公开(公告)号：US10009991B2

公开(公告)日：2018-06-26

申请号：US15019577

申请日：2016-02-09

Applicant: GIGAPHOTON INC.

Inventor： Toshihiro Nishisaka ,  Yoshiaki Kato ,  Fumio Iwamoto

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.

公开(公告)号：US09883574B2

公开(公告)日：2018-01-30

申请号：US15161628

申请日：2016-05-23

Applicant: GIGAPHOTON INC.

Inventor： Fumio Iwamoto ,  Takashi Saito ,  Tsukasa Hori ,  Osamu Wakabayashi

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/005

Abstract: An aspect of the present disclosure may include a gas lock cover secured to a nozzle holder and provided downstream of a nozzle. The gas lock cover may cover a periphery of an exit of the nozzle and be structured to guide gas supplied from a gas supply unit. The gas lock cover may include a hollow cylindrical part provided downstream of the nozzle and having an exit opening for outputting droplets that are outputted from the nozzle and pass through an internal cavity of the cylindrical part. The gas lock cover may include a channel for transmitting the gas supplied from the gas supply unit, the channel being structured to orient a flow of the transmitted gas so as to flow to the exit opening of the cylindrical part through the internal cavity of the cylindrical part.

公开(公告)号：US09854658B2

公开(公告)日：2017-12-26

申请号：US15152124

申请日：2016-05-11

Applicant: Gigaphoton Inc.

Inventor： Fumio Iwamoto ,  Masaki Nakano ,  Tsukasa Hori

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated when a target is irradiated with a laser beam inside the chamber; a target supply part configured to supply the target into the chamber; and a target collector configured to collect the target which is supplied by the target supply part but is not irradiated with the laser beam in a collection container, by receiving the target on a receiving surface having a contact angle of equal to or smaller than 90 degrees with the target.

公开(公告)号：US11067907B2

公开(公告)日：2021-07-20

申请号：US16987739

申请日：2020-08-07

Applicant: Gigaphoton Inc.

Inventor： Masaki Nakano ,  Fumio Iwamoto

IPC: G03F7/20 ,  H05G2/00

Abstract: A target supply device includes a vibrating element driven by a square wave electric signal and configured to generate a droplet of a target substance by vibrating the target substance to be output from a nozzle through a vibration propagating path; a temperature adjusting mechanism configured to adjust, to a specified temperature, a temperature of a vibration propagating path member including at least part of the vibration propagating path; a droplet detecting unit configured to output a signal containing information on a droplet detection interval indicating a time interval of droplets continuously generated; and a control unit configured to determine, based on the droplet detection interval, an operation specified temperature that is the specified temperature of the vibration propagating path member and an operation duty value that is a duty value of the electric signal used for driving the vibrating element when the droplet is irradiated with the laser beam.

公开(公告)号：US10251253B2

公开(公告)日：2019-04-02

申请号：US15888110

申请日：2018-02-05

Applicant: Gigaphoton Inc.

Inventor： Fumio Iwamoto ,  Tsukasa Hori ,  Toshiyuki Hirashita

IPC: H05G2/00

Abstract: An extreme ultraviolet light generation device may include a chamber in which a target is irradiated with laser light and extreme ultraviolet light is generated, and a target supply unit configured to eject a target into the chamber. The target supply unit may be provided with a nozzle member including an ejection face having an ejection port configured to eject the target into the chamber. An angle θ1 defined by the ejection face and the gravity axis may satisfy a condition of “0 degrees