摘要:
Provided is digital rights management (DRM) provision technology, and more particularly, are an apparatus, system, and method which can easily provide content using one or more DRM systems. A DRM provision apparatus includes a content download unit which downloads encrypted real content and dummy content from a download server and which manages the downloaded real content and dummy content; a license management unit which manages a license issued by a license server; and a processing unit which manages the downloaded real content and dummy content and the issued license.
摘要:
In a system and method for providing Push To Talk (PTT) service according to a state of the user, when a PTT terminal user is absent, in conference or busy, the PTT system converts the PTT voice message directed to the PTT terminal to a text message, and displays it on a screen of another terminal or the PTT terminal. As a result, the user can immediately check the PTT message when he/she is in absence or conference state, and is busy without communication interference.
摘要:
An air purifier including: a filter which removes contaminants from air passing therethrough; a fan which generates a flow force to pass air through the filter; and a rotating body rotatably mounted in the air purifier and defining a flow path around the fan, a discharge direction of the flow path being varied by rotation of the rotating body.
摘要:
A turbofan to reduce noise through a suppression of turbulent air flow at an outlet thereof and also to guide the air discharged from the outlet in a specific discharging direction, and an air conditioner equipped with the turbofan to improve an efficiency of a heat exchange. The turbofan includes a rotating plate coupled to a shaft of a drive motor, a plurality of blades radially arranged on a peripheral area of a front face of the rotating plate, a ring-shaped shroud joining to ends of the plurality of blades, and a flow guide rib extending from a peripheral edge of the rotating plate in a rearward direction to guide the air discharged from the turbofan.
摘要:
Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.
摘要:
The present invention relates to a polymer prepared by synthesizing monomer having a derivative of cholic acid, deoxycholic acid or lithocholic acid bonded to norbornene, and then homopolymerizing these monomer, copolymerizing these monomer with maleic anhydride, or copolymerizing these monomer, maleic anhydride and 2-hydroxyethyl 5-norbornene-2-carboxylate and/or 5-norbornene-2carboxylic acid, and its use as a photoresist. The polymer synthesized according to the present invention is dissolved in a solvent, together with a photo-acid generator, and filtered through a filter to make a photoresist solution which can be used to produce a lithographic image on a silicon wafer.
摘要:
Organometal-containing acrylate or methacrylate derivatives and photoresists comprising the polymers thereof. Unlike conventional matrix polymers of photoresist, the polymers induce a difference in silicon content between exposed regions and unexposed regions of photoresists by releasing their silicon-containing side chains with the aid of acid in a chemical amplification manner. The difference in silicon content causes the exposed regions to be etched at a different rate from that of the unexposed regions under oxygen plasma. Thus, the photoresist material makes it possible to use a microlithographic process comprising a dry development step which can advantageously prevent the deformation or collapse of patterns which is aggravated as their aspect ratio increases, as well as the photoresist is economically more favorable than a top surface imaging system to which silylation on its top surface or a multi-level resist system to which wet development on its top layer must be applied, because the microlithographic process is very simple and no solvent is released.