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    Organic light-emitting device including barrier layer including silicon oxide layer and silicon nitride layer
    11.
    发明授权
    Organic light-emitting device including barrier layer including silicon oxide layer and silicon nitride layer 有权
    有机发光器件包括包括氧化硅层和氮化硅层的阻挡层

    公开(公告)号：US09324776B2

    公开(公告)日：2016-04-26

    申请号：US14860245

    申请日：2015-09-21

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Jae-Seob Lee ,  Dong-Un Jin

    IPC: H01L47/00 ,  H01L27/32

    CPC classification number: H01L27/3274 ,  H01L27/3258 ,  H01L51/5256 ,  H01L51/5296 ,  H01L51/56 ,  H01L2251/5338 ,  H01L2251/55 ,  H01L2251/558

    Abstract: An organic light-emitting device including a barrier layer that includes a silicon oxide layer and a silicon-rich silicon nitride layer. The organic light-emitting device includes a flexible substrate that includes a barrier layer and plastic films disposed under and over the barrier layer. The barrier layer includes a silicon-rich silicon nitride layer and a silicon oxide layer. The order in which the silicon-rich silicon nitride layer and the silicon oxide layer are stacked is not limited and the silicon oxide layer may be first formed and then the silicon-rich silicon nitride layer may be stacked on the silicon oxide layer. The silicon-rich silicon nitride layer has a refractive index of 1.81 to 1.85.

    Abstract translation: 一种包括具有氧化硅层和富硅氮化硅层的阻挡层的有机发光装置。 有机发光装置包括柔性基板，其包括阻挡层和设置在阻挡层下方和上方的塑料膜。 阻挡层包括富含硅的氮化硅层和氧化硅层。 堆积富硅的氮化硅层和氧化硅层的顺序没有限制，可以首先形成氧化硅层，然后将富硅氮化硅层堆叠在氧化硅层上。 富硅氮化硅层的折射率为1.81〜1.85。

    METHOD OF MANUFACTURING FLEXIBLE DISPLAY DEVICE
    13.
    发明申请
    METHOD OF MANUFACTURING FLEXIBLE DISPLAY DEVICE 有权
    制造柔性显示装置的方法

    公开(公告)号：US20140323006A1

    公开(公告)日：2014-10-30

    申请号：US13974000

    申请日：2013-08-22

    Applicant: Samsung Display Co., Ltd.

    Inventor： Hyun-Jung Song ,  Dong-Un Jin

    IPC: H05B33/10

    CPC classification number: H01L51/5237 ,  H01L51/003 ,  H01L51/0097 ,  H01L51/524 ,  H01L51/5256 ,  H01L2251/5338 ,  Y02E10/549 ,  Y02P70/521

    Abstract: A method of manufacturing a flexible display device includes: forming a soft substrate on a carrier substrate; forming a thin film layer comprising a display region on the soft substrate; removing a thin film layer excess portion of the thin film layer beyond an edge of the soft substrate; and separating the soft substrate and the carrier substrate.

    Abstract translation: 制造柔性显示装置的方法包括：在载体基板上形成软基板; 在所述软基板上形成包括显示区域的薄膜层; 去除所述薄膜层的薄膜层多余部分超过所述软基底的边缘; 以及分离软基板和载体基板。

    FLEXIBLE DISPLAY AND METHOD OF MANUFACTURING THE SAME
    17.
    发明申请
    FLEXIBLE DISPLAY AND METHOD OF MANUFACTURING THE SAME 有权

    公开(公告)号：US20210288173A1

    公开(公告)日：2021-09-16

    申请号：US17329306

    申请日：2021-05-25

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： Sang-Joon Seo ,  Hoon-Kee Min ,  Dong-Un Jin ,  Sung-Guk An

    IPC: H01L29/786 ,  C23C16/34 ,  C23C16/40 ,  H01L29/66

    Abstract: A substrate for a flexible display is disclosed. The substrate has a film stress range that does not affect an electronic device such as a thin film transistor, and includes a barrier layer having excellent oxygen and moisture blocking characteristics, and a method of manufacturing the substrate. The substrate includes; a plastic substrate having a glass transition temperature from about 350° C. to about 500° C.; and a barrier layer disposed on the plastic substrate, having a inti layer structure, wherein at least one silicon oxide layer and at least one silicon nitride layer are alternately stacked on each other, and having a film stress from about −200 MPa to about 200 MPa due to the at least one silicon oxide layer and the at least one silicon nitride layer.

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