DISPLAY DEVICE
    11.
    发明申请

    公开(公告)号:US20250048907A1

    公开(公告)日:2025-02-06

    申请号:US18677598

    申请日:2024-05-29

    Abstract: A display device is provided. The display device may include a substrate, a driving element layer on the substrate, and a light emitting element layer on the driving element layer. The light emitting element layer may include a pixel defining layer delimiting sub-pixels, a first electrode of each sub-pixel in an opening of the pixel defining layer, a heating line disposed on the pixel defining layer to surround the first electrode of each sub-pixel, an intermediate layer covering the first electrode in the opening and the pixel defining layer and being partially disconnected above the heating line, and a second electrode continuously covering the intermediate layer and the heating line between adjacent sub-pixels while covering the intermediate layer in the opening. The heating line surrounds a pair of first electrodes corresponding to the adjacent sub-pixels in a form of a Eulerian trail.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE

    公开(公告)号:US20210104588A1

    公开(公告)日:2021-04-08

    申请号:US16879291

    申请日:2020-05-20

    Abstract: A display device includes a base substrate including a display area and a non-display area around the display area are defined, a first interlayer insulating layer disposed on the base substrate, a second interlayer insulating layer disposed on the first interlayer insulating layer, a first semiconductor layer disposed on the second interlayer insulating layer and including an oxide, and a first gate insulating layer disposed on the first semiconductor layer, wherein the material of the first interlayer insulating layer and the material of the second interlayer insulating layer are different from each other. Methods of manufacturing a display device are also disclosed.

    PIXEL AND DISPLAY DEVICE COMPRISING THE SAME
    14.
    发明公开

    公开(公告)号:US20240147768A1

    公开(公告)日:2024-05-02

    申请号:US18334452

    申请日:2023-06-14

    Abstract: A pixel includes: a via layer disposed on a substrate; a first electrode disposed on the via layer; a pixel defining layer disposed on the first electrode, the pixel defining layer including an opening exposing a portion of the first electrode; an emission layer disposed on the portion of the first electrode and the pixel defining layer; and a second electrode disposed on the emission layer. The first electrode includes a first layer disposed on the via layer and a second layer disposed between the first layer and the pixel defining layer. The first layer includes a plurality of sub-insulating layers, each of the plurality of sub-insulating layers including a first sub-layer and a second sub-layer that are sequentially stacked. The first sub-layer and the second sub-layer have different refractive indices.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE

    公开(公告)号:US20230086507A1

    公开(公告)日:2023-03-23

    申请号:US17991396

    申请日:2022-11-21

    Abstract: A display device includes a base substrate including a display area and a non-display area around the display area are defined, a first interlayer insulating layer disposed on the base substrate, a second interlayer insulating layer disposed on the first interlayer insulating layer, a first semiconductor layer disposed on the second interlayer insulating layer and including an oxide, and a first gate insulating layer disposed on the first semiconductor layer, wherein the material of the first interlayer insulating layer and the material of the second interlayer insulating layer are different from each other. Methods of manufacturing a display device are also disclosed.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE DISPLAY DEVICE

    公开(公告)号:US20220278288A1

    公开(公告)日:2022-09-01

    申请号:US17744543

    申请日:2022-05-13

    Abstract: A method of manufacturing a display device includes providing an inorganic layer on a carrier substrate, providing a first flexible substrate on the inorganic layer, providing a first shielding layer including a metal on the first flexible substrate, providing a first barrier layer on the first shielding layer, and providing a thin film transistor layer on the first barrier layer. The inorganic layer includes at least one material selected from silicon nitride (SiNx), silicon oxide (SiOx), and silicon oxynitride (SiOxNy), and a thickness of the inorganic layer is in a range from about 10 Å to about 6000 Å.

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