公开(公告)号：US20140353528A1

公开(公告)日：2014-12-04

申请号：US14290483

申请日：2014-05-29

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki HAYASHI ,  Kazuhiro SUZUKI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/11

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

Abstract translation: 极紫外线发生装置可以包括：包含由来自激光装置的脉冲激光束照射的等离子体产生区域的室，被配置为连续地向室内的等离子体产生区域供给多个目标的目标供给装置，目标检测 被配置为检测从目标供给装置输出的目标的单元，以及被配置为控制所述激光装置的激光控制器; 所述激光控制器生成指示所述激光装置所具备的激光装置发射脉冲激光束的发光触发器，并且根据来自所述目标检测部的检测信号将所生成的发光触发信号输出到所述激光装置; 并且所述激光控制器调整所述发光触发器的产生，连续输出到所述激光装置，使得所述发光触发的时间间隔在预定范围内。

公开(公告)号：US20140348188A1

公开(公告)日：2014-11-27

申请号：US14454494

申请日：2014-08-07

Applicant: GIGAPHOTON INC.

Inventor： Takashi SUGANUMA ,  Hidenobu KAMEDA ,  Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H01S3/10

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0971 ,  H01S3/10007 ,  H01S3/10023 ,  H01S3/1003 ,  H01S3/104 ,  H01S3/13 ,  H01S3/1301 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2308 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2391 ,  H05G2/008

Abstract: A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units.

Abstract translation: 激光装置可以包括主振荡器，设置在来自主振荡器的激光束的光束路径中的光学单元，光束调节单元，其设置在激光束的光束路径中的光学单元的上游，并被配置为至少调节 激光束的光束路径和波前的一个;第一检测单元，设置在激光束的光束路径中的光束调整单元和光学单元之间，并且被配置为检测激光束;第二检测单元， 激光束的光束路径中的光学单元，被配置为检测激光束;以及控制器，被配置为基于来自第一和第二检测单元的输出来控制光束调整单元。

公开(公告)号：US20140319388A1

公开(公告)日：2014-10-30

申请号：US14215492

申请日：2014-03-17

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  H01S3/10

CPC classification number: H05G2/008 ,  H01S3/0078 ,  H01S3/10023 ,  H01S3/1003 ,  H01S3/10069 ,  H01S3/1306 ,  H01S3/2232 ,  H01S3/2316 ,  H01S2301/02

Abstract: A laser apparatus may include a master oscillator configured to output a pulse laser beam, an amplifier disposed in a light path of the pulse laser beam, a wavelength selection element disposed in the light path of the pulse laser beam and configured to transmit light of a selection wavelength at higher transmittance than transmittance of light of other wavelengths, and a controller configured to change the selection wavelength of the wavelength selection element.

Abstract translation: 激光装置可以包括配置成输出脉冲激光束的主振荡器，设置在脉冲激光束的光路中的放大器，配置在脉冲激光束的光路中的波长选择元件， 选择波长比其他波长的光的透射率高的透射率，以及配置为改变波长选择元件的选择波长的控制器。

公开(公告)号：US20140253716A1

公开(公告)日：2014-09-11

申请号：US14201327

申请日：2014-03-07

Applicant: GIGAPHOTON INC.

Inventor： Takashi SAITO ,  Naoyoshi IMACHI ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A chamber for an extreme ultraviolet light generation apparatus is a chamber into which droplets are sequentially outputted, and may include an image capturing unit configured to repeatedly capture images of the droplets during an image capturing time set so that images of two adjacent droplets that have been outputted do not overlap.

Abstract translation: 用于极紫外光发生装置的室是依次输出液滴的室，并且可以包括图像捕获单元，其被配置为在设置的图像捕获时间期间反复捕获液滴的图像，使得已经存在两个相邻液滴的图像 输出不重叠。

公开(公告)号：US20140183379A1

公开(公告)日：2014-07-03

申请号：US14201671

申请日：2014-03-07

Applicant: GIGAPHOTON INC.

