公开(公告)号：US10295617B2

公开(公告)日：2019-05-21

申请号：US14770113

申请日：2014-02-13

申请人： Kenjiro Kimura

发明人： Kenjiro Kimura

IPC分类号： G01R33/10

摘要： A distribution analyzing device (20) includes: an obtaining unit (21) which obtains measurement data of a field measured, through a sensor sensing area, independently at each of rotation angles and at each of grid coordinate positions of the sensor sensing area; and a calculation unit (22) which calculates a distribution of the field from the measurement data, using an arithmetic expression obtained by deriving a target harmonic function, which indicates the distribution of the field, using a condition that a convolution of the target harmonic function and a shape function, which indicates a shape of a cross section of the finite sensor sensing area along a plane parallel to the measurement plane, is equal to a provisional harmonic function derived by solving the Laplace equation using the measurement data and a size of the sensor sensing area in a direction perpendicular to the measurement plane.

公开(公告)号：US20090127473A1

公开(公告)日：2009-05-21

申请号：US11920420

申请日：2005-11-18

申请人： Kenjiro Kimura ,  Kei Kobayashi ,  Hirofumi Yamada ,  Kazumi Matsushige

发明人： Kenjiro Kimura ,  Kei Kobayashi ,  Hirofumi Yamada ,  Kazumi Matsushige

IPC分类号： H01J3/14 ,  A61N5/00

CPC分类号： H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/073 ,  H01J37/3174 ,  H01J2237/06333 ,  H01J2237/06358 ,  H01J2237/31779 ,  H01J2237/31794

摘要： An electron beam irradiation device of the present invention includes: a projector 8 for generating a two-dimensional light pattern 13; a microchannel plate 11 for (i) generating an electron beam array based on the light pattern 13 having entered, (ii) amplifying the electron beam array, and (iii) emitting the electron beam array as an amplified electron beam array 14; and an electron beam lens section 12 for converging the amplified electron beam array 14. This electron beam irradiation device is capable of manufacturing a semiconductor device whose performance is improved through a finer processing by means of irradiation using an electron beam. Further, the electron beam irradiation device allows cost reduction, because the device allows collective irradiation using a two dimensional pattern.

摘要翻译： 本发明的电子束照射装置包括：用于产生二维光图案13的投影仪8; 微通道板11，用于（i）基于已经进入的光图案13产生电子束阵列，（ii）放大电子束阵列，和（iii）发射电子束阵列作为放大的电子束阵列14; 以及用于会聚放大电子束阵列14的电子束透镜部分12.该电子束照射装置能够通过使用电子束的照射通过更精细的处理来制造其性能得到改善的半导体器件。 此外，电子束照射装置允许成本降低，因为该装置允许使用二维图案的集体照射。

公开(公告)号：US20120330581A1

公开(公告)日：2012-12-27

申请号：US13582151

申请日：2011-03-01

申请人： Kenjiro Kimura

发明人： Kenjiro Kimura

IPC分类号： G06F19/00

CPC分类号： G01R33/10 ,  G01N24/08 ,  G01R33/3808

摘要： In a magnetic field obtaining apparatus, a measuring part (21) that is sufficiently longer than the width of an area to be measured is disposed on a measurement plane that satisfies z=α, and scanning in an X′ direction perpendicular to the longitudinal direction of the measuring part (21) is repeated while changing an angle θ formed by a predetermined reference direction on the measurement plane and the longitudinal direction of the measuring part (21) to a plurality of angles. Assuming that x′ is a coordinate parameter in the X′ direction, measured values f(x′, θ) obtained by repetitions of the scanning are Fourier transformed so as to obtain g(kx′, θ) (where kx′ is a wavenumber in the X′ direction). Then, g(kx′, θ) is substituted into a predetermined two-dimensional potential obtaining equation so as to obtain φ(x, y, α) that indicates a two-dimensional potential on the measurement plane. Accordingly, it is possible to perform high-resolution two-dimensional potential measurement as a result of using the measuring part (21) that is sufficiently larger than the width of an area to be measured.

摘要翻译： 在磁场获取装置中，在满足z =α的测量平面上设置足够长于待测区域宽度的测量部分（21），并且沿与纵向方向垂直的X'方向进行扫描 在改变角度的同时重复测量部分（21）; 在测量平面上的预定参考方向和测量部分（21）的纵向方向上形成多个角度。 假设x'是X'方向上的坐标参数，则通过扫描重复获得的测量值f（x'，＆amp; thetas）被傅立叶变换，从而获得g（kx'，＆Thetas;）（其中kx' 在X方向的波数）。 然后，将g（kx'，＆thetas）代入预定的二维电位获取方程，以获得表示测量平面上的二维电位的（x，y，α）。 因此，作为使用足够大于测量区域的宽度的测量部件（21）的结果，可以进行高分辨率二维电位测量。

公开(公告)号：US20100219819A1

公开(公告)日：2010-09-02

申请号：US12594050

申请日：2008-03-28

申请人： Kenjiro Kimura ,  Kei Kobayashi ,  Hirofumi Yamada ,  Kazumi Matsushige ,  Takashi Horiuchi ,  Nobuo Satoh ,  Akifumi Nakai

发明人： Kenjiro Kimura ,  Kei Kobayashi ,  Hirofumi Yamada ,  Kazumi Matsushige ,  Takashi Horiuchi ,  Nobuo Satoh ,  Akifumi Nakai

IPC分类号： G01R33/02 ,  G01Q60/08

CPC分类号： G01R33/10 ,  G01Q30/04 ,  G01Q60/50 ,  G01R33/0206 ,  G01R33/0385

摘要： Above the sample (9) having magnetic domains, a distribution of magnetic force in a measurement plane (91) is obtained as a magnetic force image with use of a MFM, an auxiliary magnetic force image is obtained by performing measurement in a measurement plane (92) away from the measurement plane (91) by a minute distance d, and a difference between them is divided by the minute distance d to obtain a magnetic force gradient image. The magnetic force image and the auxiliary magnetic force image are Fourier transformed and substituted into a three-dimensional field obtaining equation derived from a general solution of the Laplace equation, and the three-dimensional field indicating the magnetic force is obtained with high accuracy. A state of the magnetic domains at the surface (93) of the sample (9) can be obtained with high accuracy by obtaining the three-dimensional field. The three-dimensional field obtaining method using the three-dimensional field obtaining equation can be used for various fields of magnetic, electric, temperature and gravity potential and so on satisfying the Laplace equation. The obtaining of the three-dimensional field can be extended to obtaining of an n-dimensional field having high-dimension.

摘要翻译： 在具有磁畴的样品（9）上方，通过使用MFM获得在测量平面（91）中的磁力分布作为磁力图像，通过在测量平面中进行测量获得辅助磁力图像（ 92）远离测量平面（91）微小的距离d，并且它们之间的差除以微小距离d以获得磁力梯度图像。 将磁力图像和辅助磁力图像进行傅里叶变换并代入由拉普拉斯方程的一般解导出的三维场获得方程，并且以高精度获得表示磁力的三维场。 通过获得三维场，可以高精度地获得样品（9）的表面（93）处的磁畴的状态。 使用三维场获得方程的三维场获取方法可以用于满足拉普拉斯方程的磁，电，温度和重力等各种领域。 可以将三维场的获得扩展到获得具有高维度的n维场。