公开(公告)号：US20160377973A1

公开(公告)日：2016-12-29

申请号：US15258163

申请日：2016-09-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-hyun KIM ,  Seong-sue KIM ,  Dong-gun LEE

IPC: G03F1/24

CPC classification number: G03F1/24 ,  G03F1/38 ,  G03F1/72 ,  G03F1/74

Abstract: Provided are photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.

Abstract translation: 提供光掩模和校正其错误的方法。 光掩模包括覆盖基板的一个侧表面的多层反射膜和覆盖基板的另一侧表面的能量接收层。 该方法包括根据检测到的光掩模误差确定光掩模的前表面上的局部校正位置，并将能量束局部地施加到与沿局部校正位置的局部校正位置对准的光掩模的背侧表面区域 光掩模 本发明可以应用于受到表面高度的改变或选择性施加的应力的光掩模以外的结构的影响。

公开(公告)号：US20150131071A1

公开(公告)日：2015-05-14

申请号：US14534340

申请日：2014-11-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong-wan KIM ,  Seong-sue KIM ,  Chang-young JEONG ,  Dong-gun LEE

IPC: H01L21/68 ,  H01L21/687 ,  H01L21/673 ,  H01L21/683

CPC classification number: G03F7/70741 ,  G03F1/142 ,  G03F1/64 ,  G03F7/707 ,  G03F7/70983 ,  H01L21/67359

Abstract: A semiconductor device manufacturing apparatus includes a mask stage including a mask holder system that fixes a photomask, the mask holder system having a first fixing portion mounted at a first position of the mask holder system to fix the photomask, and a second fixing portion at a second position of the mask holder system and spaced apart from the first position, the second fixing portion fixing a pellicle assembly to be spaced apart from the photomask on the first fixing portion.

Abstract translation: 半导体器件制造装置包括掩模台，其包括固定光掩模的掩模保持器系统，所述掩模保持器系统具有安装在所述掩模保持器系统的第一位置处的第一固定部分以固定所述光掩模;以及第二固定部， 所述第二固定部分固定在所述第一固定部分上与所述光掩模间隔开的防护薄膜组件。

公开(公告)号：US20140166906A1

公开(公告)日：2014-06-19

申请号：US14077292

申请日：2013-11-12

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eok-bong KIM ,  Jong-ju PARK ,  Dong-gun LEE ,  Seong-sue KIM

IPC: G21K5/04

CPC classification number: H05G2/003 ,  H05G2/008

Abstract: An extreme ultra violet (EUV) generation device includes a light source for outputting laser beam, a pulse width compression system for compressing a pulse width of the laser beam, a gas cell for receiving the laser beam having the compressed pulse width incident from the pulse width compression system and generating EUV light, and a vacuum chamber housing the pulse width compression system and the gas cell.

Abstract translation: 极紫外（EUV）产生装置包括用于输出激光束的光源，用于压缩激光束的脉冲宽度的脉冲宽度压缩系统，用于接收从脉冲入射的具有压缩脉冲宽度的激光束的气室 宽度压缩系统和产生EUV灯，以及容纳脉冲宽度压缩系统和气室的真空室。