-
公开(公告)号：US20170019983A1
公开(公告)日：2017-01-19
申请号：US15278629
申请日：2016-09-28
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hakaru MIZOGUCHI
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
Abstract translation: 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。
-
12.发明申请TARGET SUPPLY APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS, AND TARGET SUPPLY METHOD 有权目标供应装置，极光紫外线发光装置和目标供应方法公开(公告)号：US20160323986A1
公开(公告)日：2016-11-03
申请号：US15210296
申请日：2016-07-14
Applicant: Gigaphoton Inc.
Inventor： Hirokazu HOSODA , Tsukasa HORI
IPC: H05G2/00
Abstract: A target supply apparatus configured to melt a target and supply a molten target into a chamber, the target generating extreme ultraviolet light when the target is irradiated with a laser beam in the chamber, may include: a pair of electrodes spaced from one another and configured to sandwich the target; and a power source configured to supply a current to a solid target sandwiched between the pair of electrodes via the pair of electrodes to melt the solid target to a core of the solid target.
Abstract translation: 一种被配置为熔化目标并将熔融物体供应到室中的目标供给装置，所述靶在所述室中的激光束照射时产生极紫外光的方法可以包括：一对电极，彼此间隔开并配置 夹心目标; 以及电源，被配置为经由所述一对电极将电流供给夹在所述一对电极之间的固体靶，以将所述固体靶融化为所述固体靶的芯。
-
公开(公告)号：US20160192470A1
公开(公告)日：2016-06-30
申请号：US15062896
申请日：2016-03-07
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Yutaka SHIRAISHI , Tsukasa HORI , Takuya ISHII
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70908 , H05G2/005
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of greater than 90 degrees with the target.
Abstract translation: 极紫外光发生装置可以包括：当在室内的激光束照射靶时在其中产生极紫外光的室; 目标供给部构造成将所述目标物供给到所述室内; 以及目标集电器，其被配置为将目标供给部提供但不被激光束照射的目标物收集在收集容器中，通过在具有大于90度的接触角的接收表面上接收目标， 。
-
公开(公告)号：US20210333718A1
公开(公告)日：2021-10-28
申请号：US17366219
申请日：2021-07-02
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Tsukasa HORI
Abstract: An extreme ultraviolet light generation system according to an aspect of the present disclosure includes a first actuator that changes a travel direction of prepulse laser light to be output from a first optical element arranged on an optical path of the prepulse laser light between a prepulse laser device and a beam combiner, and a second actuator that changes irradiation positions of the prepulse laser light and main pulse laser light to be output from a light concentrating optical system, a plurality of sensors that detect light radiated from a predetermined region by a target being irradiated with the main pulse laser light, and a controller. Here, the controller controls the first actuator so that an evaluation value calculated from output of the plurality of sensors approaches a target value, and thereafter, controls the second actuator so that the evaluation value approaches the target value.
-
15.发明申请公开(公告)号：US20200341383A1
公开(公告)日：2020-10-29
申请号：US16925567
申请日：2020-07-10
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Yutaka SHIRAISHI , Tsukasa HORI
Abstract: A target supply device includes a tank body portion holding a target substance; a communication portion connected to the tank body portion and including a filter that filters the melted target substance and a nozzle that discharges the target substance having passed through the filter; a main heater that heats the tank body portion; a sub-heater that heats the communication portion; and a control unit, the control unit being configured to set the main heater to a temperature higher than a melting point of the target substance before the target substance is melted, to set the sub-heater to a temperature lower than the melting point of the target substance until the target substance in the tank body portion is melted, and to set the sub-heater to a temperature higher than the melting point of the target substance after the target substance in the tank body portion is melted.
-
Patent Agency Ranking
公开(公告)号：US20170215266A1
公开(公告)日：2017-07-27
申请号：US15480454
申请日：2017-04-06
Applicant: Gigaphoton Inc.
