Abstract:
Embodiments of the invention disclose an array substrate and a fabrication method thereof, and a display device. The array substrate comprises a plurality of pixel units disposed on a base substrate. Each pixel unit comprises a thin-film transistor region and a display region. A thin-film transistor structure is formed in the thin-film transistor region, and an organic light-emitting diode. The organic light-emitting diode comprises a transparent first electrode, a light-emitting layer, and a second electrode for reflecting light that are sequentially formed. A transflective layer is formed in the display region. A color filter film is formed in the display region and is disposed between the second electrode of the organic light-emitting diode and the transflective layer. The second electrode of the organic light-emitting diode and the transflective layer form a microcavity structure. The color filter films in the pixel units of different colors have different thicknesses.
Abstract:
A method of manufacturing an array substrate, a display substrate and a display device are disclosed. The method of manufacturing an array substrate comprises: forming a pattern of an active layer and a pattern of source and drain electrodes on a substrate; forming a pattern of a first transparent electrode and a pattern of a passivation layer through one single patterning process; and processing the substrate on which the pattern of the passivation layer having been formed, such that a material of the passivation layer fills at least partially in a gap in the pattern of the first transparent electrode. Through forming the pattern of the first transparent electrode and the passivation layer by one single patterning process, number of masks used in the manufacturing process of the array substrate is reduced.
Abstract:
Embodiments of the present invention disclose an array substrate comprising a plurality of pixel units disposed on a base substrate, the pixel units comprising: a thin film transistor structure formed on the base substrate; and an OLED driven by the thin film transistor structure, the OLED disposed in a pixel region of the pixel units, the OLED comprising sequentially in a direction away from the base substrate a first electrode which is transparent, a light-emitting layer and a second electrode which reflects light; a transflective layer disposed between the OLED and the thin film transistor structure; a color filter disposed between the second electrode of the OLED and the transflective layer; the second electrode of the OLED and the transflective layer constitute a microcavity structure.
Abstract:
The present invention discloses an array substrate, a method of manufacturing the array substrate and a display device. Since the respective surfaces of the sources, the drains and the data lines are clad by the respective insulating films, in formation of the patterns of the pixel electrodes above the insulating films by using a patterning process, the insulating films can prevent the sources and the data lines provided under them from being corroded by an etching agent when an etching process is performed to form the patterns of the pixel electrodes, so as to avoid an influence on display quality of a display panel. Furthermore, since the insulating films are formed by curing the insulating material, instead of the photoresist, remained on the patterns of the sources, the drains and the data lines when forming the patterns of the sources, the drains and the data lines by using the insulating material (replacing the photoresist), formation of the insulating films will not increase the number of masks, and a step of peeling off the insulating material is omitted. Furthermore, the respective connecting portions electrically connects the respective drains with the respective pixel electrodes through the respective first via holes A located above the respective drains and passing through the respective insulating films, so that a normal display function of the display panel can be ensured.