公开(公告)号：US20150090341A1

公开(公告)日：2015-04-02

申请号：US14498449

申请日：2014-09-26

Applicant: Applied Materials, Inc.

Inventor： Edward Ng ,  Eric A. Englhardt ,  Travis Morey ,  Ayan Majumdar ,  Steve S. Hongkham

IPC: F17D1/04

CPC classification number: F17D1/04 ,  C23C14/564 ,  C23C14/568 ,  C23C16/00 ,  C23C16/4401 ,  C23C16/54 ,  H01L21/00 ,  H01L21/67017 ,  H01L21/67196 ,  Y10T137/0318 ,  Y10T137/86292

Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.

Abstract translation: 转印室气体净化装置被公开。 传送室气体净化装置具有适于容纳传送机器人的至少一部分的传送室，传送室包括侧壁，室盖和室底板，其中室盖具有多个分布的室入口。 多个分布室入口可以包括扩散元件。 层叠吹扫气流可以设置在衬底上。 公开了包括多个分布式室入口的系统和方法，以及许多其它方面。

公开(公告)号：USD973737S1

公开(公告)日：2022-12-27

申请号：US29758663

申请日：2020-11-17

Applicant: Applied Materials, Inc.

Designer： Michael R. Rice ,  Michael C. Kuchar ,  Travis Morey ,  Adam J. Wyatt ,  Ofer Amir

公开(公告)号：US20160358792A1

公开(公告)日：2016-12-08

申请号：US15238604

申请日：2016-08-16

Applicant: Applied Materials, Inc.

Inventor： Nagendra V. Madiwal ,  Robert Irwin Decottignies ,  Andrew Nguyen ,  Paul B. Reuter ,  Angela R. Sico ,  Michael Kuchar ,  Travis Morey ,  Mitchell DiSanto

IPC: H01L21/67 ,  C23C16/455

CPC classification number: H01L21/6719 ,  C23C14/564 ,  C23C14/566 ,  C23C16/4401 ,  C23C16/45563 ,  H01L21/67126 ,  Y10T29/49432

Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.

Abstract translation: 电子设备制造系统可以包括提供传送室和处理室之间的界面的室端口组件。 在一些实施例中，室端口组件可以被配置成将净化气体流引导到腔室端口组件的衬底传送区域。 在其它实施例中，处理室和/或转移室可以被配置成将净化气体流引导到基板传送区域中。 吹扫气体流入衬底传送区域的流动可以防止和/或减少颗粒物质从腔室硬件到在转移室和处理室之间转移的衬底上的迁移。 还提供了组装腔室端口组件的方法，以及其他方面。

公开(公告)号：US09441792B2

公开(公告)日：2016-09-13

申请号：US14498449

申请日：2014-09-26

Applicant: Applied Materials, Inc.

Inventor： Edward Ng ,  Eric A. Englhardt ,  Travis Morey ,  Ayan Majumdar ,  Steve S. Hongkham

IPC: H01L21/67 ,  F17D1/04

CPC classification number: F17D1/04 ,  C23C14/564 ,  C23C14/568 ,  C23C16/00 ,  C23C16/4401 ,  C23C16/54 ,  H01L21/00 ,  H01L21/67017 ,  H01L21/67196 ,  Y10T137/0318 ,  Y10T137/86292

Abstract: Transfer chamber gas purge apparatus are disclosed. The transfer chamber gas purge apparatus has a transfer chamber adapted to contain at least a portion of a transfer robot, the transfer chamber including side walls, a chamber lid, and a chamber floor, wherein the chamber lid has a plurality of distributed chamber inlets. The plurality of distributed chamber inlets may include diffusing elements. Laminar purge gas flow may be provided above the substrate. Systems and methods including a plurality of distributed chamber inlets are disclosed, as are numerous other aspects.

Abstract translation: 转印室气体净化装置被公开。 传送室气体净化装置具有适于容纳传送机器人的至少一部分的传送室，传送室包括侧壁，室盖和室底板，其中室盖具有多个分布的室入口。 多个分布室入口可以包括扩散元件。 层叠吹扫气流可以设置在衬底上。 公开了包括多个分布式室入口的系统和方法，以及许多其它方面。

公开(公告)号：US20150083330A1

公开(公告)日：2015-03-26

申请号：US14036754

申请日：2013-09-25

Applicant: Applied Materials, Inc.

Inventor： Nagendra V. Madiwal ,  Robert Irwin Decottignies ,  Andrew Nguyen ,  Paul B. Reuter ,  Angela R. Sico ,  Michael Kuchar ,  Travis Morey ,  Mitchell Disanto

IPC: C23C16/44 ,  C23C14/56 ,  H01L21/67

CPC classification number: H01L21/6719 ,  C23C14/564 ,  C23C14/566 ,  C23C16/4401 ,  C23C16/45563 ,  H01L21/67126 ,  Y10T29/49432

Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.

