公开(公告)号：US20050103967A1

公开(公告)日：2005-05-19

申请号：US10713055

申请日：2003-11-17

Applicant: Daniel Galburt ,  Mark Williams

Inventor： Daniel Galburt ,  Mark Williams

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  B65D19/00

CPC classification number: G03F7/70766

Abstract: An apparatus for stabilizing a scanning system during lithographic processing comprises a baseframe, a reaction mass, and a pair of flexures connecting the reaction mass to the baseframe. The apparatus also comprises a second reaction mass and a second pair of flexures, placed in parallel to the first to form a split reaction mass system. The apparatus is configured such that, upon acceleration of a stage movably coupled to the reaction masses, a resulting load is split substantially evenly between the first and second reaction masses. Also upon acceleration of the stage, the first reaction mass rotates in the opposite direction of the second reaction mass, resulting in a net moment reaction on the baseframe of approximately zero.

Abstract translation: 用于在光刻处理期间稳定扫描系统的装置包括基架，反作用块和将反作用块连接到基架的一对挠曲件。 该装置还包括与第一反应物质平行的第二反应物质和第二对弯曲物，以形成分裂反应物质体系。 该装置被构造成使得在可移动地联接到反作用块的载物台加速时，所得载荷在第一和第二反作用块之间基本上均匀分离。 此外，在加速阶段时，第一反应物质沿第二反应物质的相反方向旋转，导致基架上的净力矩反应大约为零。

公开(公告)号：US06853440B1

公开(公告)日：2005-02-08

申请号：US10406602

申请日：2003-04-04

Applicant: Engelbertus Antonius Fransiscus Van De Pasch ,  Marcel Hendrikus Maria Beems ,  Hendricus J. M. Meijer ,  Daniel Galburt ,  Erik Roelof Loopstra

Inventor： Engelbertus Antonius Fransiscus Van De Pasch ,  Marcel Hendrikus Maria Beems ,  Hendricus J. M. Meijer ,  Daniel Galburt ,  Erik Roelof Loopstra

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62 ,  G03B27/68

CPC classification number: G03F7/70775 ,  G03F7/70233 ,  G03F7/70283 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7034

Abstract: In a reflective lithographic projection apparatus, shifts in the image of a pattern of a mask in the scanning direction caused by variations in the position of the pattern surface of the mask along the optical axis are corrected by shifting of the relative position of the mask and/or the substrate in the scanning direction. Correction of the image rotation error may also be accomplished by rotation of the relative positions of the mask and/or the substrate about the optical axis. Variations in the position of the pattern surface of the mask along the optical axis may be determined by interferometers upon installation of the mask to the lithographic projection apparatus. The variations may be mapped and stored to provide control of the lithographic projection apparatus.

Abstract translation: 在反射式平版印刷投影装置中，通过掩模的相对位置的移动来校正沿着光轴沿掩模的图案表面的位置变化引起的扫描方向上的掩模图案的偏移， /或基板在扫描方向上。 图像旋转误差的校正也可以通过围绕光轴旋转掩模和/或基底的相对位置来实现。 沿着光轴的掩模的图案表面的位置的变化可以在将掩模安装到光刻投影设备时由干涉仪确定。 可以映射和存储变化以提供光刻投影设备的控制。

公开(公告)号：US20050274173A1

公开(公告)日：2005-12-15

申请号：US10854429

申请日：2004-05-27

Applicant: Earl Ebert ,  Daniel Galburt ,  Joseph Lyons

Inventor： Earl Ebert ,  Daniel Galburt ,  Joseph Lyons

IPC: G01B13/12 ,  G01B17/00

CPC classification number: G01B13/12

Abstract: A gas gauge proximity sensor modulates a gas stream that is used to feed reference and measurement air gauges, respectively, in a reference portion proximate a reference surface and a measurement portion proximate a measurement surface. The gas stream can be modulated at a frequency at which there is minimal acoustical interference energy (e.g., minimal noise) in demodulated output signal. The sensor output can be filtered so that a measurement signal includes only the modulated frequency and side bands of that frequency to include the desired response band of the device as a whole. The filtered signal can be demodulated using a demodulator operating at a same frequency as the modulator to produce the demodulated output signal. In this embodiment, substantially only ambient acoustical energy in the band pass region may interfere with the device operation. Alternatively, the modulation can be introduced through the reference portion. A reference nozzle sets up a pressure field with the reference surface. A carrier frequency can be generated by mechanical motion of the reference surface. For example, this motion can be introduced by a mechanism like a piezoelectric device or a voice coil coupled to the reference surface. The modulated gas flow combines with the other gas flows to produce a modulated combined gas flow.

