DISPLAY APPARATUS AND METHOD OF PROVIDING THE SAME

    公开(公告)号:US20230125691A1

    公开(公告)日:2023-04-27

    申请号:US17747461

    申请日:2022-05-18

    Abstract: A display apparatus includes a light-emitting element, an encapsulation layer covering the light-emitting element, a bank on the encapsulation layer and including an opening corresponding to the light-emitting element, and a quantum-dot layer in the opening of the bank. Roughness of a lower surface of the quantum-dot layer which is closest to the encapsulation layer is different from roughness of an upper surface of the quantum-dot layer which is furthest from the encapsulation layer.

    Substrate polishing apparatus
    13.
    发明授权

    公开(公告)号:US12269140B2

    公开(公告)日:2025-04-08

    申请号:US16411141

    申请日:2019-05-14

    Abstract: A substrate polishing apparatus including a stage configured to load a substrate, the stage having a flat surface, which is parallel to a first direction and a second direction, and on which the substrate is loaded, a pressing unit configured to exert a pressure on the substrate in a third direction, a rotary unit configured to revolve the pressing unit around a central axis parallel to the third direction, when viewed in a plan view, a plurality of polishing pads provided between the pressing unit and the substrate to be in contact with the substrate, and a nozzle part configured to supply a slurry onto the substrate. The polishing pads may be spaced apart from each other in a direction and may have a rectangular shape in the plan view.

Patent Agency Ranking