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公开(公告)号:US20180012909A1
公开(公告)日:2018-01-11
申请号:US15632156
申请日:2017-06-23
Applicant: Samsung Display Co., Ltd.
Inventor: Taewoo KIM , Eunjung Kim , Moonjung An , Gugrae Jo , Hyungbin Cho
CPC classification number: H01L27/1214 , H01L27/1259 , H01L27/3241 , H01L33/04 , H01L33/50 , H01L33/504 , H01L33/58
Abstract: A display substrate includes: a base substrate; a switching device disposed on the base substrate, the switching device including a gate electrode, a source electrode, and a drain electrode overlapping at least a part of the gate electrode; a wavelength converting layer disposed on the switching device, the wavelength converting layer including a quantum dot; a bridge electrode disposed on the wavelength converting layer, the bridge electrode electrically connected to the drain electrode through a first contact hole formed through the wavelength converting layer; a planarizing layer disposed on the wavelength converting layer; and a pixel electrode disposed on the planarizing layer, the pixel electrode electrically connected to the bridge electrode through a second contact hole formed through the planarizing layer.
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公开(公告)号:US09568767B2
公开(公告)日:2017-02-14
申请号:US14198106
申请日:2014-03-05
Applicant: Samsung Display Co., Ltd.
Inventor: Jung Gun Nam , Moonjung An , Dae-Young Lee , Daehwan Jang , Gugrae Jo , Takakuwa Atsushi
IPC: G02F1/1335 , G02F1/1333
CPC classification number: G02F1/133536 , G02F1/133345 , G02F1/133555 , G02F2001/133548 , G02F2001/133562 , G02F2201/38
Abstract: A display apparatus may include a backlight assembly configured to generate an emitted light and a display panel configured to receive the emitted light to display images. The display panel may include a display substrate, an opposite substrate facing the display substrate, a wire grid polarizer, and a reflection reducing layer. The wire grid polarizer may be disposed on at least one of the display substrate and the opposite substrate to polarize the emitted light. The reflection reducing layer may have a grid shape and may be disposed on the wire grid polarizer. The reflection reducing layer may reduce an amount of a light reflected by the wire grid polarizer.
Abstract translation: 显示装置可以包括被配置为产生发射光的背光组件和被配置为接收所发射的光以显示图像的显示面板。 显示面板可以包括显示基板,面对显示基板的相对基板,线栅偏振器和反射减少层。 线栅偏振器可以设置在显示基板和相对基板的至少一个上,以使发射的光偏振。 反射降低层可以具有栅格形状并且可以设置在线栅偏振器上。 反射降低层可以减少由线栅偏振器反射的光量。
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公开(公告)号:US10926564B2
公开(公告)日:2021-02-23
申请号:US15628083
申请日:2017-06-20
Applicant: Samsung Display Co., Ltd.
Inventor: Min-Uk Kim , Moonjung An , Dongeon Lee , Kang Soo Han , Gugrae Jo
Abstract: A method of manufacturing an imprint stamp including forming an imprint resist only in a second area of a sample substrate including a first area and the second area, pressing the imprint resist with the imprint stamp and curing the imprint resist, in which the imprint stamp includes a fine protrusion pattern that corresponds to the first area and the second area of the sample substrate, and separating the imprint stamp from the sample substrate such that a portion of the fine protrusion pattern corresponding to the second area is separated from the imprint stamp by the cured imprint resist.
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公开(公告)号:US10211227B2
公开(公告)日:2019-02-19
申请号:US15632156
申请日:2017-06-23
Applicant: Samsung Display Co., Ltd.
Inventor: Taewoo Kim , Eunjung Kim , Moonjung An , Gugrae Jo , Hyungbin Cho
Abstract: A display substrate includes: a base substrate; a switching device disposed on the base substrate, the switching device including a gate electrode, a source electrode, and a drain electrode overlapping at least a part of the gate electrode; a wavelength converting layer disposed on the switching device, the wavelength converting layer including a quantum dot; a bridge electrode disposed on the wavelength converting layer, the bridge electrode electrically connected to the drain electrode through a first contact hole formed through the wavelength converting layer; a planarizing layer disposed on the wavelength converting layer; and a pixel electrode disposed on the planarizing layer, the pixel electrode electrically connected to the bridge electrode through a second contact hole formed through the planarizing layer.
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公开(公告)号:US11376800B2
公开(公告)日:2022-07-05
申请号:US16983326
申请日:2020-08-03
Applicant: Samsung Display Co., Ltd.
Inventor: Kang Soo Han , Moonjung An , Gugrae Jo , Hyungbin Cho
Abstract: An imprint master template including a first fine pattern unit having an upper surface on which a fine pattern is formed, a second fine pattern unit disposed adjacent to the first fine pattern unit and having an upper surface on which a fine pattern is formed, and a supporting part configured to support the first fine pattern unit and the second fine pattern unit. A side surface of the first fine pattern unit faces a side surface of the second fine pattern unit. The side surface of the first fine pattern unit includes a first surface which is perpendicular to the upper surface and a second surface which is inclined at a predetermined angle with respect to the first surface. The side surface of the second fine pattern unit includes a first surface which is perpendicular to the upper surface and a second surface which is inclined at a predetermined angle with respect to the first surface.
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公开(公告)号:US10751953B2
公开(公告)日:2020-08-25
申请号:US15469946
申请日:2017-03-27
Applicant: Samsung Display Co., Ltd.
Inventor: Kang Soo Han , Moonjung An , Gugrae Jo , Hyungbin Cho
Abstract: A method of manufacturing an imprint master template including forming a cutting line guide at an edge of a first fine pattern unit having an upper surface on which a fine pattern is formed; cutting a wafer substrate by a cleaving process along the cutting line guide so that a cutting surface is formed, the cutting surface having a preliminary second surface where the cutting line guide was formed and a first surface which is formed by the cleaving process; polishing the preliminary second surface to form a second surface which is inclined at a predetermined angle with respect to the first surface; and bonding the first fine pattern unit and the second fine pattern unit to each other with the first surface of the first fine pattern unit facing the first surface of the second fine pattern unit.
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