公开(公告)号：US20160323986A1

公开(公告)日：2016-11-03

申请号：US15210296

申请日：2016-07-14

Applicant: Gigaphoton Inc.

Inventor： Hirokazu HOSODA ,  Tsukasa HORI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: A target supply apparatus configured to melt a target and supply a molten target into a chamber, the target generating extreme ultraviolet light when the target is irradiated with a laser beam in the chamber, may include: a pair of electrodes spaced from one another and configured to sandwich the target; and a power source configured to supply a current to a solid target sandwiched between the pair of electrodes via the pair of electrodes to melt the solid target to a core of the solid target.

Abstract translation: 一种被配置为熔化目标并将熔融物体供应到室中的目标供给装置，所述靶在所述室中的激光束照射时产生极紫外光的方法可以包括：一对电极，彼此间​​隔开并配置 夹心目标; 以及电源，被配置为经由所述一对电极将电流供给夹在所述一对电极之间的固体靶，以将所述固体靶融化为所述固体靶的芯。

公开(公告)号：US20250126697A1

公开(公告)日：2025-04-17

申请号：US18882498

申请日：2024-09-11

Applicant: Gigaphoton Inc.

Inventor： Yoshiyuki HONDA ,  Hirokazu HOSODA ,  Tomoyoshi TOIDA

IPC: H05G2/00 ,  H01S3/00

Abstract: An extreme ultraviolet light generation apparatus includes a chamber, a target supply unit configured to supply a target into the chamber, a prepulse laser configured to generate a diffusion target having a Gaussian distribution shape convex toward a travel direction of prepulse laser light by irradiating the target with the prepulse laser light, and a main pulse laser configured to generate extreme ultraviolet light by irradiating the diffusion target with main pulse laser light having an intensity distribution of a Gaussian distribution shape.

公开(公告)号：US20190250517A1

公开(公告)日：2019-08-15

申请号：US16389867

申请日：2019-04-19

Applicant: Gigaphoton Inc.

Inventor： Hirokazu HOSODA

IPC: G03F7/20 ,  H05G2/00 ,  H04N5/225

CPC classification number: G03F7/70033 ,  G03F7/20 ,  H04N5/2256 ,  H05G2/008

Abstract: A target image capturing device according to an aspect of the present disclosure includes: a delay circuit configured to receive a timing signal from outside and output a first trigger signal at a timing delayed by a first delay time from the reception of the timing signal; an illumination light source configured to emit light based on the first trigger signal; an image capturing unit disposed to capture an image of a shadow of a target to be observed, which is generated when the target is irradiated with the light emitted from the illumination light source; a processing unit configured to perform image processing including processing of measuring a background luminance from the image captured by the image capturing unit; and a control unit configured to perform control to adjust the first delay time based on the background luminance.

公开(公告)号：US20180177036A1

公开(公告)日：2018-06-21

申请号：US15895521

申请日：2018-02-13

Applicant: Gigaphoton Inc.

Inventor： Hirokazu HOSODA ,  Toru SUZUKI

IPC: H05G2/00

Abstract: The extreme ultraviolet light generating apparatus may include a chamber having a window through which a pulse laser beam enters, a target supply unit configured to output at least one target toward a predetermined region in the chamber, a target image capturing device configured to capture an image of the at least one target, a first actuator configured to move a focused area focused by the target image capturing device, and a controller configured to control the first actuator based on a signal from an external device.

公开(公告)号：US20170215267A1

公开(公告)日：2017-07-27

申请号：US15480400

申请日：2017-04-06

Applicant: GIGAPHOTON INC.

Inventor： Tamotsu ABE ,  Yoshifumi UENO ,  Hirokazu HOSODA ,  Takashi SAITO

IPC: H05G2/00 ,  G21K1/06

CPC classification number: H05G2/008 ,  G21K1/06 ,  H05G2/005 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.

公开(公告)号：US20170171955A1

公开(公告)日：2017-06-15

申请号：US15430737

申请日：2017-02-13

Applicant: GIGAPHOTON INC.

Inventor： Yoshifumi UENO ,  Hirokazu HOSODA ,  Takayuki YABU

IPC: H05G2/00 ,  H01S3/10 ,  H05H1/24 ,  H01L21/027

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H01L21/027 ,  H01S3/10061 ,  H05G2/003 ,  H05G2/006 ,  H05H1/24 ,  H05H15/00

Abstract: An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.