公开(公告)号：US20160155610A1

公开(公告)日：2016-06-02

申请号：US14944640

申请日：2015-11-18

Applicant: NuFlare Technology, Inc.

Inventor： Ryoh KAWANA ,  Yasuo KATO

IPC: H01J37/317 ,  H01J37/20 ,  H01J37/147

CPC classification number: H01J37/3177 ,  H01J2237/0437 ,  H01J2237/31761

Abstract: A multiple charged particle beam lithography apparatus includes a weighting coefficient operation unit to operate a plurality of weighting coefficients that assign weights to doses of a plurality of different beams used for multiple pattern writing for each pixel of pixels, the each pixel being used as an irradiation unit region per beam of multiple charged particle beams; a dose operation processing circuitry to operate doses of the plurality of different beams weighted by using a corresponding weighting coefficient among the plurality of weighting coefficients for each of the pixels; and a writing mechanism that writes a pattern on a target object using the multiple charged particle beams such that corresponding pixels are irradiated with the plurality of different beams of the doses weighted respectively.

Abstract translation: 多重带电粒子束光刻设备包括加权系数运算单元，用于操作多个加权系数，该多个加权系数为每个像素像素用于多个图案写入的多个不同波束的剂量分配权重，每个像素用作辐射 多束带电粒子束每束的单位区域; 剂量操作处理电路，用于通过使用每个所述像素的所述多个加权系数中的相应的加权系数来操作所述多个不同波束的剂量; 以及写入机构，其使用所述多个带电粒子束将图案写入目标对象，使得相应的像素被照射分别加权的所述多个剂量的不同束。