公开(公告)号：US20170315454A1

公开(公告)日：2017-11-02

申请号：US15629399

申请日：2017-06-21

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20170176872A1

公开(公告)日：2017-06-22

申请号：US15435094

申请日：2017-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

公开(公告)号：US20160187791A1

公开(公告)日：2016-06-30

申请号：US15021240

申请日：2014-09-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Martijn HOUBEN ,  Alwin DE KOCK ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Marco Adrianus Peter VAN DEN HEUVEL

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/6875

Abstract: A support table to support a surface of a substrate, wherein the support table includes: a base surface substantially parallel to the surface of the substrate, a plurality of burls protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions are arranged such that a plurality of the gaps are aligned to form a straight gas flow path towards an edge of the base surface.

Abstract translation: 一种用于支撑基板表面的支撑台，其中所述支撑台包括：基本平行于所述基板的表面的基面，在所述基面上方突出的多个毛刺，每个所述毛坯具有相应的远端和 所述毛坯被布置成使得当所述基底由所述支撑台支撑时，所述基底由相应的远端支撑，以及由间隙分开的多个细长凸起突起，每个所述细长凸起突起 在所述基面上方具有第二高度，其中所述细长凸起突起突出在所述孔之间的所述基面之上，并且所述第二高度小于所述第一高度; 其中所述突起被布置成使得多个间隙对准以形成朝向所述基部表面的边缘的直的气体流动路径。

公开(公告)号：US20150277243A1

公开(公告)日：2015-10-01

申请号：US14634272

申请日：2015-02-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Johan Gertrudis Cornelis KUNNEN ,  Martijn HOUBEN ,  Thibault Simon Mathieu LAURENT ,  Hendrikus Johannes Marinus VAN ABEELEN ,  Armand Rosa Jozef DASSEN ,  Sander Catharina Reinier DERKS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/68 ,  H01L21/6875

Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.

Abstract translation: 用于光刻设备的支撑台，支撑台具有支撑部分和调节系统，其中支撑部分，调节系统或两者都被配置成使得热传递到支撑在支撑台上的基板或从支撑在支撑台上的基板，导致 从处理系统的操作来看，在衬底的与衬底边缘相邻的区域中比在衬底中心处的区域更大。