公开(公告)号：US20040211899A1

公开(公告)日：2004-10-28

申请号：US10483596

申请日：2004-02-10

Inventor： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

IPC: H01J037/28 ,  H01J037/20

CPC classification number: H01J37/265 ,  G01N23/2251 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/216 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

Abstract: The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

Abstract translation: 本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。

公开(公告)号：US20040094713A1

公开(公告)日：2004-05-20

申请号：US10704821

申请日：2003-11-12

Inventor： Yoshinori Nakada ,  Shunsuke Koshihara ,  Ryuichirou Tamochi ,  Yayoi Hosoya ,  Hidetoshi Morokuma

IPC: H01J037/28

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/221 ,  H01J2237/2487 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2826

Abstract: In order to provide a full-automatic scanning electron microscope which carries out investigation jobs full-automatically from fine adjustment to reviewing, the scanning electron microscope of the present invention has a function of calculating the accuracy of correction after correction of coordinates and displaying it with vectors 39, a function of automatically determining a searching magnification for automatic object detection from the obtained information after correction of coordinates, and a function of calculating the frequency of occurrence of objects or defects and a time required for measurement from the searching magnification and conditions of measurement.

Abstract translation: 为了提供一种全自动扫描电子显微镜，其从精细调整到全面自动执行调查工作，本发明的扫描电子显微镜具有在校正坐标之后计算校正精度的功能，并且用 向量39，根据坐标校正后的获取信息自动确定自动对象检测的搜索倍率的功能，以及根据搜索倍率和条件来计算物体或缺陷的发生频率以及测量所需的时间的功能 测量。

公开(公告)号：US20040084621A1

公开(公告)日：2004-05-06

申请号：US10638328

申请日：2003-08-12

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer ,  Stephan Uhlemann ,  Max Haider ,  Heiko Muller

IPC: H01J037/147 ,  H01J037/28

CPC classification number: H01J37/153 ,  H01J37/1472 ,  H01J37/28

Abstract: An electron microscopy system comprises an objective lens (19) which images a field displaceable in x-direction on a fixed beam axis (17). The objective lens has an astigmatic effect which is compensated for by a beam shaper (63) on the fixed axis. Furthermore, lens configurations can selectively act on the primary electron beam or the secondary electron beam.

Abstract translation: 电子显微镜系统包括物镜（19），该物镜成像在固定光束轴线（17）上在x方向上可移位的场。 物镜具有散光效果，其通过固定轴上的光束整形器（63）补偿。 此外，透镜配置可以选择性地作用于一次电子束或二次电子束。

公开(公告)号：US20040079884A1

公开(公告)日：2004-04-29

申请号：US10610345

申请日：2003-06-30

Inventor： Anjam Khursheed ,  Thiam Leong Thong

IPC: H01J037/28

CPC classification number: H01J37/28 ,  H01J2237/2802

Abstract: A device for converting a scanning electron microscope (SEM) to a scanning transmission electron microscope (STEM) is adapted to be mounted on a conventional SEM. The device has a casing mountable on the SEM and provides support for a specimen to be scanned by a beam of primary electrons exiting the objective lens of the SEM. The casing defines a pathway allowing transmission electrons that have passed through the specimen to be detected. The device may have a magnet mountable on the casing for generating a transverse magnetic field to deflect the transmission electrons within the casing. A magnetic lens may be mounted within the casing for focusing the beam of primary electrons onto the specimen. The secondary electron detector of the SEM may be used to detect secondary electrons emitted from a target excited by the transmitted electrons. Alternatively, an electron detector may be mounted within the casing for detecting the transmitted electrons.

