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公开(公告)号：US10534256B2
公开(公告)日：2020-01-14
申请号：US15685806
申请日：2017-08-24
Inventor： Amo Chen , Yun-Yue Lin , Ta-Cheng Lien , Hsin-Chang Lee , Chih-Cheng Lin , Jeng-Horng Chen
Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane with a thermal conductive surface; a porous pellicle frame; and a thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame. The porous pellicle frame includes a plurality of pore channels continuously extending from an exterior surface of the porous pellicle frame to an interior surface of the porous pellicle frame.
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公开(公告)号：US09897910B2
公开(公告)日：2018-02-20
申请号：US15395784
申请日：2016-12-30
Inventor： Pei-Cheng Hsu , Chih-Cheng Lin , Ta-Cheng Lien , Wei-Shiuan Chen , Hsin-Chang Lee , Anthony Yen
IPC: G03F1/24 , G03F1/26 , G03F1/48 , H01L21/033 , H01L21/311 , H01L21/3105 , G03F1/80
CPC classification number: G03F1/24 , G03F1/26 , G03F1/48 , G03F1/80 , H01L21/0332 , H01L21/0335 , H01L21/0337 , H01L21/3105 , H01L21/31116
Abstract: A method for forming a lithography mask includes forming a capping layer on a reflective multilayer layer, the capping layer comprising a first material, forming a patterned patterning layer on the capping layer, and introducing a secondary material into the capping layer, the secondary material having an atomic number that is smaller than 15.
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公开(公告)号：US09759997B2
公开(公告)日：2017-09-12
申请号：US14973562
申请日：2015-12-17
Inventor： Amö Chen , Yun-Yue Lin , Ta-Cheng Lien , Hsin-Chang Lee , Chih-Cheng Lin , Jeng-Horng Chen
Abstract: The present disclosure provides an apparatus for a semiconductor lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane with a thermal conductive surface; a porous pellicle frame; and a thermal conductive adhesive layer that secures the pellicle membrane to the porous pellicle frame. The porous pellicle frame includes a plurality of pore channels continuously extending from an exterior surface of the porous pellicle frame to an interior surface of the porous pellicle frame.
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公开(公告)号：US20160349610A1
公开(公告)日：2016-12-01
申请号：US14726317
申请日：2015-05-29
Inventor： Pei-Cheng Hsu , Chih-Cheng Lin , Hsin-Chang Lee , Ta-Cheng Lien , Anthony Yen
CPC classification number: G03F1/64 , G03F7/70741
Abstract: A method for fabricating a pellicle assembly for a lithography process includes fabricating a pellicle frame including a sidewall having a porous material. In some embodiments, the pellicle frame is subjected to an anodization process to form the porous material. The porous material includes a plurality of pore channels extending, in a direction perpendicular to an exterior surface of the sidewall, from the exterior surface to an interior surface of the sidewall. In various embodiments, a pellicle membrane is formed, and the pellicle membrane is attached to the pellicle frame such that the pellicle membrane is suspended by the pellicle frame. Some embodiments disclosed herein further provide a system including a membrane and a pellicle frame that secures the membrane across the pellicle frame. In some examples, a portion of the pellicle frame includes a porous material, where the porous material includes the plurality of pore channels.
Abstract translation: 一种用于制造光刻工艺的防护薄膜组件的方法包括制造防护薄膜组件框架，其包括具有多孔材料的侧壁。 在一些实施例中，对防护薄膜组件框架进行阳极氧化处理以形成多孔材料。 所述多孔材料包括在垂直于所述侧壁的外表面的方向上从所述外表面延伸到所述侧壁的内表面的多个孔通道。 在各种实施方案中，形成防护薄膜，并将防护薄膜组件框架连接到防护薄膜组件框架上，使防护薄膜组件被防尘薄膜框架悬挂。 本文公开的一些实施例还提供了一种包括膜和防护薄膜框架的系统，其将膜跨越防护薄膜框架固定。 在一些实例中，防护薄膜组件框架的一部分包括多孔材料，其中多孔材料包括多个孔隙通道。
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公开(公告)号：US20160187770A1
公开(公告)日：2016-06-30
申请号：US14582459
申请日：2014-12-24
Inventor： Pei-Cheng Hsu , Chih-Cheng Lin , Ta-Cheng Lien , Wei-Shiuan Chen , Hsin-Chang Lee , Anthony Yen
Abstract: A method for forming a lithography mask includes forming a capping layer on a reflective multilayer layer, the capping layer comprising a first material, forming a patterned patterning layer on the capping layer, and introducing a secondary material into the capping layer, the secondary material having an atomic number that is smaller than 15.