Inventor： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H01S3/02 ,  H01S3/094026 ,  H01S3/10061 ,  H01S3/1106 ,  H01S3/131 ,  H01S3/1636 ,  H01S3/1643 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2383 ,  H05G2/003 ,  H05G2/005

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20140138560A1

公开(公告)日：2014-05-22

申请号：US14083020

申请日：2013-11-18

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi UMEDA ,  Osamu WAKABAYASHI

IPC: G01J3/10

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device may include a tank including a nozzle, a first electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second electrode that includes a main body portion provided with a second through-hole and a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle and that is disposed so that the center axis of the nozzle is positioned within the second through-hole, a third electrode disposed within the tank, and a heating unit configured to heat the second electrode.

Abstract translation: 目标供给装置可以包括：包括喷嘴的第一电极，设置有第一通孔的第一电极，并且设置成使得喷嘴的中心轴线位于第一通孔内;第二电极，包括主体部分 设置有第二通孔和收集部，所述第二通孔和收集部形成为从所述第二通孔的周缘方向朝向所述喷嘴的方向延伸的圆筒形状，并且所述收集部被配置为使得所述喷嘴的中心轴线位于所述第二通孔 通孔，设置在所述槽内的第三电极，以及构造成加热所述第二电极的加热单元。

公开(公告)号：US20140001369A1

公开(公告)日：2014-01-02

申请号：US13958112

申请日：2013-08-02

Applicant: Gigaphoton Inc.

Inventor： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Tamotsu ABE ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/003

Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

Abstract translation: 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

公开(公告)号：US20130322483A1

公开(公告)日：2013-12-05

申请号：US13931840

申请日：2013-06-29

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Fumika YOSHIDA ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI

IPC: H01S3/034

CPC classification number: H01S3/034 ,  G02B1/02 ,  G02B5/3091 ,  H01S3/0346 ,  H01S3/08054 ,  H01S3/0816 ,  H01S3/225 ,  H01S3/2251

Abstract: A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.

Abstract translation: 使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化 由于强紫外线（特别是ArF）激光照射。 气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看 室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。

公开(公告)号：US20130209077A1

公开(公告)日：2013-08-15

申请号：US13753324

申请日：2013-01-29

Applicant: Gigaphoton Inc.

Inventor： Takayuki YABU ,  Osamu WAKABAYASHI

IPC: F24H1/00

CPC classification number: F24H1/0018 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply apparatus used in an extreme ultraviolet light apparatus that generates extreme ultraviolet light by irradiating a target with a laser beam may include a tank, a nozzle that includes a through-hole and is disposed so that the through-hole communicates with the interior of the tank, a first heater disposed along a wall of the tank, a second heater disposed along a wall of the tank in a position that is further from the nozzle than the first heater, and a control unit configured to control the first heater and the second heater so that a temperature of the first heater is greater than a temperature of the second heater.

Abstract translation: 在通过用激光束照射目标物而产生极紫外光的极紫外光装置中使用的目标供给装置可以包括：罐，包括通孔并且设置成使得通孔与内部连通的喷嘴 所述第一加热器沿着所述罐的壁布置，所述第二加热器沿着所述罐的壁布置在比所述第一加热器更远离所述喷嘴的位置，以及控制单元，其被配置为控制所述第一加热器和 所述第二加热器使得所述第一加热器的温度大于所述第二加热器的温度。

公开(公告)号：US20130187065A1

公开(公告)日：2013-07-25

申请号：US13767789

申请日：2013-02-14

Applicant: GIGAPHOTON INC.

Inventor： Masato MORIYA ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H01S3/0007 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/08095 ,  H01S3/1305 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/003

Abstract: A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.

Abstract translation: 具有光轴和与驱动脉冲激光束的光束直径基本相同的光束直径的引导激光束被引入到放大从驱动激光振荡器输出的激光束的放大系统中。 引导激光束作为连续光从激光装置输出，并且通过引导激光束引入反射镜被引入到驱动脉冲激光束的光路中。 传感器检测激光束的角度（方向）和波前曲率的变化。 波前校正控制器基于传感器的测量结果向波前校正部输出信号。 波前校正部根据来自波前校正控制器的指示，将激光束的波前校正为规定的波前。