公开(公告)号：US20220181219A1

公开(公告)日：2022-06-09

申请号：US17394471

申请日：2021-08-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： MEEHYUN LIM ,  SUNG-YEOL KIM ,  SUNGHYUP KIM ,  HYUNG-JUNG YONG

IPC: H01L21/66 ,  G01N21/25 ,  G01N21/27 ,  G01N21/3586 ,  G01N21/3504 ,  H01J37/32 ,  H01L21/683

Abstract: A plasma treatment apparatus includes a light generator that generates light, a chamber that receives the light generated from the light generator, an optical element provided between the light generator and the chamber, a light detector that detects the light reflected in the chamber, and a controller connected to the light generator and the light detector. The chamber includes an electrostatic chuck provided in a lower portion of the chamber, an edge ring provided around the electrostatic chuck, an outer wall for sealing an inner space of the chamber, and a gas supply that injects a process gas into the chamber. The optical element branches the generated light to irradiate branched light to different regions of the chamber.

公开(公告)号：US20220104336A1

公开(公告)日：2022-03-31

申请号：US17325327

申请日：2021-05-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： SUNGHYUP KIM ,  Myeongjun Gil ,  Yebin Nam ,  Sanghoon Lee ,  Injae Lee

IPC: H05G2/00 ,  G03F7/20

Abstract: Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.

公开(公告)号：US20250076776A1

公开(公告)日：2025-03-06

申请号：US18595753

申请日：2024-03-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： SEUNGPYO HONG ,  SUNGHYUP KIM ,  INJAE LEE ,  DAEGEUN YOON ,  TAEWOONG UM

IPC: G03F7/00 ,  H05G2/00

Abstract: An extreme ultraviolet (EUV) source includes a housing providing a light-collecting space having a cone shape becoming narrower in a first direction, an EUV collector disposed at a first end portion of the housing and including a reflection surface disposed toward the light-collecting space, and an exhaust pipe coupled to the housing and providing an exhaust flow path connected to the light-collecting space, wherein the exhaust pipe extends from the housing and forms an acute angle with the housing toward a second end portion of the housing.