公开(公告)号：US10926564B2

公开(公告)日：2021-02-23

申请号：US15628083

申请日：2017-06-20

Applicant: Samsung Display Co., Ltd.

Inventor： Min-Uk Kim ,  Moonjung An ,  Dongeon Lee ,  Kang Soo Han ,  Gugrae Jo

IPC: G03F7/00 ,  B82Y40/00 ,  B41K1/50 ,  G02B5/30 ,  B41K1/04 ,  B82Y10/00

Abstract: A method of manufacturing an imprint stamp including forming an imprint resist only in a second area of a sample substrate including a first area and the second area, pressing the imprint resist with the imprint stamp and curing the imprint resist, in which the imprint stamp includes a fine protrusion pattern that corresponds to the first area and the second area of the sample substrate, and separating the imprint stamp from the sample substrate such that a portion of the fine protrusion pattern corresponding to the second area is separated from the imprint stamp by the cured imprint resist.

公开(公告)号：US09873857B2

公开(公告)日：2018-01-23

申请号：US14972351

申请日：2015-12-17

Applicant: Samsung Display Co., Ltd. ,  LTCAM CO., LTD.

Inventor： Dongeon Lee ,  Jinho Ju ,  Junhyuk Woo ,  Seokho Lee

IPC: C11D7/50 ,  C11D11/00 ,  C11D7/32 ,  C11D7/26 ,  C11D7/08 ,  H01L21/02

CPC classification number: C11D11/0047 ,  C11D7/08 ,  C11D7/265 ,  C11D7/3209 ,  C11D7/3245 ,  H01L21/02057

Abstract: Provided is a cleaning composition, including, from about 0.01 weight % to about 10.0 weight % of a chelating agent, from about 0.01 weight to about 3.0 weight % of an organic acid containing a carboxyl group, from about 0.01 weight % to about 2.0 weight % of an inorganic acid, from about 1.0 weight % to about 15.0 weight % of an amine and water in an amount sufficient to bring the total weight of the cleaning composition to 100 weight %.