TITANIUM INCORPORATION INTO ABSORBER LAYER FOR SOLAR CELL
    14.
    发明申请
    TITANIUM INCORPORATION INTO ABSORBER LAYER FOR SOLAR CELL 有权
    钛合金进入太阳能电池的吸收层

    公开(公告)号:US20150059855A1

    公开(公告)日:2015-03-05

    申请号:US14013827

    申请日:2013-08-29

    IPC分类号: H01L31/032 H01L31/18

    摘要: A method for fabricating a photovoltaic device includes forming a film including titanium on a conductive layer formed on a substrate. An absorber layer is formed including a Cu—Zn—Sn containing chalcogenide compound with a kesterite structure of the formula: Cu2-xZn1+ySn(S1-zSez)4+q wherein 0≦x≦1; 0≦y≦1; 0≦z≦1; −1≦q≦1 (CZTS) on the film. The absorber layer is annealed to diffuse titanium therein and to recrystallize the CZTS material of the film. A buffer layer is formed on the absorber layer, and a transparent conductive layer is formed on the buffer layer.

    摘要翻译: 一种制造光伏器件的方法包括在形成在衬底上的导电层上形成包含钛的膜。 形成吸收层,其包含含有下式的K酯类结构的含有Cu-Zn-Sn的硫族化合物:Cu2-xZn1 + ySn(S1-zSez)4 + q其中0≦̸ x≦̸ 1; 0≦̸ y≦̸ 1; 0≦̸ z≦̸ 1; -1≦̸ q≦̸ 1(CZTS)上的电影。 将吸收层退火以在其中扩散钛并使膜的CZTS材料再结晶。 在吸收层上形成缓冲层,在缓冲层上形成透明导电层。

    LOW REFLECTION ELECTRODE FOR PHOTOVOLTAIC DEVICES
    15.
    发明申请
    LOW REFLECTION ELECTRODE FOR PHOTOVOLTAIC DEVICES 有权
    用于光伏器件的低反射电极

    公开(公告)号:US20150027521A1

    公开(公告)日:2015-01-29

    申请号:US13948645

    申请日:2013-07-23

    IPC分类号: H01L31/0224 H01L31/18

    摘要: A method for forming a photovoltaic device includes forming a photovoltaic absorption stack on a substrate including one or more of I-III-VI2 and I2-II-IV-VI4 semiconductor material. A transparent conductive contact layer is deposited on the photovoltaic absorption stack at a temperature less than 200 degrees Celsius. The transparent conductive contact layer has a thickness of about one micron and is formed on a front light-receiving surface. The surface includes pyramidal structures due to an as deposited thickness. The transparent conductive contact layer is wet etched to further roughen the front light-receiving surface to reduce reflectance.

    摘要翻译: 一种形成光伏器件的方法包括在包括I-III-VI2和I2-II-IV-VI4半导体材料中的一种或多种的衬底上形成光伏吸收堆叠。 透明导电接触层在低于200摄氏度的温度下沉积在光伏吸收层上。 透明导电接触层的厚度约为1微米,并形成在前光接收表面上。 该表面由于沉积厚度而包括金字塔形结构。 透明导电接触层被湿式蚀刻以进一步粗糙化前光接收表面以降低反射率。