ORGANOPOLYSILOXANE MODIFIED WITH LACTATE SILYL AT BOTH ENDS AND METHOD FOR PRODUCING SAME

    公开(公告)号:US20220098371A1

    公开(公告)日:2022-03-31

    申请号:US17600626

    申请日:2020-03-26

    IPC分类号: C08G77/50 C08G77/38 C08G77/18

    摘要: An organopolysiloxane modified with a lactate silyl at both ends according to the present invention, which is represented by general formula (1) (wherein each of R1, R2 and R3 independently represents an unsubstituted or substituted monovalent hydrocarbon group having 1-10 carbon atoms; m represents an integer of 10 or more; each a independently represents 2 or 3; and X represents an alkylene group having 2-4 carbon atoms or an oxygen atom), is useful as a starting material siloxane for a surface treatment agent for inorganic materials, a coating agent for water repellent treatments, and especially for a room-temperature curable (RTV) silicone rubber composition.

    PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT

    公开(公告)号:US20220091509A1

    公开(公告)日:2022-03-24

    申请号:US17469454

    申请日:2021-09-08

    摘要: The present invention is a photosensitive resin composition containing: (A) a resin; (B) a photosensitizer; (C) a surfactant containing a structural unit represented by the following average composition formula (1); and (D) a solvent, where Y1 and Y2 each independently represent a hydrogen atom, a methyl group, a phenyl group, or a group represented by the following general formula (2), at least one of Y1 and Y2 is a group represented by the following general formula (2), R1 to R6 are monovalent hydrocarbon groups that may be the same or different and optionally contain a heteroatom, having 1 to 20 carbon atoms, “l” and “n” are each independently integers of 1 to 100, and “m” is an integer of 0 to 100. This provides: a photosensitive resin composition that is excellent in film thickness uniformity at the time of application and that has reduced coating defects when forming a thick film; a patterning process performed using the photosensitive resin composition; a cured film formed by curing the pattern; and an electronic component having the cured film.

    MANUFACTURING METHOD OF GLASS BASE MATERIAL FOR OPTICAL FIBER

    公开(公告)号:US20220081345A1

    公开(公告)日:2022-03-17

    申请号:US17469223

    申请日:2021-09-08

    发明人: Hiroki KOJIMA

    IPC分类号: C03B37/014

    摘要: A manufacturing method of glass base material for optical fiber that can obtain glass base material for optical fiber with reduced fluctuation in optical properties in the longitudinal direction is provided. The manufacturing method includes: a first heat treatment step in which the porous glass base material inserted in a vessel of a sintering furnace is heated by a heater installed around the periphery of the vessel while being raised or lowered in the longitudinal direction in a chlorine-based gas containing atmosphere in the vessel of the sintering furnace; a second heat treatment step in which the porous glass base material is heated by the heater to obtain a transparent glass body while being raised or lowered in the longitudinal direction in an inert gas containing atmosphere in the vessel after the first heat treatment step; and a preliminary fluorine doping step prior to the second heat treatment step.

    Room temperature-vulcanizing silane-containing resin composition and mounting circuit substrate

    公开(公告)号:US11274225B2

    公开(公告)日:2022-03-15

    申请号:US16476366

    申请日:2017-12-22

    摘要: Room temperature-vulcanizing silane-containing resin compositions are described, containing: (A) 100 parts by mass of a silane-modified polybutadiene compound represented by formula (1) (B) 0.5 to 20 parts by mass of a hydrolyzable organosilane compound having in each molecule an average of at least two silicon atom-bonded hydrolyzable groups, and/or the partial hydrolysis condensate of this hydrolyzable organosilane compound; and (C) 0.1 to 10 parts by mass of a curing catalyst. This room temperature-vulcanizing silane-containing resin composition is suitable for application as a coating agent composition and in particular as, e.g., a coating agent for electrical and electronic components and substrates therefor, and a sealant for liquid crystal display elements. The room temperature-vulcanizing silane-containing resin composition provides a gas permeation-resistant coating film (cured material) and is useful as a coating agent that exhibits a corrosion-inhibiting capability versus corrosive gases.

    Slurry composition, cured product of the slurry composition, and substrate, film and prepreg using the cured product

    公开(公告)号:US11267966B2

    公开(公告)日:2022-03-08

    申请号:US16828525

    申请日:2020-03-24

    摘要: Provided are a slurry composition having a low thixotropy and a superior handling property; a cured product of this slurry composition; and a substrate, film and prepreg using such cured product, the substrate, film and prepreg exhibiting excellent mechanical properties and a low relative permittivity and dielectric tangent. The slurry composition has a thixotropic ratio of not higher than 3.0, and comprises: (A) a cyclic imide compound having, per molecule, at least one dimer acid backbone, at least one linear alkylene group having not less than 6 carbon atoms, and at least two cyclic imide groups; (B) spherical silica fine particles and/or alumina fine particles having an average particle size of 0.05 to 20 μm when measured by a laser diffraction method; (C) a silane coupling agent capable of reacting with the components (A) and (B); and (D) an organic solvent.

    Pellicle and method for producing the same

    公开(公告)号:US11237474B2

    公开(公告)日:2022-02-01

    申请号:US16700077

    申请日:2019-12-02

    发明人: Akinori Nishimura

    IPC分类号: G03F1/62

    摘要: The present invention is to provide a pellicle characterized by including a pellicle film and a pellicle frame, in which the pellicle film is stretched on the pellicle frame, and the pellicle film is an annealed pellicle film, and to provide a method for producing a pellicle by stretching a pellicle film on a pellicle frame, including the step of annealing the pellicle film alone before stretching the pellicle film on the pellicle frame, annealing the pellicle after stretching the pellicle film on the pellicle frame, or annealing the pellicle film alone and the pellicle both before and after stretching the pellicle film on the pellicle frame.

    RESIST COMPOSITION AND PATTERNING PROCESS

    公开(公告)号:US20220026805A1

    公开(公告)日:2022-01-27

    申请号:US17368989

    申请日:2021-07-07

    发明人: Jun Hatakeyama

    摘要: A resist composition comprising an ammonium salt and fluorine-containing polymer offers a high sensitivity and is unsusceptible to nano-bridging, pattern collapse or residue formation, independent of whether it is of positive or negative tone. The ammonium salt and fluorine-containing polymer comprises repeat units AU having an ammonium salt structure containing a carboxylic acid anion, sulfonamide anion, phenoxide anion or enolate anion of β-diketone, the anion containing fluorine, but not iodine and bromine, and repeat units FU-1 having a trifluoromethylalcohol group and/or repeat units FU-2 having a fluorinated hydrocarbyl group.