公开(公告)号：US08873050B1

公开(公告)日：2014-10-28

申请号：US13969470

申请日：2013-08-16

Applicant: KLA-Tencor Corporation

Inventor： Klaus Flock

IPC: G01J3/28

CPC classification number: G01J3/36 ,  G01J3/18

Abstract: Systems and methods for determining information for a wafer are provided. One system includes a first grating that diffracts light from a wafer having wavelengths in a first portion of a broadband range and does not diffract the light from the wafer having wavelengths in a second portion of the broadband range. The system also includes a second grating positioned in the path of the light that is not diffracted by the first grating. The second grating diffracts the light from the wafer having the wavelengths in the second portion of the broadband range. The system further includes a first detector configured to generate first output responsive to the light diffracted by the first grating and a second detector configured to generate second output responsive to the light diffracted by the second grating.

Abstract translation: 提供了用于确定晶片信息的系统和方法。 一个系统包括第一光栅，其衍射来自具有在宽带范围的第一部分中的波长的晶片的光，并且不衍射具有在宽带范围的第二部分中的波长的晶片的光。 该系统还包括位于不被第一光栅衍射的光的路径中的第二光栅。 第二光栅衍射具有宽带范围第二部分波长的晶片的光。 该系统还包括第一检测器，其被配置为响应于由第一光栅衍射的光产生第一输出，以及第二检测器，被配置为响应于由第二光栅衍射的光产生第二输出。

公开(公告)号：US20140166862A1

公开(公告)日：2014-06-19

申请号：US14103635

申请日：2013-12-11

Applicant: KLA-Tencor Corporation

Inventor： Klaus Flock

IPC: G01N21/95

CPC classification number: G01N21/9501

Abstract: Methods and systems for enhancing the throughput of a metrology system generating measurement signals based on at least two different optical properties of the illumination light are presented. A detector having a two dimensional photosensitive area is subdivided into multiple photosensitive stripes by multiple, independent linear arrays of shift register elements located within the photosensitive area. Charge transfer from pixels within each stripe is directed to a distinct linear array of shift register elements. Each photosensitive stripe is able to resolve an optical property dispersed across the length of each stripe with relatively high resolution. In addition, the detector is able to resolve another optical property dispersed across several photosensitive stripes in a direction orthogonal to each linear array of shift registers at a relatively low resolution.

Abstract translation: 提出了用于增强基于照明光的至少两种不同光学特性产生测量信号的度量系统的吞吐量的方法和系统。 具有二维感光区域的检测器通过位于感光区域内的移位寄存器元件的多个独立的线性阵列被细分为多个光敏条纹。 每个条带内的像素的电荷转移被引导到移位寄存器元件的不同线性阵列。 每个光敏条纹能够以相对较高的分辨率来分辨分散在每个条带的长度上的光学特性。 此外，检测器能够以相对低的分辨率解析在与移位寄存器的每个线性阵列正交的方向上分散在几个光敏条纹上的另一光学性质。

公开(公告)号：US20130245985A1

公开(公告)日：2013-09-19

申请号：US13794337

申请日：2013-03-11

Applicant: KLA-TENCOR CORPORATION

Inventor： Klaus Flock ,  Lawrence Rotter ,  Muzammil Arain

IPC: G05B23/00

CPC classification number: G05B23/00 ,  G03F7/70625

Abstract: Methods and systems for matching critical dimension measurement applications at high precision across multiple optical metrology systems are presented. In one aspect, machine parameter values of a metrology system are calibrated based on critical dimension measurement data. In one further aspect, calibration of the machine parameter values is based on critical dimension measurement data collected by a target measurement system from a specimen with assigned critical dimension parameter values obtained from a reference measurement source. In another further aspect, the calibration of the machine parameter values of a target measurement system is based on measurement data without knowledge of critical dimension parameter values. In some examples, the measurement data includes critical dimension measurement data and thin film measurement data. Calibration of machine parameter values based on critical dimension data enhances application and tool-to-tool matching among systems for measurement of critical dimensions, film thickness, film composition, and overlay.

Abstract translation: 介绍了在多个光学测量系统中以高精度匹配关键尺寸测量应用的方法和系统。 在一个方面，测量系统的机器参数值基于关键尺寸测量数据进行校准。 在另一方面，机器参数值的校准基于由目标测量系统从具有从参考测量源获得的分配的临界尺寸参数值的样本收集的临界尺寸测量数据。 在另一方面，目标测量系统的机器参数值的校准基于测量数据，而不知道关键尺寸参数值。 在一些示例中，测量数据包括临界尺寸测量数据和薄膜测量数据。 基于关键尺寸数据校准机器参数值可增强用于测量关键尺寸，膜厚度，膜成分和覆盖层的系统之间的应用和工具对刀具匹配。