Array substrate, method for fabricating the same and display panel

    公开(公告)号:US11296122B2

    公开(公告)日:2022-04-05

    申请号:US16641372

    申请日:2019-05-23

    Abstract: Embodiments of the present disclosure provide an array substrate including a base substrate, an active layer on the base substrate, a first gate insulating layer on the active layer, a first gate on the first gate insulating layer, and a second gate insulating layer on the first gate. The second gate insulating layer includes a first sub-insulating layer and a second sub-insulating layer disposed in a direction away from the active layer, and a hydrogen content of the first sub-insulating layer is larger than a hydrogen content of the second sub-insulating layer. A method for fabricating the array substrate and a display panel including the array substrate are also provided.

    Flexible display panel, method for fabricating the same and display device

    公开(公告)号:US11316137B2

    公开(公告)日:2022-04-26

    申请号:US16480023

    申请日:2018-09-13

    Abstract: A flexible display panel, a method for fabricating the same, and a display device are provided. A protruding structure located is formed in a via-hole area on a flexible base substrate so that both the protruding structure, and the portions of an organic light-emitting functional film and a top electrode layer covering the protruding structure can be removed. Thereafter an encapsulation thin film covering the patterns of the organic light-emitting functional film and the top electrode layer is formed. After the encapsulation thin film is formed, the step of removing the pattern of the encapsulation thin film in the via-hole area can be further performed to expose the flexible base substrate in the via-hole area, and after the flexible base substrate in the via-hole area is removed, a via-hole can be formed in the flexible base substrate.

    OLED display panel, method for manufacturing the same and display device

    公开(公告)号:US10763321B2

    公开(公告)日:2020-09-01

    申请号:US16106146

    申请日:2018-08-21

    Inventor: Weixin Ma Meng Zhao

    Abstract: The present disclosure relates to an OLED display panel, a method for manufacturing the same and a display device. The OLED display panel includes: a substrate; a thin film transistor and a photosensitive device for fingerprint recognition on the substrate; a transparent dielectric layer on the substrate and the thin film transistor; a light-shielding-planarization single layer on the transparent dielectric layer, wherein the light-shielding-planarization single layer has a first hole exposing the transparent dielectric layer, and a projection of the first hole on the substrate overlays with a projection of the photosensitive device on the substrate; and an organic light emitting device on the light-shielding-planarization single layer, wherein the organic light emitting device is connected to a source/drain electrode of the thin film transistor through a second hole penetrating the light-shielding-planarization single layer.

    Display substrate and manufacturing method thereof, display device

    公开(公告)号:US12230695B2

    公开(公告)日:2025-02-18

    申请号:US18338421

    申请日:2023-06-21

    Inventor: Meng Zhao

    Abstract: The present disclosure provides a display substrate and a manufacturing method thereof, and a display device, belongs to the field of display technology. The method includes forming a first thin film transistor, which includes: forming a first gate of the first thin film transistor on a base substrate through a patterning process; forming a first gate insulating layer on a side of the first gate distal to the base substrate; sequentially forming a first semiconductor material layer, a second gate insulating layer and a second gate metal layer on a side of the first gate insulating layer distal to the base substrate, and forming a pattern including an active layer of the first thin film transistor, a pattern of the second gate insulating layer and a second gate of the first thin film transistor through a patterning process.

    Array substrate, fabrication method therefor and display device

    公开(公告)号:US12133445B2

    公开(公告)日:2024-10-29

    申请号:US17764512

    申请日:2021-05-14

    Inventor: Meng Zhao

    Abstract: A method for fabricating an array substrate, comprising: providing a base substrate; forming a driving-circuit layer, which comprises first driving circuits and second driving circuits; forming a first electrode layer, which comprises transferring electrodes electrically connected to the first driving circuits, and pixel electrodes electrically connected to the second driving-circuits; forming a pixel-defining layer, which is provided with pixel openings and connecting via holes; forming a first pattern-defining layer, which covers the connecting via holes and exposes the pixel openings; forming an organic light-emitting-material layer, which covers the pixel openings and the first pattern-defining layer; removing the first pattern-defining layer, such that the organic light-emitting-material layer forms an organic light-emitting layer; forming a second pattern-defining layer surrounding the connecting via holes; and forming a second electrode layer, which comprises a common electrode and fingerprint-recognition electrodes isolated by the second pattern-defining layer.

    Display substrate and manufacturing method thereof, display device

    公开(公告)号:US11728416B2

    公开(公告)日:2023-08-15

    申请号:US17355380

    申请日:2021-06-23

    Inventor: Meng Zhao

    Abstract: The present disclosure provides a display substrate and a manufacturing method thereof, and a display device, belongs to the field of display technology. The method includes forming a first thin film transistor, which includes: forming a first gate of the first thin film transistor on a base substrate through a patterning process; forming a first gate insulating layer on a side of the first gate distal to the base substrate; sequentially forming a first semiconductor material layer, a second gate insulating layer and a second gate metal layer on a side of the first gate insulating layer distal to the base substrate, and forming a pattern including an active layer of the first thin film transistor, a pattern of the second gate insulating layer and a second gate of the first thin film transistor through a patterning process.

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