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公开(公告)号：US12094681B2
公开(公告)日：2024-09-17
申请号：US17740861
申请日：2022-05-10
Applicant: Applied Materials, Inc.
Inventor： Graham Wright , Shardul S. Patel
CPC classification number: H01J37/08 , H01J37/32055 , H01J37/32064 , H01J37/3244 , H01J37/342 , H01J37/3426 , H01J2237/08
Abstract: An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. A solid target is also disposed in the arc chamber. When the insertable target holder is used, multicharged ions are created. When the insertable target holder is retracted, single charged ions are created by only etching the solid dopant-containing compound.
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12.发明公开公开(公告)号：US20230369008A1
公开(公告)日：2023-11-16
申请号：US17740861
申请日：2022-05-10
Applicant: Applied Materials, Inc.
Inventor： Graham Wright , Shardul S. Patel
CPC classification number: H01J37/08 , H01J37/32055 , H01J37/3244 , H01J37/342 , H01J37/3426 , H01J2237/08
Abstract: An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. A solid target is also disposed in the arc chamber. When the insertable target holder is used, multicharged ions are created. When the insertable target holder is retracted, single charged ions are created by only etching the solid dopant-containing compound.
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13.发明公开公开(公告)号：US20230369007A1
公开(公告)日：2023-11-16
申请号：US17740854
申请日：2022-05-10
Applicant: Applied Materials, Inc.
Inventor： Graham Wright , Shardul S. Patel
CPC classification number: H01J37/08 , H01J37/3244 , H01J2237/063
Abstract: An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may supply an organoaluminium gas. Ions having single charges may be created in the first mode, while ions having multiple charges may be created in the second mode. In some embodiments, the solid target may be retractable.
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公开(公告)号：US10600611B2
公开(公告)日：2020-03-24
申请号：US16190649
申请日：2018-11-14
Applicant: APPLIED Materials, Inc.
Inventor： Klaus Becker , Daniel Alvarado , Michael St. Peter , Graham Wright
Abstract: An ion source with a crucible is disclosed. In some embodiments, the crucible is disposed in one of the ends of the ions source, opposite the cathode. In other embodiments, the crucible is disposed in one of the side walls. A feed material, which may be in solid form is disposed in the crucible. In certain embodiments, the feed material is sputtered by ions and electrons in the plasma. In other embodiments, the feed material is heated so that it vaporizes. The ion source may be oriented so that the crucible is disposed in the lowest wall so that gravity retains the feed material in the crucible.
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公开(公告)号：US12154753B2
公开(公告)日：2024-11-26
申请号：US17473101
申请日：2021-09-13
Applicant: Applied Materials, Inc.
Inventor： Jay T. Scheuer , Graham Wright , Peter F. Kurunczi , Alexandre Likhanskii
IPC: H01J37/08 , H01J37/317
Abstract: An ion source capable of extracting a ribbon ion beam with improved uniformity is disclosed. One of the walls of the ion source has a protrusion on its interior surface facing the chamber. The protrusion creates a loss area that serves as a sink for free electrons and ions. This causes a reduction in plasma density near the protrusion, and may improve the uniformity of the ribbon ion beam that is extracted from the ion source by modifying the beam current near the protrusion. The shape of the protrusion may be modified to achieve the desired uniformity. The protrusion may also be utilized with a cylindrical ion source. In certain embodiments, the protrusion is created by a plurality of mechanically adjustable protrusion elements.
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Patent Agency Ranking
公开(公告)号：US20240331972A1
公开(公告)日：2024-10-03
申请号：US18128033
申请日：2023-03-29
Applicant: Applied Materials, Inc.