Abstract translation: 气体计量接近传感器调节用于分别在靠近参考表面的参考部分和靠近测量表面的测量部分供给参考和测量气量计的气流。 气体流可以在解调输出信号中具有最小声学干扰能量（例如最小噪声）的频率下进行调制。 可以对传感器输出进行滤波，使得测量信号仅包括该频率的调制频率和边带，以包括整个设备的期望响应频带。 可以使用与调制器工作在相同频率的解调器来解调经滤波的信号，以产生解调的输出信号。 在该实施例中，带通区域中基本上只有环境声能可能会干扰器件操作。 或者，可以通过参考部分引入调制。 参考喷嘴与参考表面建立一个压力场。 可以通过参考表面的机械运动来产生载波频率。 例如，该运动可以通过耦合到参考表面的压电装置或音圈等机构引入。 经调制的气流与其他气流结合以产生调制的组合气流。

公开(公告)号：US06965427B2

公开(公告)日：2005-11-15

申请号：US10896235

申请日：2004-07-22

Applicant: Daniel Galburt ,  Jos de Klerk

Inventor： Daniel Galburt ,  Jos de Klerk

IPC: H01L21/027 ,  G03B27/32 ,  G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/58

CPC classification number: G03F7/70533 ,  G03B27/32 ,  G03F7/70733 ,  G03F9/7003

Abstract: A lithography system and method are used to increase throughput using multiple reticles to pattern multiple substrates that are positioned with respect to one another according to a predetermined sequence. For example, during a first exposure period a first reticle patterns a first set of substrates, during a second exposure period a second reticle patterns a second set of substrates, during a third exposure period the first reticle patterns a third set of substrates, etc., until all desired substrates are patterned. It is to be appreciate that after the first and second reticles are complete, third and fourth reticles can pattern the first, second, third, etc. sets of substrates.

Abstract translation: 使用光刻系统和方法来增加使用多个掩模版的产量，以根据预定的顺序对相对于彼此定位的多个基板进行图案化。 例如，在第一曝光期间，第一掩模版图案化第一组基板，在第二曝光期间，第二掩模版图案化第二组基板，在第三曝光期间，第一掩模版图案第三组基板等。 ，直到所有期望的基底被图案化为止。 应当理解，在第一和第二掩模版完成之后，第三和第四掩模版可以对第一，第二，第三等离子体基板进行图案化。

公开(公告)号：US20050162636A1

公开(公告)日：2005-07-28

申请号：US11083314

申请日：2005-03-18

Applicant: Daniel Galburt ,  Jos de Klerk

Inventor： Daniel Galburt ,  Jos de Klerk

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G03B27/58

CPC classification number: G03F7/70533 ,  G03F7/70733 ,  G03F9/7003

Abstract: A lithography system and method are used to increase throughput using multiple reticles to pattern multiple substrates that are positioned with respect to one another according to a predetermined sequence. For example, during a first exposure period a first reticle patterns a first set of substrates, during a second exposure period a second reticle patterns the first set of substrates and a second set of substrates, and during a third exposure period the first reticle patterns the second set of substrates, etc. This can continue with further pairs of substrates until all desired substrates are patterned. It is to be appreciated that after the first and second reticles are complete, third and fourth reticles can pattern the first and second, sets of substrates. As another example, other sequences can also be performed using four exposure periods.

Abstract translation: 使用光刻系统和方法来增加使用多个掩模版的产量，以根据预定的顺序对相对于彼此定位的多个基板进行图案化。 例如，在第一曝光期间，第一掩模版图案化第一组基板，在第二曝光期间，第二掩模版图案第一组基板和第二组基板，并且在第三曝光期间，第一掩模版图案 第二组衬底等。这可以继续进一步的另外的衬底对，直到所有期望的衬底被图案化为止。 应当理解，在第一和第二掩模版完成之后，第三和第四掩模版可以对第一和第二组基片进行图案化。 作为另一示例，也可以使用四个曝光周期来执行其他序列。

公开(公告)号：US20050077484A1

公开(公告)日：2005-04-14

申请号：US11002429

申请日：2004-12-03

Applicant: Daniel Galburt ,  Todd Bednarek

Inventor： Daniel Galburt ,  Todd Bednarek

IPC: H01L21/027 ,  G03F7/20 ,  G01N23/00

CPC classification number: G03F7/70725

Abstract: A trajectory planning process receives data generated by high-level control software. This data defines positions and scan velocities. The trajectory planning process creates sequences of constant acceleration intervals that allow critical motions to be executed at maximum throughput. The trajectory planning process outputs a profile. A profile executor, using the profile output by the trajectory planner process, generates continuous synchronized, filtered, multi-axis position and acceleration commands that drive control servos. Time intervals generated by the trajectory planner are quantized to be integer multiples of a real time clock period. The trajectory planner outputs have infinite jerk, but are smoothed by filters in the profile executor to both limit jerk and minimize servo-tracking errors. The trajectory planner allows time for the profile executor filters, but does not restrict fine tuning of the shape of these filters, provided that the width of the tuned filter does not exceed the allowed time.