Abstract translation: 用于将扫描电子显微镜（SEM）转换成扫描透射电子显微镜（STEM）的装置适于安装在传统的SEM上。 该装置具有可安装在SEM上的壳体，并且通过离开SEM的物镜的一次电子束来扫描样品的支撑。 壳体限定允许透射通过要检测的样品的电子的途径。 该装置可以具有可安装在壳体上的磁体，用于产生横向磁场以使壳体内的透射电子偏转。 磁性透镜可以安装在壳体内，用于将一次电子束聚焦到样品上。 SEM的二次电子检测器可以用于检测从被透射电子激发的靶发射的二次电子。 或者，可以在壳体内安装电子检测器，以检测发射的电子。

公开(公告)号：US20040011959A1

公开(公告)日：2004-01-22

申请号：US10615531

申请日：2003-07-08

Applicant: Kabushiki Kaisha TOPCON

Inventor： Hirotami Koike ,  Kouji Kimura

IPC: H01J037/28

CPC classification number: H01J37/28 ,  H01J2237/0492 ,  H01J2237/04922

Abstract: A scanning electron microscope in the present invention includes an electron source 1 to radiate an electron beam, an objective lens system 9 to focus the radiated electron beam on a sample 10, scanning systems 5, 8 to scan the focused electron beam on the sample, secondary electron detection systems 3,4 to detect secondary electrons emitted from the sample 10, and a secondary electron image displaying system 13 to display a secondary electron image of the sample 10 with a secondary electron detection signal from the secondary electron detection system. The objective lens 9 is composed of first and second objective lenses 11, 12. The first objective lens 11 is mainly excited when using in a wide visual field mode and the second objective lens 12 is mainly excited when using in a high resolution mode.

Abstract translation: 本发明的扫描电子显微镜包括：放射电子束的电子源1，将辐射电子束聚焦在样品10上的物镜系统9，扫描系统5,8扫描样品上的聚焦电子束， 用于检测从样品10发射的二次电子的二次电子检测系统3,4;以及二次电子图像显示系统13，用二次电子检测系统的二次电子检测信号显示样品10的二次电子图像。 物镜9由第一和第二物镜11,12组成。当以宽视场模式使用时，第一物镜11主要被激发，并且当以高分辨率模式使用时第二物镜12主要被激发。

公开(公告)号：US20030230714A1

公开(公告)日：2003-12-18

申请号：US10438145

申请日：2003-05-14

Inventor： Akira Yonezawa

IPC: H01J037/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/2449

Abstract: In order to efficiently detect discharged electrons at an electromagnetic field lens, there is provided an electron beam apparatus for focusing an electron beam 1 from an electron gun running along an optical axis X so as to be incident to a single pole-piece lens with an electrostatic bipotential lens 10 onto a sample 2 subjected to a negative voltage and detecting secondary electrons 8 discharged from the sample 2, wherein a conductive first cylinder 51 encompassing part of the optical axis X and permitting the passage of the electron beam 1 from the electron gun, a first detector 41 for detecting secondary electrons 8 of the secondary electrons 8 that did not pass through the first cylinder 51, and a second detector 42 for detecting secondary electrons 8 of the secondary electrons 8 that did pass through the first cylinder 51are provided within the single pole-piece lens with an electrostatic bipotential lens 10, with the secondary electrons 8 then being efficiently sent to the second detector 42 by a Wien filter 7 provided between the first cylinder 51 and the second detector 42.

Abstract translation: 为了有效地检测电磁场透镜上的放电电子，提供了一种电子束装置，用于聚焦来自沿着光轴X的电子枪的电子束1，以便入射到单个极片透镜 将静电双极透镜10放置在经受负电压并检测从样品2排出的二次电子8的样品2上，其中包含光轴X的一部分并允许电子束1从电子枪通过的导电第一圆筒51 用于检测没有通过第一气缸51的二次电子8的二次电子8的第一检测器41和用于检测通过第一气缸51的二次电子8的二次电子8的第二检测器42设置在 具有静电双极透镜10的单极片透镜，然后二次电子8被有效地发送到分支 nd检测器42由设置在第一气缸51和第二检测器42之间的维恩滤波器7。

公开(公告)号：US20030183776A1

公开(公告)日：2003-10-02

申请号：US10395237

申请日：2003-03-25

Inventor： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

IPC: H01J037/28 ,  G01N001/28

CPC classification number: G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.