Abstract translation: 电子设备制造系统可以包括提供传送室和处理室之间的界面的室端口组件。 在一些实施例中，室端口组件可以被配置成将净化气体流引导到腔室端口组件的衬底传送区域。 在其它实施例中，处理室和/或转移室可以被配置成将净化气体流引导到基板传送区域中。 吹扫气体流入衬底传送区域的流动可以防止和/或减少颗粒物质从腔室硬件到在转移室和处理室之间转移的衬底上的迁移。 还提供了组装腔室端口组件的方法，以及其他方面。

公开(公告)号：US10758045B2

公开(公告)日：2020-09-01

申请号：US16358280

申请日：2019-03-19

Applicant: Applied Materials, Inc.

Inventor： Eran Weiss ,  Travis Morey ,  Nir Merry ,  Paul B. Reuter ,  Izya Kremerman ,  Jeffrey C. Hudgens ,  Dean C. Hruzek

IPC: H01L21/67 ,  A47B96/00

Abstract: A load lock door assembly with side actuation is disclosed. Load lock door assembly includes a load lock door and a door support assembly coupled thereto. Door support assembly includes one or more pivot members pivotable relative to one or more sides of the load lock body, a door support bracket coupled to the load lock door, one or more separator side actuators coupled between the door support bracket being actuatable to separate the load lock door from a sealing surface, and one or more pivot side actuator operable to pivot the load lock door above or below the load lock entry. Load lock apparatus with side actuation, systems including one or more load lock door assemblies with side actuation, and methods of operating load lock door assemblies are provided, as are numerous other aspects.

公开(公告)号：US20190208907A1

公开(公告)日：2019-07-11

申请号：US16358280

申请日：2019-03-19

Applicant: Applied Materials, Inc.

Inventor： Eran Weiss ,  Travis Morey ,  Nir Merry ,  Paul B. Reuter ,  Izya Kremerman ,  Jeffrey C. Hudgens ,  Dean C. Hruzek

IPC: A47B96/00 ,  H01L21/67

CPC classification number: A47B96/00 ,  H01L21/67126 ,  H01L21/67201

Abstract: A load lock door assembly with side actuation is disclosed. Load lock door assembly includes a load lock door and a door support assembly coupled thereto. Door support assembly includes one or more pivot members pivotable relative to one or more sides of the load lock body, a door support bracket coupled to the load lock door, one or more separator side actuators coupled between the door support bracket being actuatable to separate the load lock door from a sealing surface, and one or more pivot side actuator operable to pivot the load lock door above or below the load lock entry. Load lock apparatus with side actuation, systems including one or more load lock door assemblies with side actuation, and methods of operating load lock door assemblies are provided, as are numerous other aspects.

公开(公告)号：US10119191B2

公开(公告)日：2018-11-06

申请号：US15177183

申请日：2016-06-08

Applicant: Applied Materials, Inc.

Inventor： Travis Morey

IPC: F26B11/00 ,  C23C16/44

Abstract: Porous diffuser assemblies including multiple diffuser elements. The porous diffuser assemblies include a diffuser body, a diffuser base coupled to the diffuser body and forming a plenum there between, the diffuser base including a plurality of openings formed therein, and a porous diffuser element disposed in each of the plurality of openings wherein surfaces of the porous diffuser elements are exposed to the plenum. Gas purged chambers and methods of purging a chamber are disclosed, as are numerous other aspects.

公开(公告)号：US09435025B2

公开(公告)日：2016-09-06

申请号：US14036754

申请日：2013-09-25

Applicant: Applied Materials, Inc.

Inventor： Nagendra V. Madiwal ,  Robert Irwin Decottignies ,  Andrew Nguyen ,  Paul B. Reuter ,  Angela R. Sico ,  Michael Kuchar ,  Travis Morey ,  Mitchell Disanto

IPC: H01L21/677 ,  C23C14/56 ,  H01L21/67 ,  C23C16/44

CPC classification number: H01L21/6719 ,  C23C14/564 ,  C23C14/566 ,  C23C16/4401 ,  C23C16/45563 ,  H01L21/67126 ,  Y10T29/49432

Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.

Abstract translation: 电子设备制造系统可以包括提供传送室和处理室之间的界面的室端口组件。 在一些实施例中，室端口组件可以被配置成将净化气体流引导到腔室端口组件的衬底传送区域。 在其它实施例中，处理室和/或转移室可以被配置成将净化气体流引导到基板传送区域中。 吹扫气体流入衬底传送区域的流动可以防止和/或减少颗粒物质从腔室硬件到在转移室和处理室之间转移的衬底上的迁移。 还提供了组装腔室端口组件的方法，以及其他方面。