Abstract translation: 轨迹规划过程接收由高级控制软件产生的数据。 该数据定义位置和扫描速度。 轨迹规划过程创建恒定加速度间隔序列，允许以最大吞吐量执行关键运动。 轨迹规划过程输出轮廓。 轮廓执行器使用轨迹计划程序输出的轮廓生成连续的同步，过滤的多轴位置和加速度命令来驱动控制伺服。 由轨迹计划器产生的时间间隔被量化为实时时钟周期的整数倍。 轨迹计划器输出具有无限跳动，但通过轮廓执行器中的过滤器进行平滑，既可以限制加加速度，也可减少伺服跟踪误差。 轨迹计划器允许轮廓执行器过滤器的时间，但不限制这些过滤器的形状的微调，只要调谐过滤器的宽度不超过允许的时间。

公开(公告)号：US06876439B2

公开(公告)日：2005-04-05

申请号：US10632798

申请日：2003-08-04

Applicant: Daniel Galburt ,  Jos de Klerk

Inventor： Daniel Galburt ,  Jos de Klerk

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G03B27/32 ,  G03B27/42

CPC classification number: G03F7/70533 ,  G03F7/70733 ,  G03F9/7003

Abstract: A lithography system and method are used to increase throughput using multiple reticles to pattern multiple substrates that are positioned with respect to one another according to a predetermined sequence. For example, during a first exposure period a first reticle patterns a first set of substrates, during a second exposure period a second reticle patterns the first set of substrates and a second set of substrates, and during a third exposure period the first reticle patterns the second set of substrates, etc. This can continue with further pairs of substrates until all desired substrates are patterned. It is to be appreciated that after the first and second reticles are complete, third and fourth reticles can pattern the first and second, sets of substrates. As another example, other sequences can also be performed using four exposure periods.

Abstract translation: 使用光刻系统和方法来增加使用多个掩模版的产量，以根据预定的顺序对相对于彼此定位的多个基板进行图案化。 例如，在第一曝光期间，第一掩模版图案化第一组基板，在第二曝光期间，第二掩模版图案第一组基板和第二组基板，并且在第三曝光期间，第一掩模版图案 第二组衬底等。这可以继续进一步的另外的衬底对，直到所有期望的衬底被图案化为止。 应当理解，在第一和第二掩模版完成之后，第三和第四掩模版可以对第一和第二组基片进行图案化。 作为另一示例，也可以使用四个曝光周期来执行其他序列。

公开(公告)号：US20060092394A1

公开(公告)日：2006-05-04

申请号：US11248141

申请日：2005-10-13

Applicant: Daniel Galburt ,  Peter Kochersperger

Inventor： Daniel Galburt ,  Peter Kochersperger

IPC: G03B27/42

CPC classification number: G03F7/70833 ,  G03F7/709

Abstract: An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.

公开(公告)号：US20060038973A1

公开(公告)日：2006-02-23

申请号：US10922862

申请日：2004-08-23

Applicant: Daniel Galburt

Inventor： Daniel Galburt

IPC: G03B27/62

CPC classification number: G03F7/707 ,  G03F7/70708

Abstract: A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.

Abstract translation: 一种在曝光操作的扫描部分期间消除或显着地减少图案发生器相对于图案发生器保持装置的滑动的系统和方法。 在第一和第二示例中，这可以通过（a）连续地或（b）同时使用第一和第二图案发生器保持系统将图案发生器保持到图案发生器保持装置来完成。 在这些示例中，第一图案发生器保持系统利用静电系统将图案发生器吸引到图案发生器保持装置，并且第二图案发生器保持系统利用真空系统将图案发生器吸引到图案发生器保持装置。

公开(公告)号：US20060023195A1

公开(公告)日：2006-02-02

申请号：US11218620

申请日：2005-09-06

Applicant: Frederick Carter ,  Daniel Galburt ,  Stephen Roux

Inventor： Frederick Carter ,  Daniel Galburt ,  Stephen Roux

IPC: H02K41/00 ,  G03B27/42 ,  G03B27/58

CPC classification number: G03F7/70066 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70825 ,  H02K41/03 ,  H02K2201/18

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract translation: 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。