Abstract translation: 一种试样制造装置，包括：安装有试样基板的可动试样台;探针连接器，用于将探针的前端牢固地接合到试样基板的一部分附近，以在待观察的样品基板上的区域 观察装置，用于从试样基板分离与探针的前端牢固接合的微型试样的微量试样分离体，包括待观察的试样基板上的区域的微量试样和试样基板的一部分 探针的尖端牢固地接合到其上的微型试样固定器，用于将从试样基板分离的微量样品固定到观察装置的试样支架上的探针分离器和用于将探针的尖端从微型 固定在样品架上。

公开(公告)号：US20030146382A1

公开(公告)日：2003-08-07

申请号：US10309275

申请日：2002-12-26

Applicant: Hitachi, Ltd.

Inventor： Hiroyuki Suzuki ,  Hiroyuki Shinada ,  Atsuko Takafuji ,  Yasutsugu Usami ,  Shuji Sugiyama

IPC: G01N023/225 ,  H01J037/28

CPC classification number: H01J37/28 ,  H01J2237/082 ,  H01J2237/2826

Abstract: Heights of a sample are calibrated by setting a calibrating substrate on a stage and then irradiating a charged particle beam onto standard marks provided on at least two kinds of surfaces having different substrate heights. Secondary charged particles produced from said irradiated standard marks on the substrate are and detected and a surface height of the irradiated portion of the substrate measured. The difference in height between the standard marks is set to be in a range containing an extent, over the entire sample, to which the height of the sample varies due to warping.

Abstract translation: 通过在台上设置校准基板，然后将带电粒子束照射到设置在具有不同衬底高度的至少两种表面上的标准标记上来校准样品的高度。 并且测量从衬底上的所述照射的标准标记产生的二次带电粒子并测量衬底的照射部分的表面高度。 标准标记之间的高度差被设定在包含整个样品的范围内，样品的高度由于翘曲而变化。

公开(公告)号：US20030141450A1

公开(公告)日：2003-07-31

申请号：US10220956

申请日：2002-10-22

Inventor： John Craven ,  Francis Baker

IPC: H01J037/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2608

Abstract: A scanning electrode electron microscope for imaging a sample, the microscope comprising a sample chamber containing a gas in which the sample is positioned in use. A bias member is maintained at a predetermined electrical potential so as to accelerate electrons emitted from the sample. A detection system generates the image of the sample. The detection system comprises an ion collector positioned between the sample and the bias member, the ion collector being maintained at a potential below the predetermined electrical potential to thereby collect the ions from the region between the sample and the bias member. a sensor coupled to the ion collector for determining the member of ions collected thereon; and, a processing system responsive to the sensor to generate an image of the sample.

Abstract translation: 一种用于对样品成像的扫描电极电子显微镜，所述显微镜包括样品室，所述样品室含有样品在使用中定位的气体。 偏置构件保持在预定电位，以加速从样品发射的电子。 检测系统生成样品的图像。 检测系统包括位于样品和偏置构件之间的离子收集器，离子收集器保持在低于预定电势的电位，从而从样品和偏置构件之间的区域收集离子。 耦合到所述离子收集器的传感器，用于确定在其上收集的离子的成员; 以及响应于所述传感器以产生所述样本的图像的处理系统。

公开(公告)号：US20030116709A1

公开(公告)日：2003-06-26

申请号：US10295000

申请日：2002-11-14

Applicant: JEOL Ltd.

Inventor： Hiroyoshi Kazumori

IPC: H01J037/28

CPC classification number: H01J37/28 ,  H01J2237/04756 ,  H01J2237/216

Abstract: A scanning-type instrument is realized which utilizes a charged-particle beam and automates adjustments, if a voltage is applied to the specimen, to thereby provide excellent operational controllability. When a voltage is applied to the specimen, the electron beam would normally defocus. A signal corresponding to the voltage applied to the specimen is supplied to a CPU. An objective lens current is supplied to the coil on the objective lens from a power supply under control of the CPU to refocus the beam. As a result, the beam hitting the specimen is prevented from defocusing if a voltage is applied to the specimen. When the strength of the objective lens is varied, scanning signals to the deflection coils are adjusted in response to the variation. Variation in the magnification of the image and rotation of the image are corrected.