DISPLAY DEVICE
    13.
    发明申请

    公开(公告)号:US20210293993A1

    公开(公告)日:2021-09-23

    申请号:US17188022

    申请日:2021-03-01

    Abstract: A display device includes a first substrate, a first electrode disposed on the first substrate, an emission layer disposed on the first electrode, a second electrode disposed on the emission layer, a high refractive index member disposed on the second electrode, overlapping the emission layer, and having a first refractive index, a low refractive index member disposed between the high refractive index member and the emission layer and having a second refractive index smaller than the first refractive index, a capping member disposed between the low refractive index member and the emission layer, and a second substrate overlapping at least a portion of the first substrate and disposed on the high refractive index member.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20210143235A1

    公开(公告)日:2021-05-13

    申请号:US17073874

    申请日:2020-10-19

    Abstract: A display device includes a base substrate, a pixel defining layer disposed on the base substrate and including a first opening, a light emitting structure disposed in the first opening of the pixel defining layer, a thin film encapsulation layer disposed on the light emitting structure, a touch electrode disposed on the thin film encapsulation layer, an insulating pattern disposed on the touch electrode and including a second opening which overlaps the first opening, and a high refractive layer disposed on the insulating pattern, the high refractive layer including a plurality of grid patterns disposed on a top surface of the high refractive layer, and a refractive index higher than a refractive index of the insulating pattern.

    PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME
    15.
    发明申请
    PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME 有权
    光电组合物及使用其制造显示装置的方法

    公开(公告)号:US20140242515A1

    公开(公告)日:2014-08-28

    申请号:US13961458

    申请日:2013-08-07

    Abstract: A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.

    Abstract translation: 一种光致抗蚀剂组合物,其包含粘合剂树脂,其包含由化学式1表示的酚醛清漆树脂,二叠氮基感光引发剂和包含碱溶剂和辅助溶剂的溶剂,其中所述基础溶剂包括丙二醇单甲醚乙酸酯,并且所述辅助溶剂包括 二甲基-2-甲基戊二酸酯和β-乙氧基丙酸乙酯,其中在化学式1中,R 1至R 9各自独立地为氢原子或烷基,“a”为0至10的整数,“b”为整数 从0到100,“c”是从1到10的整数。

Patent Agency Ranking