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公开(公告)号:US12191335B2
公开(公告)日:2025-01-07
申请号:US17522142
申请日:2021-11-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sang-Su Park , Kwansik Kim , Changhwa Kim , Taemin Kim , Gyuhyun Lim
IPC: H01L27/146
Abstract: An image sensor includes a substrate including a first surface and a second surface which is opposite to the first portion, and a pixel isolation portion provided in the substrate and configured to isolate unit pixels from each other. The pixel isolation portion includes a first filling insulation pattern extending from the first surface toward the second surface and having an air gap region, the first filling insulation pattern including a first sidewall and a second sidewall which is opposite to the first sidewall, a conductive structure including a first portion on the first sidewall, a second portion on the second sidewall, and a connection portion connecting the first portion and the second portion, and an insulating liner provided between the first portion and the substrate and between the second portion and the substrate.
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公开(公告)号:US20240258354A1
公开(公告)日:2024-08-01
申请号:US18242597
申请日:2023-09-06
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jungsan Kim , Kwansik Kim , Jinyong Choi , Gayoung Kim , Taemin Kim , Yongsoon Park , Ingyu Baek , Seungho Lee
IPC: H01L27/146
CPC classification number: H01L27/14632 , H01L27/14603 , H01L27/14645
Abstract: An image sensor includes a lower insulating film arranged over a substrate and having a non-flat surface that has a concave-convex shape and includes a first surface, which extends in a horizontal direction parallel to a frontside surface of the substrate, and at least one second surface extending from the first surface toward the substrate, a capacitor arranged on the lower insulating film to contact the non-flat surface of the lower insulating film and conformally covering the non-flat surface of the lower insulating film along the contour of the non-flat surface of the lower insulating film, an upper insulating film covering the capacitor and the lower insulating film, and at least one air gap having a side facing the at least one second surface of the lower insulating film in the horizontal direction and having a height defined by the upper insulating film in a vertical direction.
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公开(公告)号:US20220238571A1
公开(公告)日:2022-07-28
申请号:US17522142
申请日:2021-11-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sang-Su PARK , Kwansik Kim , Changhwa Kim , Taemin Kim , Gyuhyun Lim
IPC: H01L27/146
Abstract: An image sensor includes a substrate including a first surface and a second surface which is opposite to the first portion, and a pixel isolation portion provided in the substrate and configured to isolate unit pixels from each other. The pixel isolation portion includes a first filling insulation pattern extending from the first surface toward the second surface and having an air gap region, the first filling insulation pattern including a first sidewall and a second sidewall which is opposite to the first sidewall, a conductive structure including a first portion on the first sidewall, a second portion on the second sidewall, and a connection portion connecting the first portion and the second portion, and an insulating liner provided between the first portion and the substrate and between the second portion and the substrate.
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公开(公告)号:US20240370043A1
公开(公告)日:2024-11-07
申请号:US18652866
申请日:2024-05-02
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seunghun Kim , Minjung Kim , Taemin Kim , Jiho Uh , Jinseok Lee , Geongu Jang
Abstract: A method of manufacturing using a mass flow controller (MFC) includes closing a valve installed in a flow path of the MFC to prevent a fluid from flowing therein due to a closure of the valve, determining that the fluid is not leaking, determining that the fluid is stabilized, determining that a pressure sensor is normal, calculating a zero point calibration value of the pressure sensor based on a zero point of the pressure sensor, a time when power is supplied to the MFC, and a time when a flow is supplied to the MFC, applying the zero point calibration value to the pressure sensor, and measure the mass flow rate through the flow path with the pressuring sensor and adjusting the valve based on the mass flow rate to regulate the flow of the fluid to a manufacturing device.
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