公开(公告)号：US09448476B2

公开(公告)日：2016-09-20

申请号：US14522771

申请日：2014-10-24

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sung-Kyun Park ,  Jeong-Min Park ,  Jung-Soo Lee ,  Ji-Hyun Kim ,  Jun Chun ,  Ki-Hyun Cho ,  Hyoc-Min Youn ,  Tai-Hoon Yeo ,  Jin-Sun Kim ,  Byung-Uk Kim

IPC: G03F7/30 ,  G03F7/033 ,  G03F7/028 ,  H01L21/02 ,  H01L21/312 ,  G03F7/038 ,  H01L21/311

CPC classification number: G03F7/038 ,  G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0755 ,  G03F7/30 ,  H01L21/02112 ,  H01L21/02118 ,  H01L21/311 ,  H01L27/1288

Abstract: A photoresist composition includes about 0.1 to about 30 parts by weight of a photo-initiator, about 1 to 50 parts by weight of a first acrylate monomer including at least five functional groups, about 1 to 50 parts by weight of a second acrylate monomer including at most four functional groups with respect to about 100 parts by weight of an acryl-copolymer.

Abstract translation: 光致抗蚀剂组合物包括约0.1至约30重量份的光引发剂，约1至50重量份的包含至少5个官能团的第一丙烯酸酯单体，约1至50重量份的第二丙烯酸酯单体，包括 至多四个官能团相对于约100重量份的丙烯酸共聚物。

公开(公告)号：US20140327866A1

公开(公告)日：2014-11-06

申请号：US14173634

申请日：2014-02-05

Applicant: Samsung Display Co., Ltd.

Inventor： Hoon Kang ,  Jae-Sung Kim ,  Jin-Young Choi ,  Koichi Sugitani ,  Ki-Hyun Cho ,  Jin Ho Ju ,  Byung-Uk Kim ,  Joo-Pyo Yun ,  Hyoc-Min Youn

IPC: G03F7/038 ,  G02F1/1333

CPC classification number: G02F1/133345 ,  G03F7/0045 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1077

Abstract: A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent.

Abstract translation: 公开了一种感光性树脂组合物。 所公开的感光性树脂组合物包括通过使i）不饱和羧酸，不饱和羧酸酐或其混合物共聚形成的丙烯酸类共聚物，和ii）烯烃系不饱和化合物或其混合物，其中， 酚羟基被酸可降解的缩醛或缩酮基，光致酸发生剂和溶剂保护。

公开(公告)号：US09417526B2

公开(公告)日：2016-08-16

申请号：US14573624

申请日：2014-12-17

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jun Chun ,  Jeong-Min Park ,  Sung-Kyun Park ,  Ji-Hyun Kim ,  Jin-Ho Ju ,  Hyoc-Min Youn ,  Dong-Myung Kim ,  Jin-Sun Kim ,  Tai-Hoon Yeo ,  Byung-Uk Kim

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/30 ,  C08F220/10 ,  C08F220/26 ,  C08F220/16 ,  C08F220/18 ,  C08F212/34 ,  H01L51/10 ,  H01L21/027 ,  H01L21/311 ,  G02F1/1362

CPC classification number: G03F7/0388 ,  C08F212/34 ,  C08F220/10 ,  C08F220/16 ,  C08F220/18 ,  C08F220/26 ,  G02F2001/13625 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0751 ,  G03F7/30 ,  H01L21/0274 ,  H01L21/31138 ,  H01L51/102

Abstract: A photoresist composition includes an acid-labile polymer that is decomposable by reaction with an acid, a photoacid generator, an organic base having a pKa value of 9 or less and a solvent. Based on 100 parts by weight of the acid-labile polymer, the photoacid generator is about 1 to about 30 parts by weight, and the organic base is about 0.1 to about 5 parts by weight. The solvent is about 50 to about 90 wt % based on the total weight of the composition.

Abstract translation: 光致抗蚀剂组合物包括通过与酸反应可分解的酸不稳定聚合物，光酸产生剂，pKa值为9以下的有机碱和溶剂。 基于100重量份的酸不稳定聚合物，光酸产生剂为约1至约30重量份，有机碱为约0.1至约5重量份。 基于组合物的总重量，溶剂为约50至约90重量％。

公开(公告)号：US09389451B2

公开(公告)日：2016-07-12

申请号：US14173634

申请日：2014-02-05

Applicant: Samsung Display Co., Ltd.

Inventor： Hoon Kang ,  Jae-Sung Kim ,  Jin-Young Choi ,  Koichi Sugitani ,  Ki-Hyun Cho ,  Jin Ho Ju ,  Byung-Uk Kim ,  Joo-Pyo Yun ,  Hyoc-Min Youn

IPC: C09K19/00 ,  G02F1/1333 ,  G03F7/004

CPC classification number: G02F1/133345 ,  G03F7/0045 ,  Y10T428/10 ,  Y10T428/1059 ,  Y10T428/1077

Abstract: A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent.

Abstract translation: 公开了一种感光性树脂组合物。 所公开的感光性树脂组合物包括通过使i）不饱和羧酸，不饱和羧酸酐或其混合物共聚形成的丙烯酸类共聚物，和ii）烯烃系不饱和化合物或其混合物，其中， 酚羟基被酸可降解的缩醛或缩酮基，光致酸发生剂和溶剂保护。

公开(公告)号：US09239518B2

公开(公告)日：2016-01-19

申请号：US14161939

申请日：2014-01-23

Applicant: Samsung Display Co., Ltd.

Inventor： Jin Ho Ju ,  Seung Bo Shim ,  Jun Gi Kim ,  Yang-Ho Jung ,  Hyang-Shik Kong ,  Byung-Uk Kim ,  Jin-Sun Kim ,  Tae-Hoon Yeo ,  Hyoc-Min Youn ,  Sang-Hoon Lee

IPC: G03F7/023 ,  G03F7/38 ,  G03F7/075 ,  G03F7/004 ,  G03F7/022 ,  G03F7/32

CPC classification number: G03F7/0233 ,  G03F7/0048 ,  G03F7/022 ,  G03F7/0226 ,  G03F7/0751 ,  G03F7/0755 ,  G03F7/322 ,  G03F7/38

Abstract: A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group.

Abstract translation: 感光性树脂组合物包括：包含含有选自不饱和羧酸和不饱和羧酸酐中的至少一种的第一单体的聚合产物和包含烯烃类不饱和化合物的第二单体的丙烯酸共聚物; 包含至少一种选自化学式1至4所示化合物的1,2-醌二叠氮化物-5-磺酸酯化合物的光敏组分; 偶联剂; 和溶剂，其中通过高效液相色谱法测定的感光组分中不对称化合物的总量大于或等于45面积％：其中R1是羟基或甲基，NQD是1,2 - 醌二叠氮化物5-磺酰基。