公开(公告)号：US20230333027A1

公开(公告)日：2023-10-19

申请号：US18118350

申请日：2023-03-07

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Wookjin LEE ,  Ghilgeun Oh

IPC: G01N21/95 ,  H01L21/67

CPC classification number: G01N21/9501 ,  H01L21/67248 ,  G01N2201/12

Abstract: An optical failure detection system includes a test chamber having an accommodating space therein, the test chamber including an upper cover having an opening therein; a substrate plate provided in the opening of the upper cover, the substrate plate including: a first surface on which a wafer is disposed; a second surface opposite to the first surface; and an optical window formed in a central region of the substrate plate and through which the wafer is exposed; a temperature control device including a plurality of thermoelectric devices provided around the optical window of the substrate plate, the temperature control device being configured to heat or cool at least one semiconductor device of the wafer; and an optical device provided in the accommodating space of the test chamber, the optical device being configured to radiate light toward the at least one semiconductor device through the optical window.

公开(公告)号：US12265778B2

公开(公告)日：2025-04-01

申请号：US17539697

申请日：2021-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Junghwan Kim ,  Insu Jang ,  Hyeonhwa Jang ,  Ghilgeun Oh

IPC: G06F30/398 ,  G06F30/392 ,  G06F30/394 ,  G06F119/02

Abstract: Provided is a method of detecting a defective layer. A method, performed by a computing system, of detecting a defective layer of a semiconductor device including a plurality of layers includes obtaining candidate defective layer information regarding a plurality of candidate defective layers and obtaining physical structure information regarding the candidate defective layers, dividing each of wires in the candidate defective layers into virtual micro areas based on the candidate defective layer information and based on the physical structure information, and identifying a defective layer from among the candidate defective layers according to a number of the virtual micro areas.