公开(公告)号：US11927890B1

公开(公告)日：2024-03-12

申请号：US17892379

申请日：2022-08-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seok Heo ,  Cha Won Koh ,  Sang Joon Hong ,  Hyun Woo Kim ,  Kyung-Won Kang ,  Dong-Wook Kim ,  Kyung Won Seo ,  Young Il Jang ,  Yong Suk Choi

IPC: G03F7/00 ,  G03F7/16 ,  H01L21/677 ,  H01L21/687

CPC classification number: G03F7/70875 ,  G03F7/168 ,  G03F7/70033 ,  H01L21/67703 ,  H01L21/68707

Abstract: A substrate processing apparatus includes a photoresist coater applying a photoresist film on a substrate, a humidifier increasing an amount of moisture in an ambient to which the photoresist film on the substrate is exposed, and an exposer irradiating the photoresist film exposed to the ambient having the increased amount of moisture with light. The humidifier is disposed between the photoresist coater and the exposer.