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公开(公告)号：US20220385028A1
公开(公告)日：2022-12-01
申请号：US17819013
申请日：2022-08-11
Applicant: Gigaphoton Inc.
Inventor： Koichi FUJII , Osamu WAKABAYASHI
Abstract: A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; a second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.
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公开(公告)号：US20220385027A1
公开(公告)日：2022-12-01
申请号：US17818916
申请日：2022-08-10
Applicant: Gigaphoton Inc.
Inventor： Takahito KUMAZAKI , Osamu WAKABAYASHI
Abstract: A line narrowing device includes first and second prisms disposed at positions different in a wavelength dispersion direction of any of the first and second prisms, a third prism disposed on the optical path of an optical beam and through which the beam width of the optical beam is enlarged and first and second parts of the optical beam are incident on the first and second prisms, respectively, a grating disposed across the optical path of the first part having passed through the first prism and the optical path of the second part having passed through the second prism, a first actuator configured to adjust the incident angle of the first part on the grating, a second actuator configured to adjust the incident angle of the second part on the grating, and a third actuator configured to adjust an energy ratio of the first and second parts.
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163.发明申请公开(公告)号：US20220385022A1
公开(公告)日：2022-12-01
申请号：US17818180
申请日：2022-08-08
Applicant: Gigaphoton Inc.
Inventor： Takahito KUMAZAKI , Osamu WAKABAYASHI
IPC: H01S3/036 , H01S3/1055 , H01S3/225
Abstract: A control method of a line narrowing gas laser device includes receiving a command of either a single-wavelength mode command or a multi-wavelength mode command from an external apparatus, and controlling the line narrowing gas laser device to generate pulse laser light in accordance with the command.
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公开(公告)号：US20220373896A1
公开(公告)日：2022-11-24
申请号：US17817190
申请日：2022-08-03
Applicant: Gigaphoton Inc.
Inventor： Koichi FUJII , Osamu WAKABAYASHI
Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus that outputs pulsed laser light, an illuminating optical system that guides the pulsed laser light to a reticle, a reticle stage, and a processor that controls the output of the pulsed laser light from the laser apparatus and the movement of the reticle performed by the reticle stage. The reticle has a first region where a first pattern is disposed and a second region where a second pattern is disposed, and the first and second regions are each a region continuous in a scan width direction perpendicular to a scan direction of the pulsed laser light, with the first and second regions arranged side by side in the scan direction. The processor controls the laser apparatus to output the pulsed laser light according to each of the first and second regions by changing the values of control parameters of the pulsed laser light in accordance with each of the first and second regions.
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公开(公告)号：US20210252634A1
公开(公告)日：2021-08-19
申请号：US17307252
申请日：2021-05-04
Applicant: Gigaphoton Inc.
Inventor： Masashi SHIMBORI , Osamu WAKABAYASHI
IPC: B23K26/073 , B23K26/066 , B23K26/0622 , B23K26/06 , B23K26/082
Abstract: A laser processing apparatus includes a placement base on which a workpiece is placed, a beam shaping optical system that shapes laser light such that a first laser light irradiated region of a mask blocking part of the laser light has a rectangular shape having short edges and long edges, the beam shaping optical system capable of causing one of a first radiation width of the first irradiated region in the direction parallel to the short edges and a second radiation width of the first irradiated region in the direction parallel to the long edges to be fixed and causing the other to be changed, a projection optical system that projects a pattern on the mask onto the workpiece, and a mover that moves the first irradiated region at least in the direction parallel to the short edges to move a second laser light irradiated region of the workpiece.
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Patent Agency Ranking
公开(公告)号：US20210226414A1
公开(公告)日：2021-07-22
申请号：US17220270
申请日：2021-04-01
Applicant: Gigaphoton Inc.
