公开(公告)号：US10102938B2

公开(公告)日：2018-10-16

申请号：US15953774

申请日：2018-04-16

Applicant: Gigaphoton Inc.

Inventor： Takayuki Yabu ,  Tamotsu Abe ,  Kenichi Miyao ,  Tooru Abe

IPC: G21K1/06 ,  H05G2/00 ,  G03F7/00 ,  G03F7/20

Abstract: An extreme ultraviolet light generating apparatus may include a chamber including a window to allow first and second pulse laser beams to enter, a mirror to reflect the first pulse laser beam, a first actuator to control a position or a posture of the mirror, a beam combiner to cause optical paths of the first and second pulse laser beams to substantially coincide with each other, a reflective optical system to reflect the first and second pulse laser beams from the beam combiner, a second actuator to control a position or a posture of the reflective optical system, sensors each configured to output data for detecting a position of an optical path of the first pulse laser beam, and a controller to control the first actuator based on the data and control the second actuator based on a value related to control of the first actuator.

公开(公告)号：US09942973B2

公开(公告)日：2018-04-10

申请号：US15480400

申请日：2017-04-06

Applicant: GIGAPHOTON INC.

Inventor： Tamotsu Abe ,  Yoshifumi Ueno ,  Hirokazu Hosoda ,  Takashi Saito

IPC: H05G2/00 ,  G21K1/06

CPC classification number: H05G2/008 ,  G21K1/06 ,  H05G2/005 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.

公开(公告)号：US09872372B2

公开(公告)日：2018-01-16

申请号：US15379230

申请日：2016-12-14

Applicant: Gigaphoton Inc.

Inventor： Atsushi Ueda ,  Shinji Nagai ,  Yoshifumi Ueno ,  Tamotsu Abe

IPC: H05G2/00 ,  G21K1/14 ,  G21K1/06

CPC classification number: H05G2/008 ,  G21K1/067 ,  H05G2/005

Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.

公开(公告)号：US09578730B2

公开(公告)日：2017-02-21

申请号：US14995636

申请日：2016-01-14

Applicant: Gigaphoton Inc.

Inventor： Tamotsu Abe ,  Osamu Wakabayashi

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber; a target generation unit configured to output a target to a predetermined region inside the chamber; a focusing optical system configured to concentrate a pulse laser beam to the predetermined region; and a plurality of scattered light detectors each configured to detect scattered light from the target irradiated with the pulse laser beam. The extreme ultraviolet light generation apparatus may further include: an optical path changer configured to change an optical path of the pulse laser beam; and an optical path controller configured to control the optical path changer on a basis of results of detection by the plurality of scattered light detectors.

Abstract translation: 极紫外光发生装置可以包括：腔室; 目标产生单元，被配置为将目标输出到所述室内的预定区域; 配置成将脉冲激光束集中到所述预定区域的聚焦光学系统; 以及多个散射光检测器，每个散射光检测器被配置为检测由脉冲激光束照射的来自目标的散射光。 所述极紫外光发生装置还可以包括：光路变换器，被配置为改变所述脉冲激光束的光路; 以及光路控制器，被配置为基于多个散射光检测器的检测结果来控制光路变换器。

公开(公告)号：US09310686B2

公开(公告)日：2016-04-12

申请号：US13953350

申请日：2013-07-29

Applicant: GIGAPHOTON INC.

Inventor： Takayuki Yabu ,  Tamotsu Abe

IPC: B05B5/025 ,  G03F7/20 ,  B05B5/053 ,  B05B12/02 ,  H05G2/00

CPC classification number: G03F7/2004 ,  B05B5/0255 ,  B05B5/0531 ,  B05B12/02 ,  G03F7/70033 ,  H05G2/003

Abstract: A target supply method uses a target supply device that includes a target generation unit having a nozzle, a pressure control unit having a pressure sensor and an actuator, an electrode, a potential application unit, and a timer; further, the method include raising the pressure inside the target generation unit to a setting pressure by the actuator, applying different potentials to the electrode and a target material from each other by the potential application unit in the case where it is detected that the pressure inside the target generation unit is halfway raised to the setting pressure, and applying a constant first potential to the target material and a first pulse voltage to the electrode by the potential application unit to extract the target material with electrostatic force in the case where it is detected that the pressure inside the target generation unit has been raised to the setting pressure.

Abstract translation: 目标供给方法使用包括具有喷嘴的目标产生单元，具有压力传感器和致动器的压力控制单元，电极，潜在施加单元和定时器的目标供给装置; 此外，该方法包括：通过致动器将目标产生单元内的压力升高到设定压力，在检测到内部的压力的情况下，通过潜在施加单元在电极和目标材料之间施加不同的电位 目标产生单元中途升高到设定压力，并且通过潜在施加单元向目标材料施加恒定的第一电位和第一脉冲电压，以在检测到的情况下用静电力提取目标材料 目标产生单元内的压力已升至设定压力。

公开(公告)号：US08705035B2

公开(公告)日：2014-04-22

申请号：US13744334

申请日：2013-01-17

Applicant: Gigaphoton Inc.

Inventor： Takanobu Ishihara ,  Tamotsu Abe ,  Osamu Wakabayashi

IPC: G01N21/00

CPC classification number: B05B17/06 ,  B05B5/001 ,  B05B5/035 ,  B05B12/082 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A device for determining a target generation condition for a target generator which is driven by a pulse voltage to generate a droplet of a target material may include a detector configured to detect a target generated by the target generator and output a detection signal of the target, and a controller configured to control a pulse duration of the pulse voltage for driving the target generator. The controller can determine whether or not a target is generated by the target generator based on the detection signal, and determine whether or not the generated target includes a plurality of droplets based on the detection signal.

Abstract translation: 用于确定由脉冲电压驱动以产生目标材料的液滴的目标发生器的目标生成条件的装置可以包括检测器，被配置为检测由目标发生器产生的目标并输出目标的检测信号， 以及控制器，被配置为控制用于驱动目标发生器的脉冲电压的脉冲持续时间。 控制器可以基于检测信号来确定目标发生器是否产生目标，并且基于检测信号来确定生成的目标是否包括多个液滴。