公开(公告)号：US09140917B2

公开(公告)日：2015-09-22

申请号：US14108761

申请日：2013-12-17

Applicant: Samsung Display Co., Ltd.

Inventor： Su Mi Lee ,  Min Hyuck Kang ,  Myung Im Kim ,  Tae Woo Kim ,  Seung-Won Park ,  Xie Lei ,  Moon Gyu Lee

IPC: G02F1/155 ,  G02F1/1333 ,  G02F1/1335

CPC classification number: G02F1/1333 ,  G02F1/133528 ,  G02F1/133536 ,  G02F1/133553 ,  G02F1/133555 ,  G02F1/155

Abstract: A method of forming a micropattern structure includes: coating a structure including a plurality of guide blocks extending in a first direction on a substrate and disposed to be spaced apart from each other in a second direction, which is perpendicular to the first direction, with a sacrificial material; ashing a portion of the sacrificial material to expose upper portions of the plurality of guide blocks; coating the structure with a first material having a polarity that is contrary to a polarity of a filling material filling the structure; heat-treating the structure to chemically bond the first material to the upper portions of the plurality of guide blocks; removing the sacrificial material and excess first material to form a first material cap chemically bonded to the upper portions of the plurality of guide blocks; and filling the structure with the filling material.

Abstract translation: 一种形成微图案结构的方法包括：涂覆包括在基板上沿第一方向延伸的多个引导块的结构，并且设置成在垂直于第一方向的第二方向上彼此间隔开， 牺牲材料; 灰化所述牺牲材料的一部分以暴露所述多个引导块的上部; 用具有与填充结构的填充材料的极性相反的极性的第一材料涂覆结构; 对所述结构进行热处理以将所述第一材料化学结合到所述多个引导块的上部; 去除牺牲材料和过量的第一材料，以形成化学键合到多个引导块的上部的第一材料帽; 并用填充材料填充结构。

公开(公告)号：US20150218300A1

公开(公告)日：2015-08-06

申请号：US14466735

申请日：2014-08-22

Applicant: SAMSUNG DISPLAY CO., LTD. ,  SOGANG UNIVERSITY RESEARCH FOUNDATION

Inventor： MIN HYUCK KANG ,  Tae Woo Kim ,  Myung Im Kim ,  Moon Gyu Lee ,  Su Mi Lee ,  Seung-Won Park ,  Lei Xie ,  Bong-Jin Moon ,  Na Na Kang

IPC: C08F299/04 ,  G03F7/40

CPC classification number: G03F7/40 ,  C08F293/00 ,  G03F7/0002 ,  G03F7/405 ,  H01L21/3081

Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.

Abstract translation: 嵌段共聚物包括：第一嵌段和与第一嵌段共聚的第二嵌段。 第二嵌段包括含有环型官能团的甲硅烷基。