317A1

公开(公告)日：2013-12-05

申请号：US13600247

申请日：2012-08-31

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： C30B15/00

CPC分类号： C30B29/20 ,  C30B15/10 ,  C30B15/36

摘要： A crystal production method includes the following steps. A material is melted in a crucible to form a thin film. A seed crystal is then contacted with the thin film to form a solid-liquid interface, wherein the shape and size of a bottom surface of the seed crystal is the same as the size and shape of the thin film. Finally, the seed crystal is pulled up without rotation, to allow the melted material to solidify at the solid-liquid interface to produce a crystal.

摘要翻译： 晶体生产方法包括以下步骤。 材料在坩埚中熔化以形成薄膜。 然后将晶种与薄膜接触以形成固 - 液界面，其中晶种的底表面的形状和尺寸与薄膜的尺寸和形状相同。 最后，晶种被拉起而不旋转，以使熔融的材料在固液界面固化，产生晶体。

公开(公告)号：US20130022837A1

公开(公告)日：2013-01-24

申请号：US13245875

申请日：2011-09-27

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： B32B15/01 ,  C23C14/14 ,  C23C14/34 ,  B05D3/00

CPC分类号： B32B15/013 ,  C23C14/0015 ,  C23C14/024 ,  C23C14/083 ,  C23C14/568 ,  Y10T428/12812

摘要： A film is coated on a substrate made of stainless steel, and includes a first buffer layer, a second buffer layer, and a third buffer layer which are positioned on the substrate from a near end to a far end. The first buffer layer is made of Cr. The second buffer layer is made of Ti and Cr. The color layer is made of Ti and Cr.

摘要翻译： 将膜涂布在由不锈钢制成的基板上，并且包括从近端到远端位于基板上的第一缓冲层，第二缓冲层和第三缓冲层。 第一缓冲层由Cr制成。 第二缓冲层由Ti和Cr制成。 彩色层由Ti和Cr制成。

公开(公告)号：US20120067279A1

公开(公告)日：2012-03-22

申请号：US13112242

申请日：2011-05-20

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： B05C13/00

CPC分类号： B05B13/0235 ,  C23C14/50 ,  C23C14/505

摘要： A conveying device for a deposition device includes a transport device and a carrier. The transport device includes a main body, two wheels, a connection shaft, and a first bevel gear. The connection shaft is mounted on the main body. The two wheels are mounted on two opposite ends of the connection shaft. The first bevel gear is sleeved on the connection shaft. The carrier includes a revolving frame, a rotating shaft, a second bevel gear, and at least one carrying bar. The rotating shaft is mounted on the revolving frame. The second bevel gear is sleeved on one end of the rotating shaft and meshed with the first bevel gear. The revolving frame rotates relative to the rotating shaft. The at least one carrying bar is mounted on the revolving frame and driven by the rotating shaft to rotate. Each carrying bar includes supporting elements for carrying workpieces.

摘要翻译： 用于沉积装置的输送装置包括输送装置和载体。 输送装置包括主体，两个轮，连接轴和第一锥齿轮。 连接轴安装在主体上。 两个轮子安装在连接轴的两个相对端上。 第一个锥齿轮套在连接轴上。 载体包括旋转框架，旋转轴，第二锥齿轮和至少一个承载杆。 旋转轴安装在旋转框架上。 第二锥齿轮套在旋转轴的一端并与第一锥齿轮啮合。 旋转架相对于旋转轴旋转。 至少一个搬运杆安装在旋转框架上并由旋转轴驱动以旋转。 每个承载杆包括用于承载工件的支撑元件。

公开(公告)号：US20120040096A1

公开(公告)日：2012-02-16

申请号：US12977076

申请日：2010-12-23

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： C23C16/04 ,  C23C16/06 ,  C23C16/56 ,  C23C16/44

CPC分类号： C23C14/042 ,  C23C14/20

摘要： A coating method for forming a pattern on a workpiece is provided. The method includes the follow steps: providing a workpiece having a surface, forming a coating layer over the surface using a physical vapor deposition method; providing a mask having a shape conforming to a predetermined pattern; attaching the mask to the surface such that a portion of the coating layer is shielded. The coating layer consists of a shielded portion and an unwanted portion surrounding the shielded portion. Finally, removing the unwanted portion of the coating layer using a magnetic abrasive finishing method, and removing the mask to obtain the shielded portion having the predetermined pattern on the workpiece.

摘要翻译： 提供了一种用于在工件上形成图案的涂布方法。 该方法包括以下步骤：提供具有表面的工件，使用物理气相沉积方法在表面上形成涂层; 提供具有符合预定图案的形状的掩模; 将掩模附着到表面，使得涂层的一部分被屏蔽。 涂层由屏蔽部分和围绕屏蔽部分的不需要的部分组成。 最后，使用磁性研磨整理方法除去涂层的不想要的部分，并且去除掩模以获得在工件上具有预定图案的屏蔽部分。

公开(公告)号：US20110303536A1

公开(公告)日：2011-12-15

申请号：US13149883

申请日：2011-05-31

申请人： CHUNG-PEI WANG

发明人： CHUNG-PEI WANG

IPC分类号： C23C14/34 ,  C23C16/48

CPC分类号： C23C14/34 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3417

摘要： An exemplary sputtering apparatus includes a chamber, a rotatable rack, a gate, two first magnetic elements, and a second magnetic element. A sidewall of the chamber has an opening defined therein. The rotatable rack is provided in a center of the chamber. The gate is provided in the opening. The two first magnetic elements are mounted on the gate. The second magnetic element is mounted inside the chamber. The second magnetic element neighbors one of the two first magnetic elements. A first angle is defined between two imaginary lines running from the rack to each of the two first magnetic elements. A second angle is defined between an imaginary line running from the rack to the second magnetic element and the imaginary line running from the rack to said one of the two first magnetic elements neighboring the second magnetic element. The first angle and the second angle are different.

摘要翻译： 示例性的溅射装置包括腔室，可旋转齿条，门，两个第一磁性元件和第二磁性元件。 腔室的侧壁具有限定在其中的开口。 旋转齿条设置在腔室的中心。 门口设在开口处。 两个第一磁性元件安装在门上。 第二磁性元件安装在腔室内。 第二磁性元件邻近两个第一磁性元件之一。 在从机架运行到两个第一磁性元件中的每一个的两根假想线之间限定第一角度。 第二角度定义在从齿条延伸到第二磁性元件的假想线和从机架延伸到与第二磁性元件相邻的两个第一磁性元件中的所述一个的假想线之间。 第一角度和第二角度是不同的。