公开(公告)号：US09373534B2

公开(公告)日：2016-06-21

申请号：US14083451

申请日：2013-11-19

Applicant: Industrial Technology Research Institute

Inventor： Kuan-Chou Chen ,  Pei-Shan Wu ,  Sheng-Lang Lee ,  Chia-Ming Chen ,  Fu-Ching Tung ,  Jyh-Jone Lee ,  Wan-Sung Lin ,  Kuan-Han Chen

IPC: H01L21/68 ,  H01L21/683 ,  H01L21/687

CPC classification number: H01L21/68 ,  H01L21/68728 ,  H01L21/68764 ,  H01L21/68771 ,  Y10T29/49998

Abstract: A rotary positioning apparatus includes a fixing base, a rotation mechanism, two driving modules and a carrier. The rotation mechanism is disposed on the fixing base, the first driving module is disposed on the fixing base and coupled to the rotation mechanism to drive the rotation mechanism rotating around a first rotation axis relatively to the fixing base. The carrier has plural accommodating slots on a circular-arc surface thereof and is pivoted to the rotation mechanism through a second rotation axis passing through the curvature center of the circular-arc surface and perpendicular to the first rotation axis, on which the curvature center is located. The second driving module is disposed on the rotation mechanism and coupled to the carrier to drive the carrier rotating around the second rotation axis relatively to the rotation mechanism. An automatic pick-and-place system and an operation method using the rotary positioning apparatus are also provided.

Abstract translation: 旋转定位装置包括固定基座，旋转机构，两个驱动模块和载体。 旋转机构设置在固定基座上，第一驱动模块设置在固定基座上并且联接到旋转机构，以驱动围绕相对于固定基座的第一旋转轴线旋转的旋转机构。 载体在其圆弧表面上具有多个容纳槽，并且通过穿过圆弧表面的弯曲中心并垂直于第一旋转轴线的第二旋转轴线枢转到旋转机构，曲率中心为 位于。 第二驱动模块设置在旋转机构上并且联接到载体上以相对于旋转机构驱动围绕第二旋转轴线旋转的载体。 还提供了一种使用旋转定位装置的自动拾放系统和操作方法。

公开(公告)号：US09082801B2

公开(公告)日：2015-07-14

申请号：US13711631

申请日：2012-12-12

Applicant: Industrial Technology Research Institute

Inventor： Pei-Shan Wu ,  Kuan-Chou Chen ,  Sheng-Lang Lee ,  Fu-Ching Tung ,  Chia-Ming Chen

IPC: H01L21/67 ,  H01L21/68 ,  H01L21/687 ,  C23C14/50

CPC classification number: H01L21/68 ,  C23C14/505 ,  H01L21/68764 ,  H01L21/68771 ,  Y10T29/49998

Abstract: A rotatable locating apparatus including a fixing base, a rotatable rack, a first driving module, a carrier, and a second driving module is provided. The rotatable rack is pivoted on the fixing base through a first rotation axis. The first driving module is coupled to the rotatable rack to drive the rotatable rack rotating with respect to the fixing base along the first rotation axis. The carrier is provided with accommodating slots on an arc surface of the carrier, and the carrier is pivoted on the rotatable rack through a second rotation axis. The second rotation axis passes through a curvature center of the arc surface and is perpendicular to the first rotation axis. The curvature center is located on the first rotation axis. The second driving module is coupled to the carrier to drive the carrier rotating with respect to the rotatable rack along the second rotation axis.

Abstract translation: 提供一种包括固定基座，可旋转齿条，第一驱动模块，载体和第二驱动模块的可旋转定位装置。 旋转齿条通过第一旋转轴线在固定基座上枢转。 第一驱动模块耦合到可旋转的齿条，以驱动相对于固定基座沿着第一旋转轴线旋转的可旋转齿条。 载体在载体的弧形表面上设置有容纳槽，并且载体通过第二旋转轴线枢转在可旋转的齿条上。 第二旋转轴线穿过弧形表面的曲率中心并且垂直于第一旋转轴线。 曲率中心位于第一旋转轴上。 第二驱动模块联接到载体以驱动相对于可旋转齿条沿着第二旋转轴线旋转的载体。

公开(公告)号：US09023693B1

公开(公告)日：2015-05-05

申请号：US14138147

申请日：2013-12-23

Applicant: Industrial Technology Research Institute

Inventor： Kung-Liang Lin ,  Chien-Chih Chen ,  Fu-Ching Tung ,  Chih-Yung Chen ,  Shih-Chin Lin ,  Kuan-Yu Lin ,  Chia-Hao Chang ,  Shieh-Sien Wu

IPC: H01L21/00 ,  H01L21/84 ,  H01L21/31 ,  H01L21/469 ,  H01L51/52 ,  C23C16/455 ,  H01L21/02 ,  C23C16/458 ,  C23C16/505

CPC classification number: C23C16/4583 ,  C23C16/455 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45548 ,  C23C16/50 ,  C23C16/505 ,  H01J37/32091 ,  H01J37/3244 ,  H01L21/02274 ,  H01L21/0228 ,  H01L51/5253

Abstract: A multi-mode thin film deposition apparatus including a reaction chamber, a carrying seat, a showerhead, an inert gas supplying source, a first gas inflow system and a second gas inflow system is provided. The carrying seat is disposed in the reaction chamber. The showerhead has a gas mixing room and gas holes disposed at a side of the gas mixing room. The gas mixing room is connected to the reaction chamber through the plurality of gas holes which faces the carrying seat. The first gas inflow system is connected to the reaction chamber and supplies a first process gas during a first thin film deposition process mode. The inert gas supplying source is connected to the gas mixing room for supplying an inert gas. The second gas inflow system is connected to the gas mixing room to supply a second process gas during a second thin film deposition process mode.

Abstract translation: 提供一种多模式薄膜沉积设备，包括反应室，承载座，喷头，惰性气体供应源，第一气体流入系统和第二气体流入系统。 承载座设置在反应室中。 喷头具有设在气体混合室一侧的气体混合室和气孔。 气体混合室通过面向承载座的多个气孔连接到反应室。 第一气体流入系统连接到反应室，并在第一薄膜沉积工艺模式期间提供第一工艺气体。 惰性气体供给源连接到用于供给惰性气体的气体混合室。 第二气体流入系统连接到气体混合室，以在第二薄膜沉积工艺模式期间提供第二工艺气体。