Inventor： Adam M. McLaughlin , Graham Wright , Mateo Navarro Goldaraz
IPC: H01J37/30 , H01J37/317
CPC classification number: H01J37/3002 , H01J37/3171 , H01J2237/002 , H01J2237/31701
Abstract: An actively cooled gas conduit for use with an ion source is disclosed. The gas conduit includes a gas channel and a cooling channel that may be adjacent to one another for at least a portion of the length of the gas channel. The gas conduit may be constructed by bonding two or more tubes together. Alternatively, the gas conduit may be constructed using additive manufacturing such that the cooling channel and the gas channel are within the same gas conduit. In some embodiments, the return channel is also disposed in the gas conduit. By actively cooling the gas conduit, the temperature of the gas conduit may be lowered, which reducing the possibility of clogging due to decomposition of the feed gas.
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17.发明授权公开(公告)号：US12040154B2
公开(公告)日：2024-07-16
申请号：US17740854
申请日：2022-05-10
Applicant: Applied Materials, Inc.
Inventor： Graham Wright , Shardul S. Patel
CPC classification number: H01J37/08 , H01J37/3244 , H01J2237/063
Abstract: An ion source that is capable of different modes of operation is disclosed. A solid target may be disposed in the arc chamber. The ion source may have several gas inlets, in communication with different gasses. When operating in a first mode, the ion source may supply a first gas, such as a halogen containing gas. When operating in a second mode, the ion source may supply an organoaluminium gas. Ions having single charges may be created in the first mode, while ions having multiple charges may be created in the second mode. In some embodiments, the solid target may be retractable.
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公开(公告)号：US20230080083A1
公开(公告)日：2023-03-16
申请号：US17473096
申请日：2021-09-13
Applicant: Applied Materials, Inc.
Inventor： Alexandre Likhanskii , Alexander S. Perel , Jay T. Scheuer , Bon-Woong Koo , Robert C. Lindberg , Peter F. Kurunczi , Graham Wright
Abstract: An ion source having an extraction plate with a variable thickness is disclosed. The extraction plate has a protrusion on its interior or exterior surface proximate the extraction aperture. The protrusion increases the thickness of the extraction aperture in certain regions. This increases the loss area in those regions, which serves as a sink for ions and electrons. In this way, the plasma density is decreased more significantly in the regions where the extraction aperture has a greater thickness. The shape of the protrusion may be modified to achieve the desired plasma uniformity. Thus, it may be possible to create an extracted ion beam having a more uniform ion density. In some tests, the uniformity of the beam current along the width direction was improved by between 20% and 50%.
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公开(公告)号：US20210287872A1
公开(公告)日：2021-09-16
申请号：US16817500
申请日：2020-03-12
Applicant: Applied Materials, Inc.
Inventor： Bon-Woong Koo , Frank Sinclair , Alexandre Likhanskii , Svetlana Radovanov , Alexander Perel , Graham Wright , Jay T. Scheuer , Daniel Tieger , You Chia Li , Jay Johnson , Tseh-Jen Hsieh , Ronald Johnson
IPC: H01J37/08 , H01J37/317
Abstract: An ion source including a chamber housing defining an ion source chamber and including an extraction plate on a front side thereof, the extraction plate having an extraction aperture formed therein, and a tubular cathode disposed within the ion source chamber and having a slot formed in a front-facing semi-cylindrical portion thereof disposed in a confronting relationship with the extraction aperture, wherein a rear-facing semi-cylindrical portion of the tubular cathode directed away from the extraction aperture is closed.
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公开(公告)号：US20210238732A1
公开(公告)日：2021-08-05
申请号：US17235351
申请日：2021-04-20
Applicant: APPLIED Materials, Inc.
Inventor： Graham Wright , Klaus Becker
Abstract: An advanced sputter target is disclosed. The advanced sputter target comprises two components, a porous carrier, and a metal material disposed within that porous carrier. The porous carrier is designed to be a high porosity, open cell structure such that molten material may flow through the carrier. The porous carrier also provides structural support for the metal material. The cell sizes of the porous carrier are dimensioned such that the capillary action and surface tension prohibits the metal material from spilling, dripping, or otherwise exiting the porous carrier. In some embodiments, the porous carrier is an open cell foam, a weave of strands or stacked meshes.
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