公开(公告)号：US20160290933A1

公开(公告)日：2016-10-06

申请号：US14955331

申请日：2015-12-01

Applicant: Samsung Electronics Co., Ltd. ,  Samsung Display Co., Ltd.

Inventor： Wonguk Seo ,  Kyoungchon KIM ,  Kuihyun YOON ,  Kyunlae KIM ,  Jaeyoung PARK ,  Kyoungho YANG ,  Young HEO

IPC: G01N21/94 ,  G01N21/958 ,  G01N21/88

CPC classification number: G01N21/94 ,  G01N21/8806 ,  G01N21/958 ,  G01N2021/9513

Abstract: Provided is an optical inspection system including a supporting unit, allowing a target object to be loaded thereon, a light source unit configured to emit a laser beam toward the target object, a light condensing unit collecting scattered light that is scattered at the target object when the laser beam is irradiated onto the target object, and a control unit controlling the light source unit and the light condensing unit and analyzing the scattered light to examine whether there are pollutants on the target object. The supporting unit may include a first supporting unit, on which the target object is disposed, and which is formed of a first material, and a second supporting unit, which is disposed under the first supporting unit and is formed of a second material different from the first material.

Abstract translation: 提供了一种光学检查系统，包括：允许目标物体被装载在其上的支撑单元，被构造成朝向目标物体发射激光束的光源单元，收集在目标物体处散射的散射光的聚光单元， 激光束被照射到目标物体上，控制单元控制光源单元和聚光单元并分析散射光以检查目标物体上是否存在污染物。 所述支撑单元可以包括第一支撑单元，所述目标物体设置在所述第一支撑单元上，并且所述第一支撑单元由第一材料形成，所述第二支撑单元设置在所述第一支撑单元的下方，并且由不同于 第一种材料。

公开(公告)号：US20230317418A1

公开(公告)日：2023-10-05

申请号：US18068778

申请日：2022-12-20

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungmin KO ,  Sangki NAM ,  Dougyong SUNG ,  Byeongsang KIM ,  Yunhwan KIM ,  Suyoung YOO ,  Namkyun KIM ,  Kuihyun YOON

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32568 ,  H01J2237/3343 ,  H01J2237/2001

Abstract: A substrate processing apparatus includes a process chamber having an internal space; upper and lower electrode portions facing each other in the internal space; and a gas supply unit configured to supply cooling gas to a bottom surface of a substrate seated on the lower electrode portion. The gas supply unit may include a gas supply source outside the process chamber and configured to provide a cooling gas, and a gas filter connected to the gas supply source and including one or more wall surfaces at least partially defining a gas flow path for the cooling gas. The gas filter may include a first and second regions formed of respective materials having different dielectric constants. The first and second regions may be configured so that the cooling gas flowing along the gas flow path flows upwardly concurrently with colliding with a wall surface of the gas flow path.

公开(公告)号：US20220351947A1

公开(公告)日：2022-11-03

申请号：US17548775

申请日：2021-12-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kuihyun YOON ,  Sang Ki NAM ,  Kwonsang SEO ,  Sungho JANG ,  Jungmin KO ,  Nam Kyun KIM ,  Tae-Hyun KIM ,  Seunghan BAEK ,  Seungbin AHN ,  Jungmo YANG ,  Changheon LEE ,  Kangmin JEON

IPC: H01J37/32

Abstract: A plasma confinement ring includes a lower ring, an upper ring on the lower ring, and a connection ring extended to connect the lower ring to the upper ring. The lower ring includes a lower center hole vertically penetrating the lower ring at a center of the lower ring and at least one slit penetrating the lower ring in a region outside the lower center hole. The slit is structured to pass a more amount of air or gas at a first portion closer to the center of the lower ring than at a second portion farther from the center of the lower ring.

公开(公告)号：US20250146917A1

公开(公告)日：2025-05-08

申请号：US19018240

申请日：2025-01-13

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yoonbum NAM ,  Namkyun KIM ,  Seungbo SHIM ,  Donghyeon NA ,  Naohiko OKUNISHI ,  Dongseok HAN ,  Minyoung HUR ,  Byeongsang KIM ,  Kuihyun YOON

IPC: G01N9/24 ,  H01Q1/40 ,  H01Q9/30

Abstract: An apparatus for measuring parameters of plasma includes a cutoff probe. The cutoff probe includes: a first antenna having a line shape and configured to emit a microwave to the plasma in response to the signal provided by at least one processor; a second antenna having a line shape and configured to generate an electrical signal in response to receiving the microwave emitted by the first antenna and transferred through the plasma; a first insulating layer; a second insulating layer; a first shield; a second shield; an end protection layer covering an end of each of the first insulating layer, the second insulating layer, the first shield, and the second shield; a first antenna protection layer, of insulating nature, covering the first antenna; and a second antenna protection layer, of insulating nature, covering the second antenna.

公开(公告)号：US20240162017A1

公开(公告)日：2024-05-16

申请号：US18327458

申请日：2023-06-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Heewon MIN ,  Juho KIM ,  Dongyun YEO ,  Kuihyun YOON ,  Seungbin LIM ,  Songyun KANG ,  Youngrok KWON

IPC: H01J37/32

CPC classification number: H01J37/32724 ,  H01J2237/002 ,  H01J2237/2007 ,  H01J2237/334

Abstract: A substrate supporting device may include a cooling plate including a cooling hole, a thermal-insulation plate on the cooling plate, and a chucking plate placed on the thermal-insulation plate. The chucking plate may include a heater. The thermal-insulation plate may include an adiabatic space, which is recessed from a top surface of the thermal-insulation plate by a depth in a downward direction. The cooling plate may include a connection hole, which vertically extends and is connected to the adiabatic space.