公开(公告)号：US11209737B1

公开(公告)日：2021-12-28

申请号：US16916272

申请日：2020-06-30

Applicant: KLA Corporation

Inventor： Henning Stoschus ,  Stefan Eyring ,  Ulrich Pohlmann ,  Inna Steely-Tarshish ,  Nadav Gutman

IPC: G03F7/20 ,  G06K9/32 ,  G06T7/00

Abstract: A metrology system may include a characterization tool configured to generate metrology data for a sample based on the interaction of an illumination beam with the sample, and may also include one or more adjustable measurement parameters to control the generation of metrology data. The metrology system may include one or more processors that may receive design data associated with a plurality of regions of interest for measurement, select individualized measurement parameters of the characterization tool for the plurality of regions of interest, and direct the characterization tool to characterize the plurality of regions of interest based on the individualized measurement parameters.