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公开(公告)号：US20150340197A1
公开(公告)日：2015-11-26
申请号：US14721752
申请日：2015-05-26
IPC分类号： H01J37/147 , H01J37/08 , H01J37/317
CPC分类号： H01J37/1477 , H01J37/08 , H01J37/3171 , H01J2237/30483
摘要： An ion implantation apparatus includes a scanning unit scanning the ion beams in a horizontal direction perpendicular to the reference trajectory and a downstream electrode device disposed downstream of the scanning electrode device. The scanning electrode device includes a pair of scanning electrodes disposed to face each other in the horizontal direction with the reference trajectory interposed therebetween. The downstream electrode device includes an electrode body configured such that, with respect to an opening width in a vertical direction perpendicular to both the reference trajectory and the horizontal direction and/or an opening thickness in a direction along the reference trajectory, the opening width and/or the opening thickness in a central portion in which the reference trajectory is disposed is different from the opening width and/or the opening thickness in the vicinity of a position facing the downstream end of the scanning electrode.
摘要翻译： 离子注入装置包括：扫描单元，沿垂直于参考轨迹的水平方向扫描离子束;以及下游电极装置，设置在扫描电极装置的下游。 扫描电极装置包括一对沿水平方向彼此相对设置的扫描电极，其间插入有基准轨迹。 下游电极装置包括：电极体，其构成为：相对于垂直于基准轨迹和水平方向的垂直方向的开口宽度和/或沿着基准轨迹的方向的开口厚度，开口宽度和 配置基准轨迹的中央部的开口厚度与扫描电极的下游端的位置附近的开口宽度和/或开口厚度不同。
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公开(公告)号：US20180350557A1
公开(公告)日：2018-12-06
申请号：US15992862
申请日：2018-05-30
发明人： Hiroshi Matsushita
IPC分类号： H01J37/304 , H01J37/317 , H01J37/08
CPC分类号： H01J37/304 , H01J37/08 , H01J37/3171 , H01J2237/0473 , H01J2237/30472 , H01J2237/31703
摘要： An ion implanter includes an ion source configured to generate an ion beam including an ion of a nonradioactive nuclide, a beamline configured to support an ion beam irradiated target, and a controller configured to calculate an estimated radiation dosage of a radioactive ray generated by a nuclear reaction between the ion of the nonradioactive nuclide incident into the ion beam irradiated target and the nonradioactive nuclide accumulated in the ion beam irradiated target as a result of ion beam irradiation performed previously.
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公开(公告)号：US09208991B1
公开(公告)日：2015-12-08
申请号：US14721752
申请日：2015-05-26
IPC分类号： H01J3/18 , H01J37/147 , H01J37/317 , H01J37/08
CPC分类号： H01J37/1477 , H01J37/08 , H01J37/3171 , H01J2237/30483
摘要： An ion implantation apparatus includes a scanning unit scanning the ion beams in a horizontal direction perpendicular to the reference trajectory and a downstream electrode device disposed downstream of the scanning electrode device. The scanning electrode device includes a pair of scanning electrodes disposed to face each other in the horizontal direction with the reference trajectory interposed therebetween. The downstream electrode device includes an electrode body configured such that, with respect to an opening width in a vertical direction perpendicular to both the reference trajectory and the horizontal direction and/or an opening thickness in a direction along the reference trajectory, the opening width and/or the opening thickness in a central portion in which the reference trajectory is disposed is different from the opening width and/or the opening thickness in the vicinity of a position facing the downstream end of the scanning electrode.
摘要翻译： 离子注入装置包括：扫描单元，沿垂直于参考轨迹的水平方向扫描离子束;以及下游电极装置，设置在扫描电极装置的下游。 扫描电极装置包括一对沿水平方向彼此相对设置的扫描电极，其间插入有基准轨迹。 下游电极装置包括：电极体，其构成为：相对于垂直于基准轨迹和水平方向的垂直方向的开口宽度和/或沿着基准轨迹的方向的开口厚度，开口宽度和 配置基准轨迹的中央部的开口厚度与扫描电极的下游端的位置附近的开口宽度和/或开口厚度不同。
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公开(公告)号：US20150340202A1
公开(公告)日：2015-11-26
申请号：US14721688
申请日：2015-05-26
IPC分类号： H01J37/317 , H01J37/30
CPC分类号： H01J37/3171 , H01J37/1477 , H01J37/30 , H01J37/3007 , H01J37/317 , H01J2237/15 , H01J2237/1534 , H01J2237/303 , H01J2237/31701
摘要： An ion implantation apparatus includes a scanning unit, the scanning unit including a scanning electrode device that allows a deflecting electric field to act on an ion beam incident along a reference trajectory and scans the ion beam in a horizontal direction, and an upstream electrode device provided upstream of the scanning electrode device. The scanning electrode device includes a pair of scanning electrodes provided to face each other in the horizontal direction with the reference trajectory interposed therebetween and a pair of beam transport correction electrodes provided to face each other in a vertical direction perpendicular to the horizontal direction with the reference trajectory interposed therebetween. Each of the pair of beam transport correction electrode includes a beam transport correction inlet electrode body protruding toward the reference trajectory in the vertical direction in the vicinity of an inlet of the scanning electrode device.
摘要翻译： 离子注入装置包括扫描单元，扫描单元包括扫描电极装置，其允许偏转电场作用在沿着参考轨迹入射的离子束并沿水平方向扫描离子束，并且提供上游电极装置 扫描电极装置的上游。 扫描电极装置包括一对沿水平方向相对设置的扫描电极，其间插入有基准轨迹，并且一对光束传输校正电极被设置为在垂直于水平方向的垂直方向上彼此面对，具有参考 插入其间的轨迹。 一对光束传输校正电极中的每一个包括在扫描电极器件的入口附近沿垂直方向向基准轨迹突出的光束传输校正入口电极体。
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