MASK
    202.
    发明申请
    MASK 审中-公开

    公开(公告)号:US20180216220A1

    公开(公告)日:2018-08-02

    申请号:US15544915

    申请日:2017-02-03

    Inventor: Shouhua LV Pu SUN

    CPC classification number: C23C14/042 C23C14/12 H01L51/0011 H01L51/56

    Abstract: A mask includes a plurality of mask strips and a mounting frame, the plurality of mask strips are mounted on a mounting frame after being stretched. Each mask strip includes a plurality of mask units. Each mask unit includes an effective opening region and two vacant regions. Mask openings are disposed in the effective opening region. The two vacant regions are respectively provided on both sides of the effective opening region perpendicular to a stretching direction and close to the effective opening region. Vacant openings are disposed in the vacant regions. Wherein the contour shape of each mask opening is different from that of each vacant opening and the stress generated by the mask openings and the stress generated by the vacant openings in a stretching process can be mutually compensated.

    Array substrate and fabrication method thereof, and display panel

    公开(公告)号:US10032807B2

    公开(公告)日:2018-07-24

    申请号:US15519002

    申请日:2016-09-09

    Abstract: An array substrate and a fabrication method thereof, and a display panel are provided. The array substrate includes: a base substrate; an isolation layer on the base substrate; and a first thin film transistor on the isolation layer and a first gate line extending in a gate line direction, wherein the first thin film transistor includes a first gate electrode and a first active layer, the isolation layer includes a protrusion portion which extends in the gate line direction and protrudes upwards with respect to the base substrate, and each of orthogonal projections of the first active layer and the first gate electrode of the first thin film transistor on the main surface of the base substrate is overlapped with an orthogonal projection of the first lateral surface of the protrusion portion on the main surface of the base substrate.

    TOUCH DISPLAY SUBSTRATE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20180175080A1

    公开(公告)日:2018-06-21

    申请号:US15513967

    申请日:2016-05-23

    Inventor: Dawei Shi

    Abstract: Embodiments of the present disclosure provide a touch display substrate and manufacturing method thereof. The method includes forming a touch signal line on a base substrate through patterning process; depositing a photoresist layer, and forming a first thickness photoresist layer, a second thickness photoresist layer and a photoresist layer opening area through patterning process, the touch signal line being located in the photoresist layer opening area; depositing a first insulating layer on the photoresist layer, the first insulating layer comprising a first area and a second area, wherein the first area is located on the first thickness photoresist layer, the second area is located on the second thickness photoresist layer and the photoresist layer opening area, the first area and the second area of the first insulating layer are disconnected; removing the photoresist layer and the first insulating layer located on the photoresist layer; and depositing a second insulating layer.

Patent Agency Ranking