公开(公告)号：US10168627B2

公开(公告)日：2019-01-01

申请号：US15135561

申请日：2016-04-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sungjoo Kim ,  Yun kyeong Jang ,  Jinhong Park ,  Dohyun Seo ,  HyunHoon Lee

IPC: G03F7/20

Abstract: An exposure apparatus and manufacturing methods using the exposure apparatus are disclosed. An exposure apparatus includes a light source system generating light, an optical system controlling and patterning the light, a substrate system on which an exposure process is performed on a substrate by the patterned light, and a control unit controlling the light source system, the optical system and the substrate system. The optical system includes a chamber, a reflection member disposed in the chamber to control the light, and a first on-off valve installed on one side of the chamber opposite to the substrate system. The control unit controls the optical system such that the first on-off valve is opened during the exposure process and is closed during a cleaning process performed to the inside of the chamber.