公开(公告)号：US20220259735A1

公开(公告)日：2022-08-18

申请号：US17673345

申请日：2022-02-16

Applicant: Applied Materials, Inc.

Inventor： Nitin Deepak ,  Gayatri Natu ,  Albert Barrett Hicks, III ,  Prerna Sonthalia Goradia ,  Jennifer Y. Sun

IPC: C23C16/455 ,  C23C16/30

Abstract: Methods of forming a metal oxyfluoride films are provided. A substrate is placed in an atomic layer deposition (ALD) chamber having a processing region. Flows of zirconium-containing gas, a zirconium precursor gas, for example, Tris(dimethylamino)cyclopentadienyl zirconium, an oxygen-containing gas, a fluorine containing gas, and an yttrium precursor, for example, tris(butylcyclopentadienyl)yttrium gas are delivered to the processing region, where a metal oxyfluoride film such as an yttrium zirconium oxyfluoride film, is formed.

公开(公告)号：US20210100087A1

公开(公告)日：2021-04-01

申请号：US16890346

申请日：2020-06-02

Applicant: APPLIED MATERIALS, INC.

Inventor： Gayatri Natu ,  Geetika Bajaj ,  Prerna Goradia ,  Darshan Thakare ,  David Fenwick ,  XiaoMing He ,  Sanni Seppaelae ,  Jennifer Sun ,  Rajkumar Thanu ,  Jeff Hudgens ,  Karuppasamy Muthukamatchy ,  Arun Dhayalan

IPC: H05F1/02 ,  H01L21/687 ,  H01J37/32 ,  B25J18/00

Abstract: Disclosed in some embodiments is a chamber component (such as an end effector body) coated with an ultrathin electrically-dissipative material to provide a dissipative path from the coating to the ground. The coating may be deposited via a chemical precursor deposition to provide a uniform, conformal, and porosity free coating in a cost effective manner. In an embodiment wherein the chamber component comprises an end effector body, the end effector body may further comprise replaceable contact pads for supporting a substrate and the contact surface of the contact pads head may also be coated with an electrically-dissipative material.