公开(公告)号：US10381256B2

公开(公告)日：2019-08-13

申请号：US15065430

申请日：2016-03-09

Applicant: KLA-TENCOR CORPORATION

Inventor： Pradeep Subrahmanyan ,  Luping Huang ,  Chris Pohlhammer

IPC: H01L21/683 ,  H01L21/67

Abstract: An apparatus for fixing a wafer, including a chuck having a surface, a plurality of through bores in the chuck extending through the surface of the chuck, a fixed vacuum bellows, and a plurality of floating air bearings, wherein the fixed vacuum bellows and a respective floating air bearing of the plurality of floating air bearings are each individually arranged in separate through bores of the plurality of through bores and elevationally above the surface of the chuck.

公开(公告)号：US10209627B2

公开(公告)日：2019-02-19

申请号：US15413628

申请日：2017-01-24

Applicant: KLA-Tencor Corporation

Inventor： Myungjun Lee ,  Stewart Robertson ,  Mark D. Smith ,  Pradeep Subrahmanyan

IPC: G03B27/52 ,  G03F7/20 ,  G03F1/44

Abstract: A lithography system includes an illumination source, projection optical elements, and a pattern mask. The illumination source includes one or more illumination poles. The pattern mask includes a set of focus-sensitive mask elements distributed with a pitch and, is configured to diffract illumination from the one or more illumination poles. The pitch may be selected such that two diffraction orders of illumination associated with each of the one or more illumination poles are asymmetrically distributed in a pupil plane of the projection optical elements. Further, the projection optical elements may expose a sample with an image of the set of focus-sensitive pattern mask elements based on the two diffraction orders of illumination associated with each of the one or more illumination poles such that one or more printing characteristics is indicative of a position of the sample within a focal volume of the projection optical elements.