METHOD AND APPARATUS FOR PROCESSING AUDIO SIGNAL

    公开(公告)号:US20200027437A1

    公开(公告)日:2020-01-23

    申请号:US16503990

    申请日:2019-07-05

    Abstract: A method and audio apparatus for processing an audio signal are provided. The audio apparatus includes at least one microphone to acquire ambient sound of the audio apparatus, a speaker to output the audio signal, an air pressure regulator including a fluid tube connecting an external space of a housing of the audio apparatus to an internal space of the housing, and configured to adjust a change in an air pressure of the internal space of the housing and an audio signal processor configured to generate an anti-noise signal for canceling noise in the ambient sound by using the acquired ambient sound and output the generated anti-noise signal and the audio signal through the speaker.

    VERTICAL SEMICONDUCTOR DEVICES
    3.
    发明申请

    公开(公告)号:US20210043568A1

    公开(公告)日:2021-02-11

    申请号:US16876600

    申请日:2020-05-18

    Abstract: A vertical semiconductor device may include may include a substrate, a stacked structure, an insulating interlayer, a buffer pattern and a first contact plug. The stacked structure may include insulation patterns and conductive patterns stacked on each other on the substrate. The conductive patterns may extend in a first direction parallel to an upper surface of the substrate, and edges of the conductive patterns may have a staircase shape. The conductive patterns may include pad patterns defined by exposed upper surfaces of the conductive patterns. The insulating interlayer may cover the stacked structure. The buffer pattern may be on the insulating interlayer. The first contact plug may pass through the buffer pattern and the insulating interlayer. The first contact plug may contact one of the pad patterns. The buffer pattern may reduce defects from forming the first contact plug.

    SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA

    公开(公告)号:US20250014871A1

    公开(公告)日:2025-01-09

    申请号:US18406898

    申请日:2024-01-08

    Abstract: According to an aspect of the present inventive concepts, a semiconductor processing apparatus includes: a chamber; an electrostatic chuck in an internal space of the chamber; a plurality of grid electrodes installed on the electrostatic chuck so as to be separated from each other in a first direction, perpendicular to an upper surface of the electrostatic chuck, and respectively having a plurality of through-holes; a plurality of reflectors between the plurality of grid electrodes and the electrostatic chuck and reflecting ions passing through the plurality of through-holes in each of the plurality of grid electrodes; and a voltage supply unit outputting a bias voltage having a predetermined cycle to at least one of the plurality of grid electrodes, wherein each of the plurality of grid electrodes includes a base plate containing a conductive material, and a cover layer covering a surface of the base plate and containing a metal oxide.

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