Inventor： Taisuke MIURA , Osamu WAKABAYASHI , Hironori IGARASHI
Abstract: In a laser system according to a viewpoint of the present disclosure, a first amplifier amplifies first pulsed laser light outputted from a first semiconductor laser system into second pulsed laser light, a wavelength conversion system converts the second pulsed laser light in terms of wavelength into third pulsed laser light, and an excimer amplifier amplifies the third pulsed laser light. The first semiconductor laser system includes a first current controller that controls current flowing through a first semiconductor laser in such a way that first laser light outputted from the first semiconductor laser is caused to undergo chirping and a first semiconductor optical amplifier that amplifies the first laser light into pulsed light. The laser system includes a control section that controls the amount of chirping performed on the first pulsed laser light in such a way that excimer laser light having a target spectral linewidth is achieved.
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167.发明申请公开(公告)号：US20210117931A1
公开(公告)日：2021-04-22
申请号：US17134944
申请日：2020-12-28
Applicant: Gigaphoton Inc.
Inventor： Kunihiko ABE , Yuji MINEGISHI , Osamu WAKABAYASHI
Abstract: A maintenance management method for a lithography system according to a viewpoint of the present disclosure includes organizing and saving operating information for each of lithography cells that are each an apparatus group formed of a set of apparatuses and form the lithography system, organizing and saving maintenance information on consumables for each of the lithography cells, calculating a standard maintenance timing for each of the consumables for each of the lithography cells based on the operating information and the maintenance information on the consumable for each of the lithography cells, creating a maintenance schedule plan for each of the lithography cells or for each of manufacturing lines based on the standard maintenance timing, information on a downtime, and information on a loss cost due to the downtime for each of the lithography cells or for each of the manufacturing lines, and outputting the result of the creation of the maintenance schedule plan.
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公开(公告)号：US20200150543A1
公开(公告)日：2020-05-14
申请号：US16710208
申请日：2019-12-11
Applicant: Gigaphoton Inc.
Inventor： Tatsuya YANAGIDA , Osamu WAKABAYASHI
IPC: G03F7/20
Abstract: An extreme ultraviolet light (EUV) generation system is configured to improve conversion efficiency of energy of a laser system to EUV energy by improving the efficiency of plasma generation. The EUV generation system includes a target generation unit configured to output a target toward a plasma generation region in a chamber. The laser system is configured to generate a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that the target is irradiated with the first pre-pulse laser beam, the second pre-pulse laser beam, and the main pulse laser beam in this order. In addition, the EUV generation system includes a controller configured to control the laser system so that a fluence of the second pre-pulse laser beam is equal to or higher than 1 J/cm2 and equal to or lower than a fluence of the main pulse laser beam.
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169.发明申请公开(公告)号：US20200067259A1
公开(公告)日：2020-02-27
申请号：US16674918
申请日：2019-11-05
Applicant: Gigaphoton Inc.
Inventor： Hiroyuki MASUDA , Osamu WAKABAYASHI
Abstract: A laser apparatus according to the present disclosure includes: a laser output unit configured to perform laser oscillation; and a control unit configured to acquire first laser performance data obtained when the laser output unit performs laser oscillation based on a first laser control parameter, and second laser performance data obtained when the laser output unit performs laser oscillation based on a second laser control parameter, while laser output from the laser output unit to an external device is stopped, and determine whether the second laser performance data has been improved as compared to the first laser performance data.
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公开(公告)号：US20190173258A1
公开(公告)日：2019-06-06
申请号：US16266279
申请日：2019-02-04
Applicant: Gigaphoton Inc.
Inventor： Hirotaka MIYAMOTO , Osamu WAKABAYASHI
Abstract: Provided is a laser device that includes a laser chamber in which a pair of discharge electrodes are disposed; a line narrowing optical system including a grating disposed in a position outside the laser chamber; a beam expander optical system that increases a diameter of a light beam, outputted from the laser chamber and traveling toward the grating, in a first direction parallel to a discharge direction between the discharge electrodes and in a second direction orthogonal to the discharge direction; and a holding platform that is formed as a component separate from the laser chamber and the grating, holds the beam expander optical system, and forms along with the beam expander optical system a beam expander unit.
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