PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME
    1.
    发明申请
    PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME 有权
    光电组合物及使用其制造显示装置的方法

    公开(公告)号:US20140242515A1

    公开(公告)日:2014-08-28

    申请号:US13961458

    申请日:2013-08-07

    Abstract: A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.

    Abstract translation: 一种光致抗蚀剂组合物,其包含粘合剂树脂,其包含由化学式1表示的酚醛清漆树脂,二叠氮基感光引发剂和包含碱溶剂和辅助溶剂的溶剂,其中所述基础溶剂包括丙二醇单甲醚乙酸酯,并且所述辅助溶剂包括 二甲基-2-甲基戊二酸酯和β-乙氧基丙酸乙酯,其中在化学式1中,R 1至R 9各自独立地为氢原子或烷基,“a”为0至10的整数,“b”为整数 从0到100,“c”是从1到10的整数。

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