公开(公告)号：US11086224B2

公开(公告)日：2021-08-10

申请号：US16676588

申请日：2019-11-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Keunhee Bai ,  Jinhong Park ,  Jinseok Heo ,  Seungmin Lee ,  Suntaek Lim

IPC: G03F7/20 ,  H01L21/268

Abstract: Disclosed are a system for fabricating a semiconductor device and a method of fabricating a semiconductor device. The system may include a chamber, an extreme ultraviolet (EUV) source in the chamber and configured to generate an EUV beam, an optical system on the EUV source and configured to provide the EUV beam to a substrate, a substrate stage in the chamber and configured to receive the substrate, a reticle stage in the chamber and configured to hold a reticle that is configured to project the EUV beam onto the substrate, and a particle collector between the reticle and the optical system and configured to allow for a selective transmission of the EUV beam and to remove a particle.

公开(公告)号：US10168627B2

公开(公告)日：2019-01-01

申请号：US15135561

申请日：2016-04-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sungjoo Kim ,  Yun kyeong Jang ,  Jinhong Park ,  Dohyun Seo ,  HyunHoon Lee

IPC: G03F7/20

Abstract: An exposure apparatus and manufacturing methods using the exposure apparatus are disclosed. An exposure apparatus includes a light source system generating light, an optical system controlling and patterning the light, a substrate system on which an exposure process is performed on a substrate by the patterned light, and a control unit controlling the light source system, the optical system and the substrate system. The optical system includes a chamber, a reflection member disposed in the chamber to control the light, and a first on-off valve installed on one side of the chamber opposite to the substrate system. The control unit controls the optical system such that the first on-off valve is opened during the exposure process and is closed during a cleaning process performed to the inside of the chamber.