公开(公告)号：US20220254667A1

公开(公告)日：2022-08-11

申请号：US17170871

申请日：2021-02-08

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Nikolai Chubun ,  Luca Grella

IPC: H01L21/67 ,  H01J37/147 ,  H01J37/21 ,  G01N23/00

Abstract: An electron source emits an electron beam. The electron beam is received by a beam limiting assembly. The beam limiting assembly has a first beam limiting aperture with a first diameter and a second beam limiting aperture with a second diameter larger than the first diameter. The first beam limiting aperture receives the electron beam. This beam limiting assembly reduces the influence of Coulomb interactions.

公开(公告)号：US11056312B1

公开(公告)日：2021-07-06

申请号：US16782273

申请日：2020-02-05

Applicant: KLA Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/153 ,  H01J37/10

Abstract: A system is disclosed. In embodiments, the system includes an electron source and a micro-lens array (MLA) configured to receive one or more primary electron beams from the electron source and split the one or more primary electron beams into a plurality of primary electron beamlets. In embodiments, the system further includes a micro-stigmator array (MSA) including a plurality of dodecapole electrostatic stigmators, wherein the MSA is configured to eliminate at least one of fourth-order focusing aberrations or sixth-order focusing aberrations of the plurality of primary electron beamlets. In embodiments, the system further includes projection optics configured to receive the plurality of primary electron beamlets and focus the plurality of primary electron beamlets onto a surface of a sample.