Inventor： Toshiyuki HIRASHITA , Fumio IWAMOTO , Tsukasa HORI , Masaki NAKANO
IPC: H05G2/00
Abstract: A vibrator unit may be configured to apply vibration to a target material supplied to an inside of a target flow path. The vibrator unit may include a vibration transmission member to be brought into contact with a first member including the target flow path therein, and a piezoelectric member to be brought into contact with the vibration transmission member. The piezoelectric member may be configured to vibrate in response to an electric signal from the outside. The vibration dumping rate of the vibration transmission member may be smaller than the vibration dumping rate of the first member.
-
公开(公告)号：US20160255709A1
公开(公告)日：2016-09-01
申请号：US15152124
申请日：2016-05-11
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Masaki NAKANO , Tsukasa HORI
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.
Abstract translation: 极紫外光发生装置可以包括：当在室内的激光束照射靶时在其中产生极紫外光的室; 目标供给部构造成将所述目标物供给到所述室内; 以及目标收集器，其被配置为通过在具有等于或小于90度的接触角的接收表面上接收目标而将由目标供给部提供但不被激光束照射的目标收集在收集容器中 与目标。
-
公开(公告)号：US20160128172A1
公开(公告)日：2016-05-05
申请号：US14992506
申请日：2016-01-11
Applicant: GIGAPHOTON INC
Inventor： Tsukasa HORI , Kouji KAKIZAKI , Tatsuya YANAGIDA , Osamu WAKABAYASHI , Hakaru MIZOGUCHI
CPC classification number: H05G2/008 , H01S3/005 , H01S3/0071 , H01S3/09 , H01S3/102 , H01S3/104 , H01S3/1106 , H01S3/1611 , H01S3/1643 , H01S3/1673 , H01S3/2232 , H01S3/2308 , H01S3/2366 , H01S3/2391 , H05G2/003 , H05G2/005
Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.
-
19.发明申请EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT 有权极光紫外线光源装置及产生极光紫外线灯的方法公开(公告)号：US20130284949A1
公开(公告)日：2013-10-31
申请号：US13846852
申请日：2013-03-18
Applicant: GIGAPHOTON INC.
Inventor： Hiroshi KOMORI , Tatsuya YANAGIDA , Yoshifumi UENO , Akira SUMITANI , Akira ENDO , Tsukasa HORI
IPC: G21K5/00
CPC classification number: G21K5/00 , G03F7/70033 , G03F7/70916 , H05G2/003 , H05G2/005 , H05G2/008
Abstract: An EUV (Extreme Ultra Violet) light source device ionizes a target material in an ionizer, and supplies the ionized target material to a point of generating a plasma. This reduces the generation of debris. The ionizer simultaneously irradiates laser beams of plural wavelengths corresponding to the excited level of tin on a target material to ionize the target material. The ionized target material is extracted from the ionizer with a high voltage applied from an ion beam extractor, and accelerated and supplied to a plasma generation chamber. When driver laser beam is irradiated on the ionized target material, a plasma is generated, thereby emitting EUV radiation.
Abstract translation: EUV（Extreme Ultra Violet）光源装置将离子发生器中的目标材料离子化，并将电离靶材材料提供到产生等离子体的点。 这减少了碎片的产生。 离子发生器同时将与激发的锡水平相对应的多个波长的激光束照射在目标材料上以电离目标材料。 电离目标材料从离子束提取器施加的高电压从电离器中提取，并被加速并提供给等离子体产生室。 当驱动激光束照射在电离靶材上时，产生等离子体，从而发射EUV辐射。
-
公开(公告)号：US20190174614A1
公开(公告)日：2019-06-06
申请号：US16268703
申请日：2019-02-06
Applicant: Gigaphoton Inc.
Inventor： Fumio IWAMOTO , Tsukasa HORI , Toshiyuki HIRASHITA
IPC: H05G2/00
Abstract: An extreme ultraviolet light generation device may include a chamber in which a target is irradiated with laser light and extreme ultraviolet light is generated, and a target supply unit configured to eject a target into the chamber. The target supply unit may be provided with a nozzle member including an ejection face having an ejection port configured to eject the target into the chamber. An angle θ1 defined by the ejection face and the gravity axis may satisfy a condition of “0 degrees
-
-
-
-
-
-
-
-
-
Search Results
37
records
(took 0.02 seconds)
