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Patent Agency Ranking
公开(公告)号：US11415891B2
公开(公告)日：2022-08-16
申请号：US17221388
申请日：2021-04-02
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup Kim , Myeongjun Gil , Yebin Nam , Injae Lee
Abstract: An extreme ultraviolet light source system includes a chamber configured to maintain a pressure of an inner space thereof at a first pressure, a droplet supply unit disposed in the chamber and configured to discharge a droplet on a first path, a light source configured to emit a light for generating plasma by irradiating a laser light to the droplet at a focal point on the first path, and a suction unit disposed on the first path so as to face the droplet supply unit in the chamber and configured to suction debris of the droplet irradiated with the laser light at a second pressure, lower than the first pressure, wherein the suction unit includes a nozzle protruding from a side wall of the chamber toward the focal point, and an end of the nozzle is closer to the focal point than it is to the side wall of the chamber.
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公开(公告)号：US20220104336A1
公开(公告)日：2022-03-31
申请号：US17325327
申请日：2021-05-20
Applicant: Samsung Electronics Co., Ltd.
Inventor： SUNGHYUP KIM , Myeongjun Gil , Yebin Nam , Sanghoon Lee , Injae Lee
Abstract: Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.
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公开(公告)号：US20240424457A1
公开(公告)日：2024-12-26
申请号：US18393917
申请日：2023-12-22
Applicant: Samsung Electronics Co., Ltd.
Inventor： Hyunjoong Kim , Sebin Choi , Myeongjun Gil , Sunghyup Kim , Sunjoo Lee , Cheol-Jae Lee , Donghwy Chin , Donghee Han
IPC: B01F25/314 , B01F23/10 , B01F25/31
Abstract: A gas mixing device may include a main conduit and a gas transferring device connected to the main conduit. The gas transferring device may include a distribution device surrounding the main conduit, a supplying conduit connected to the distribution device and defining a supplying path, and a plurality of connection conduits connecting the first distribution device to the main conduit. The distribution device may include inner and outer cylinders, which are sequentially provided to surround the main conduit and are sequentially spaced apart from the main conduit in a radial direction. A distribution space may be defined between the inner and outer cylinders, and the supplying conduit may be coupled to the outer cylinder, such that the supplying path is connected to the distribution space. The connection conduits may be spaced apart from each other in a circumferential direction.
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公开(公告)号：US11304287B1
公开(公告)日：2022-04-12
申请号：US17325327
申请日：2021-05-20
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup Kim , Myeongjun Gil , Yebin Nam , Sanghoon Lee , Injae Lee
Abstract: Extreme ultraviolet light source systems may include a chamber including a condensing mirror and having an intermediate focus, by which extreme ultraviolet light reflected from the condensing mirror is emitted along a first optical path, a blocking plate that may be on the chamber so as to intersect the first optical path and may include an opening through which the extreme ultraviolet light is emitted, a transparent cover on the blocking plate so as to cover the opening, a nozzle that may be between the chamber and the blocking plate so that an end portion faces the intermediate focus and may spray a first gas in a direction intersecting the first optical path, and an exhaust pipe between the chamber and the blocking plate so as to face the end portion of the nozzle.
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公开(公告)号：US20220075271A1
公开(公告)日：2022-03-10
申请号：US17221388
申请日：2021-04-02
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunghyup Kim , Myeongjun Gil , Yebin Nam , Injae Lee
Abstract: An extreme ultraviolet light source system includes a chamber configured to maintain a pressure of an inner space thereof at a first pressure, a droplet supply unit disposed in the chamber and configured to discharge a droplet on a first path, a light source configured to emit a light for generating plasma by irradiating a laser light to the droplet at a focal point on the first path, and a suction unit disposed on the first path so as to face the droplet supply unit in the chamber and configured to suction debris of the droplet irradiated with the laser light at a second pressure, lower than the first pressure, wherein the suction unit includes a nozzle protruding from a side wall of the chamber toward the focal point, and an end of the nozzle is closer to the focal point than it is to the side wall of the chamber.
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