公开(公告)号：US11592756B2

公开(公告)日：2023-02-28

申请号：US15734882

申请日：2019-05-09

Applicant: ASML Netherlands B.V.

Inventor： Hessel Bart Koolmees ,  Johannes Petrus Martinus Bernardus Vermeulen

IPC: G03F7/20 ,  H02K3/02 ,  H02K41/02 ,  H02K55/00

Abstract: The invention provides an assembly comprising a cryostat (6, 7, 8, 9) and a flat coil layer (3) of superconducting coils (2) for use with a magnetic levitation and/or acceleration motor system (1) of a lithographic apparatus. The cryostat comprises two insulation coverings (8, 9). The coil layer is arranged between the two coverings. The coverings each comprise an inner plate (10) configured to be cryocooled and an outer plate (11) parallel to the inner plate, and an insulation system with a vacuum layer (13) between the inner and outer plate. The insulation system of said covering comprises a layer of circular bodies (101), the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

公开(公告)号：US11592752B2

公开(公告)日：2023-02-28

申请号：US16875643

申请日：2020-05-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Te-Sheng Wang ,  Xiang Wan

IPC: G03F7/20

Abstract: A process of characterizing a process window of a patterning process, the process including: obtaining a set of inspection locations for a pattern, the pattern defining features to be applied to a substrate with a patterning process, the set of inspection locations corresponding to a set of the features, the set of features being selected from among the features according to sensitivity of the respective features to variation in one or more process characteristics of the patterning process; patterning one or more substrates under varying process characteristics of the patterning process; and determining, for each of the variations in the process characteristics, whether at least some of the set of features yielded unacceptable patterned structures on the one or more substrates at corresponding inspection locations.

公开(公告)号：US20230056872A1

公开(公告)日：2023-02-23

申请号：US18048119

申请日：2022-10-20

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Suzanne Johanna Antonetta Geertruda COSIJNS ,  Koen Govert Olivier VAN DE MEERAKKER ,  Ivo WIDDERSHOVEN

IPC: G01J9/02 ,  G01B11/00 ,  G03F7/00 ,  G03F7/20 ,  G01B9/02001 ,  G01B9/02002 ,  G01B9/02015

Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.

公开(公告)号：US20230054421A1

公开(公告)日：2023-02-23

申请号：US17982226

申请日：2022-11-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanna DE SIMONE ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Thibault Simon Mathieu LAURENT ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Niek Jacobus Johannes ROSET ,  Justin Johannes Hermanus GERRITZEN

IPC: G03F7/20

Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.

公开(公告)号：US20230048507A1

公开(公告)日：2023-02-16

申请号：US17955450

申请日：2022-09-28

Applicant: ASML Netherlands B.V.

Inventor： Marcel Nicolaas Jacobus VAN KERVINCK ,  Marco Jan-Jaco WIELAND

IPC: H01J37/317 ,  H01J37/04 ,  H01L27/11 ,  H01L27/112

Abstract: A method for making a semiconductor memory device comprising a plurality of memory cells for storing one or more data values, the method comprising; exposing a pattern on a wafer for creating structures for a plurality of memory cells for the semiconductor memory device, wherein the pattern is exposed by means of one or more charged particle beams; and varying an exposure dose of the one or more charged particle beams during exposure of the pattern to generate a set of one or more non-common features in one or more structures of at least one of the memory cells, so that the structures of the at least one memory cell differ from the corresponding structures of other memory cells of the semiconductor memory device.

公开(公告)号：US20230048272A1

公开(公告)日：2023-02-16

申请号：US17952067

申请日：2022-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US11573496B2

公开(公告)日：2023-02-07

申请号：US17458216

申请日：2021-08-26

Applicant: ASML Netherlands B.V.

Inventor： Nick Kant ,  Martijn Cornelis Schaafsma

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system comprising at least one optical component and configured to project a pattern onto a substrate. The lithographic apparatus further comprises a control system arranged to reduce the effects of heating and/or cooling of an optical component in a lithographic process. The control system is configured at least: to select at least one of a plurality of mode shapes to represent a relationship between at least one input in the lithographic process and an aberration resulting from the input and to generate and apply a correction to the lithographic apparatus based on the mode shape.

公开(公告)号：US20230035511A1

公开(公告)日：2023-02-02

申请号：US17791641

申请日：2021-01-04

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Ronny DER KINDEREN ,  Tian GANG ,  Todd R. DOWNEY

IPC: G03F7/20

Abstract: A system, method, a lithographic apparatus and a software product configured to determine a drift in an attribute of an illumination and a corresponding drift correction. The system includes a lithographic apparatus that includes at least two sensors, each configured to measure a property related to an illumination region provided for imaging a substrate. Furthermore, a processor is configured to: determine, based on a ratio of the measured property, a drift of the illumination region with respect to a reference position; determine, based on the drift of the illumination region, a drift in an attribute related to the illumination upstream of the illumination region measured by the at least two sensors, and determine, based on the drift in the attribute, the drift correction to be applied to the attribute to compensate for the drift in the attribute.

公开(公告)号：US20230035488A1

公开(公告)日：2023-02-02

申请号：US17789160

申请日：2020-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Elie BADR

IPC: G03F7/20 ,  G06T7/00 ,  G06T7/13 ,  G06T7/194

Abstract: A metrology method comprising: performing a first exposure on a substrate to form a first patterned layer including a plurality of first target units, each first target unit comprising a first target feature; performing a second exposure on the substrate to form a second patterned layer comprising second target units overlying respective ones of the first target units, each of the second target units having a second target feature, wherein ones of the second target units have the second target feature positioned at respectively different offsets relative to a reference position: imaging the second target units overlaid on the first target units; and determining an edge placement error based on positions of edges of second target features in second target units relative to edges of the first target feature of the underlying first target unit.

公开(公告)号：US20230028848A1

公开(公告)日：2023-01-26

申请号：US17782695

申请日：2020-11-18

Applicant: ASML Netherlands B.V.

Inventor： Joshua Mark Lukens

IPC: G01N15/10 ,  G03F7/20 ,  H05G2/00

Abstract: An apparatus for monitoring a stream of droplets of target material for generating a radiation beam in a radiation source, wherein the apparatus comprises: a target material emitter for creating the stream of droplets of target material, wherein the target material emitter comprises a chamber configured for the target material to pass through before forming the stream of droplets; a first transducer configured to generate acoustic pressures in the chamber, and a second transducer configured to sense the acoustic pressures in the chamber.