Abstract translation: 一种形成光刻掩模的方法包括在反射多层层上形成覆盖层，封盖层包括第一材料，在封盖层上形成图案化图案层，并将次材料引入覆盖层中，第二材料具有 小于15的原子序数。
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Patent Agency Ranking
公开(公告)号：US10295899B2
公开(公告)日：2019-05-21
申请号：US15626643
申请日：2017-06-19
Inventor： Hsin-Chang Lee , Chia-Jen Chen , Chih-Cheng Lin , Ping-Hsun Lin
IPC: G03F1/22 , G03F1/44 , G03F1/54 , G03F1/72 , G03F1/76 , G03F1/78 , G03F1/84 , G03F7/20 , H01L21/027
Abstract: A photomask includes a pattern region and a plurality of defects in the pattern region. The photomask further includes a first fiducial mark outside of the pattern region, wherein the first fiducial mark includes identifying information for the photomask, the first fiducial mark has a first size and a first shape. The photomask further includes a second fiducial mark outside of the pattern region. The second fiducial mark has a second size different from the first size, or a second shape different from the first shape.
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公开(公告)号：US10036951B2
公开(公告)日：2018-07-31
申请号：US14726317
申请日：2015-05-29
Inventor： Pei-Cheng Hsu , Chih-Cheng Lin , Hsin-Chang Lee , Ta-Cheng Lien , Anthony Yen
CPC classification number: G03F1/64 , G03F7/70741
Abstract: A method for fabricating a pellicle assembly for a lithography process includes fabricating a pellicle frame including a sidewall having a porous material. In some embodiments, the pellicle frame is subjected to an anodization process to form the porous material. The porous material includes a plurality of pore channels extending, in a direction perpendicular to an exterior surface of the sidewall, from the exterior surface to an interior surface of the sidewall. In various embodiments, a pellicle membrane is formed, and the pellicle membrane is attached to the pellicle frame such that the pellicle membrane is suspended by the pellicle frame. Some embodiments disclosed herein further provide a system including a membrane and a pellicle frame that secures the membrane across the pellicle frame. In some examples, a portion of the pellicle frame includes a porous material, where the porous material includes the plurality of pore channels.
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公开(公告)号：US09535317B2
公开(公告)日：2017-01-03
申请号：US14582459
申请日：2014-12-24
Inventor： Pei-Cheng Hsu , Chih-Cheng Lin , Ta-Cheng Lien , Wei-Shiuan Chen , Hsin-Chang Lee , Anthony Yen
Abstract: A method for forming a lithography mask includes forming a capping layer on a reflective multilayer layer, the capping layer comprising a first material, forming a patterned patterning layer on the capping layer, and introducing a secondary material into the capping layer, the secondary material having an atomic number that is smaller than 15.
Abstract translation: 一种形成光刻掩模的方法包括在反射多层层上形成覆盖层，封盖层包括第一材料，在封盖层上形成图案化图案层，并将次材料引入覆盖层中，第二材料具有 小于15的原子序数。
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公开(公告)号：US11982936B2
公开(公告)日：2024-05-14
申请号：US17855630
申请日：2022-06-30
Inventor： Hsin-Chang Lee , Ping-Hsun Lin , Yen-Cheng Ho , Chih-Cheng Lin , Chia-Jen Chen
Abstract: A method of fabricating a photomask includes selectively exposing portions of a photomask blank to radiation to change an optical property of the portions of the photomask blank exposed to the radiation, thereby forming a pattern of exposed portions of the photomask blank and unexposed portions of the photomask blank. The pattern corresponds to a pattern of semiconductor device features.
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公开(公告)号：US11914286B2
公开(公告)日：2024-02-27
申请号：US17712596
申请日：2022-04-04
Inventor： Amo Chen , Yun-Yue Lin , Ta-Cheng Lien , Hsin-Chang Lee , Chih-Cheng Lin , Jeng-Horng Chen
IPC: G03F1/62 , G03F1/64 , G03F7/20 , H01L21/027 , G03F1/22
CPC classification number: G03F1/64 , G03F1/22 , G03F1/62 , G03F7/20 , H01L21/0274
Abstract: The present disclosure provides an apparatus for a lithography process in accordance with some embodiments. The apparatus includes a pellicle membrane, a pellicle frame including a material selected from the group consisting of boron nitride (BN), boron carbide (BC), and a combination thereof, a mask, a first adhesive layer that secures the pellicle membrane to the pellicle frame, and a second adhesive layer that secures the pellicle frame to the mask.
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