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公开(公告)号：US20210410262A1
公开(公告)日：2021-12-30
申请号：US17314775
申请日：2021-05-07
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA , Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.
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公开(公告)号：US20190313519A1
公开(公告)日：2019-10-10
申请号：US16434196
申请日：2019-06-07
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU , Osamu WAKABAYASHI
Abstract: An extreme ultraviolet light generation system includes: a target supply unit configured to output a target toward a predetermined region; a drive laser configured to output a drive laser beam in a first duration; a guide laser configured to output a guide laser beam; a beam combiner configured to substantially align the optical path axes of the drive and guide laser beams and output the laser beams; a laser beam focusing optical system configured to focus the laser beams output from the beam combiner to the predetermined region; an actuator configured to change the focusing positions of the laser beams through the laser beam focusing optical system; an optical sensor configured to detect reflected light of the guide laser beam from the target; and a control unit configured to control the actuator so that the light amount of the reflected light thus detected increases in a second duration.
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公开(公告)号：US20190289707A1
公开(公告)日：2019-09-19
申请号：US16434197
申请日：2019-06-07
Applicant: Gigaphoton Inc.
Inventor： Yuichi NISHIMURA , Takayuki YABU , Yoshifumi UENO
Abstract: An EUV light generation system includes: a target supply unit; a prepulse laser that outputs a prepulse laser beam; a main pulse laser that outputs a main pulse laser; a light focusing optical system that focuses the prepulse and main pulse laser beams on a predetermined region; an actuator that changes a focusing position of the prepulse laser beam by the light focusing optical system; a first sensor that captures an image of a target; and a control unit that stores a reference position of the actuator, calculates a predetermined parameter on the target after irradiation with the prepulse laser beam and before irradiation with the main pulse laser beam based on image data obtained from the first sensor, and controls the actuator to approach the reference position if the predetermined parameter does not satisfy a first condition.
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公开(公告)号：US20180352641A1
公开(公告)日：2018-12-06
申请号：US16055274
申请日：2018-08-06
Applicant: GIGAPHOTON INC.
Inventor： Yuichi NISHIMURA , Takayuki YABU
CPC classification number: H05G2/008 , G01J1/4209 , G01J1/4257 , G01J1/429 , G03F7/70033 , H05G2/00 , H05G2/003 , H05G2/006
Abstract: An extreme ultraviolet light generating apparatus moves a generation position of extreme ultraviolet light based on an instruction from an external device and includes a chamber in which a target fed therein is irradiated with laser light so that the extreme ultraviolet light is generated from the target; a target feeder configured to output and feed the target into the chamber; a condensing mirror configured to condense the laser light on the target fed into the chamber; a stage configured to regulate a position of the target feeder; a manipulator configured to regulate a position of the condensing mirror; and a control unit configured to be able to control at least one of the stage, the manipulator, and a radiation timing of the laser light to the target, in a feedforward method, when the generation position is moved during generation of the extreme ultraviolet light.
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公开(公告)号：US20180199422A1
公开(公告)日：2018-07-12
申请号：US15912628
申请日：2018-03-06
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU
CPC classification number: H05G2/008 , G03F7/70033 , H05G2/00 , H05G2/006
Abstract: An extreme ultraviolet light generating system repetitively outputs extreme ultraviolet light emitted by a target that turns into plasma by being irradiated with a pulsed laser beam. The extreme ultraviolet light generating system may include: a target supply unit that sequentially supplies the target to a plasma generating region set within a chamber, an actuator connected to a laser beam focusing system that focuses the pulsed laser beam output from a laser apparatus that adjusts the focusing position of the pulsed laser beam, an extreme ultraviolet light generation controller that controls the extreme ultraviolet light generating system to output extreme ultraviolet light based on a burst pattern, and an actuator controller that controls the actuator to compensate for shifts of the focusing position of the pulsed laser beam during a burst operation by feedforward control.
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Patent Agency Ranking
公开(公告)号：US20180173102A1
公开(公告)日：2018-06-21
申请号：US15888109
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU
Abstract: An extreme ultraviolet light generation device may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target with laser light output by a laser device, in a generation region therein; a target supply unit configured to output the target as a droplet toward the generation region; a droplet detector configured to detect the droplet in a detection region; and a controller. The droplet detector may transmit, to the controller, a pass timing signal indicating a timing when the droplet passes through the detection region. The controller may include a noise compensation unit configured to compensate for noise of the pass timing signal caused by an electromagnetic wave from the plasma, and transmit a trigger signal that gives a trigger to output the laser light to the laser device based on the pass timing signal in which the noise is compensated for.
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17.发明申请公开(公告)号：US20170358442A1
公开(公告)日：2017-12-14
申请号：US15671691
申请日：2017-08-08
Applicant: Gigaphoton Inc.
Inventor： Hirokazu HOSODA , Takayuki YABU , Hideo HOSHINO
IPC: H01L21/027 , H05G2/00
CPC classification number: H01L21/027 , G03F7/70558 , H05G2/00 , H05G2/006 , H05G2/008
Abstract: A target image-capture device may be configured to capture an image of a target that is made into plasma when irradiated with laser light and generates extreme-ultraviolet-light. The target image-capture device may include a droplet detector configured to detect passage of a droplet output as the target, and output a detection signal, an illumination light source, an image capturing element, a shutter device, and a controller configured to output, to the image capturing element, an exposure signal allowing the image capturing element to perform image capturing, and output, to the shutter device, a shutter open/close signal allowing a shutter to perform an open and close operation upon input of the detection signal. The controller may output the shutter open/close signal to the shutter device to make the shutter closed during when the droplet is irradiated with the laser light so that the plasma is generated.
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18.发明申请公开(公告)号：US20170205713A1
公开(公告)日：2017-07-20
申请号：US15480190
申请日：2017-04-05
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU
IPC: G03F7/20
CPC classification number: G03F7/7055 , G03F7/70025 , G03F7/70033 , H01L21/027 , H05G2/006 , H05G2/008
Abstract: An extreme ultraviolet light generating apparatus may include: a chamber, in which extreme ultraviolet light is generated; a target supply unit that outputs a target into the chamber as droplets to supply the target to a plasma generating region; a stage that moves the target supply unit in a direction substantially perpendicular to the trajectory of droplets output from the target supply unit; a droplet detector provided between the target supply unit and the plasma generating region at an inclination of a predetermined angle with respect to a substantially vertical direction, that detects the droplets from a direction inclined at the predetermined angle; and a calculation control unit that controls the irradiation timings of the laser beam at which the laser beam is irradiated onto the droplets within the plasm generating region, by adding delay times to the timings at which the droplets are detected by the droplet detector.
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公开(公告)号：US20200044407A1
公开(公告)日：2020-02-06
申请号：US16595782
申请日：2019-10-08
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Yoshifumi UENO , Takayuki YABU , Yoshiaki KUROSAWA
Abstract: A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.
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公开(公告)号：US20200037429A1
公开(公告)日：2020-01-30
申请号：US16595610
申请日：2019-10-08
Applicant: Gigaphoton Inc.
Inventor： Takayuki YABU
IPC: H05G2/00
Abstract: A target measuring apparatus includes: an image capturing unit configured to capture a picture image of a target output from a target supply unit; a moving unit configured to move at least a part of the image capturing unit; and a control unit configured to perform a first process of updating information on a coordinate system in the picture image based on an amount of movement of the image capturing unit by the moving unit, and a second process of measuring a parameter of the target based on the image captured by the image capturing unit and the information on the coordinate system. Updating the information on the coordinate system can calibrate a deviation of a measurement result of the target due to movement of the image capturing unit.
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