公开(公告)号：US10732116B2

公开(公告)日：2020-08-04

申请号：US16062127

申请日：2016-12-15

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren

IPC: G01N21/65 ,  G01B11/06 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  G01L1/24

Abstract: A method and system are presented for use in measuring characteristic(s) of patterned structures. The method utilizes processing of first and second measured data, wherein the first measured data is indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of illuminating and/or collected light conditions corresponding to the characteristic(s) to be measured, and the second measured data comprises at least one spectrum obtained from the patterned structure in Optical Critical Dimension (OCD) measurement session. The processing comprises applying model-based analysis to the at least one Raman spectrum and the at least one OCD spectrum, and determining the characteristic(s) of the patterned structure under measurements.

公开(公告)号：US20190317024A1

公开(公告)日：2019-10-17

申请号：US16398297

申请日：2019-04-30

Applicant: NOVA MEASURING INSTRUMENTS LTD.

Inventor： Boris Levant ,  Yanir Hainick ,  Vladimir Machavariani ,  Roy Koret ,  Gilad Barak

IPC: G01N21/956 ,  G03F7/20 ,  G01B11/02 ,  G01N21/95

Abstract: Determining parameters of a patterned structure located on top of an underneath layered structure, where input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase ϕ, PMD=ƒ(Iλ; ϕ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure, and where a general function F is also provided describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD), where the general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.